公开(公告)号：US20070000527A1

公开(公告)日：2007-01-04

申请号：US11172162

申请日：2005-06-30

申请人： Brian Aegerter ,  Daniel Woodruff ,  Coby Grove ,  Gregory Wilson

发明人： Brian Aegerter ,  Daniel Woodruff ,  Coby Grove ,  Gregory Wilson

IPC分类号： B08B3/00

CPC分类号： H01L21/68728 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67751 ,  H01L21/68785

摘要： A workpiece support apparatus for use in a process vessel and process system for treating semiconductor workpieces. The process vessel is to be utilized in an integrated tool for wet chemical treatment of a semiconductor workpiece. The workpiece support apparatus includes a rotor having a central cavity and guide pins mounted at an outer perimeter. A workpiece support having extendable workpiece support fingers is connected to the rotor. The extendable workpiece support fingers are moveable from a first position to a second position. A bellows seal connects the workpiece support to the rotor. A fluid delivery tube is positioned in the central cavity of the rotor and connected to a supply of fluid. When the extendable workpiece support fingers are in the first position, the guide pins of the rotor cannot interfere with the loading of a workpiece onto the extendable workpiece support fingers, and when the extendable workpiece support fingers are in the second position, a pressurized fluid is delivered through the delivery tube to create a low pressure region adjacent an inner surface of the workpiece, lifting the workpiece off the extendable workpiece support fingers, exposing the entire backside of the workpiece for processing.

摘要翻译： 用于处理容器的工件支撑装置和用于处理半导体工件的处理系统。 该处理容器用于半导体工件的湿化学处理的集成工具中。 工件支撑装置包括具有安装在外周的中心腔和导销的转子。 具有可延伸的工件支撑指的工件支撑件连接到转子。 可伸展工件支撑指可从第一位置移动到第二位置。 波纹管密封将工件支撑件连接到转子。 流体输送管定位在转子的中心空腔中并连接到流体供应源。 当可延伸的工件支撑指状件处于第一位置时，转子的引导销不会干扰工件对可延伸的工件支撑指的加载，并且当可延伸的工件支撑指状件处于第二位置时，加压流体是 通过输送管输送以产生邻近工件的内表面的低压区域，将工件从可延伸的工件支撑指状物上提起，暴露工件的整个背面进行处理。

公开(公告)号：US20050006241A1

公开(公告)日：2005-01-13

申请号：US10734098

申请日：2003-12-11

申请人： Paul McHugh ,  Gregory Wilson ,  Daniel Woodruff ,  Nolan Zimmerman ,  James Erickson

发明人： Paul McHugh ,  Gregory Wilson ,  Daniel Woodruff ,  Nolan Zimmerman ,  James Erickson

IPC分类号： C25D5/00

CPC分类号： C25D5/006 ,  C25D5/08 ,  C25D17/001 ,  C25D17/008 ,  C25D17/10 ,  C25D17/12 ,  C25D21/10 ,  C25D21/12 ,  H01L21/6723

摘要： Paddles and enclosures for processing microfeature workpieces are disclosed. A paddle device having multiple paddles is positioned in an enclosure to reciprocate back and forth along a generally linear path. The clearances between the paddles, the workpiece and the walls of the chamber are relatively small to increase the flow agitation at the surface of the workpiece and enhance the mass transfer process occurring there. The paddles are shaped to reduce or eliminate electrical shadowing effects created at the surface of the workpiece during electrochemical processing. Paddles on the same paddle device may have different shapes to reduce the likelihood for creating three-dimensional effects in the flow field proximate to the surface of the workpiece. The reciprocation stroke of the paddles may shift to further reduce shadowing.

摘要翻译： 公开了用于处理微特征工件的鞍座和外壳。 具有多个桨叶的桨装置定位在外壳中，沿着大致线性的路径往复运动。 桨叶，工件和室壁之间的间隙相对较小，以增加工件表面的流动搅拌并增强在那里发生的传质过程。 桨叶的形状可减少或消除在电化学处理期间在工件表面产生的电阴影效应。 相同桨装置上的桨叶可以具有不同的形状，以减少在靠近工件表面的流场中产生三维效应的可能性。 桨叶的往复行程可能会转移以进一步减少阴影。

公开(公告)号：US20070151844A1

公开(公告)日：2007-07-05

申请号：US11603940

申请日：2006-11-22

申请人： Gregory Wilson ,  Paul McHugh ,  Daniel Woodruff

发明人： Gregory Wilson ,  Paul McHugh ,  Daniel Woodruff

IPC分类号： C25B9/04

CPC分类号： C25D17/00 ,  C25D5/08 ,  C25D5/18 ,  C25D17/001 ,  C25D17/08 ,  C25D17/10

摘要： Reactors with agitators and methods for processing microfeature workpieces with such reactors. The agitators are capable of obtaining high, controlled mass-transfer rates that result in high quality surfaces and efficient wet chemical processes. The agitators generate high flow velocities in the fluid and contain the high energy fluid proximate to the surface of the workpiece to form high quality surfaces when cleaning, etching and/or depositing materials to/from a workpiece. The agitators also have short stroke lengths so that the footprints of the reactors are relatively small. As a result, the reactors are efficient and cost effective to operate. The agitators are also designed so that electrical fields in the processing solution can effectively operate at the surface of the workpiece.

摘要翻译： 具有搅拌器的反应器和用这种反应器处理微型工件的方法。 搅拌器能够获得高质量的质量传递速率，从而产生高品质的表面和有效的湿化学工艺。 搅拌器在流体中产生高流速并且在工件表面附近容纳高能量流体，以便当清洁，蚀刻和/或从工件沉积材料时形成高质量的表面。 搅拌器还具有短行程长度，使得反应器的足迹相对较小。 因此，反应堆的运行效率高，成本低。 搅拌器也被设计成使得处理溶液中的电场能够在工件的表面上有效地操作。

公开(公告)号：US20060226019A1

公开(公告)日：2006-10-12

申请号：US11399762

申请日：2006-04-07

申请人： Raymon Thompson ,  Paul McHugh ,  Daniel Woodruff ,  Gregory Wilson ,  Steve Eudy ,  Rajesh Baskaran

发明人： Raymon Thompson ,  Paul McHugh ,  Daniel Woodruff ,  Gregory Wilson ,  Steve Eudy ,  Rajesh Baskaran

IPC分类号： C25D7/12

CPC分类号： C25D17/001 ,  C25D7/123 ,  C25D17/005 ,  C25D17/06 ,  H01L21/2885 ,  H01L21/76873 ,  H01L21/76877

摘要： The present invention provides a semiconductor workpiece support and contact assembly for providing localized electrical connections with the device side of the workpiece. The additional contact points help overcome the terminal effect caused by very high sheet resistance of thin barrier layers and enable plating a conformal seed layer or feature filling directly on thin barrier layers. By utilizing the streets that separate individual dice on a workpiece to make electrical connections with the workpiece and provide localized distribution of plating chemistry, the present invention provides a more uniform and conformal metallization layer.

摘要翻译： 本发明提供一种用于提供与工件的装置侧的局部电连接的半导体工件支撑和接触组件。 额外的接触点有助于克服由薄阻挡层的非常高的薄层电阻引起的终端效应，并且能够将保形种子层或特征直接填充在薄的阻挡层上。 通过利用在工件上分离单个骰子以与工件电连接并且提供电镀化学物质的局部分布的街道，本发明提供了更均匀和保形的金属化层。

公开(公告)号：US20060037855A1

公开(公告)日：2006-02-23

申请号：US11111672

申请日：2005-04-20

申请人： Kyle Hanson ,  Steve Eudy ,  Thomas Ritzdorf ,  Gregory Wilson ,  Daniel Woodruff ,  Randy Harris ,  Curtis Weber ,  Tim McGlenn ,  Timothy Anderson ,  Daniel Bexten

发明人： Kyle Hanson ,  Steve Eudy ,  Thomas Ritzdorf ,  Gregory Wilson ,  Daniel Woodruff ,  Randy Harris ,  Curtis Weber ,  Tim McGlenn ,  Timothy Anderson ,  Daniel Bexten

IPC分类号： C25D17/00

CPC分类号： C25D21/12 ,  C23C18/1632 ,  C25D7/123 ,  C25D17/001 ,  C25D17/008 ,  H01L21/67005 ,  H01L21/6723

摘要： Processing tools, components of tools, and methods of making and using such devices for electrochemical processing of microelectronic workpieces. One aspect of the invention is directed toward reaction vessels for electrochemical processing of microelectronic workpieces, processing stations including such reaction vessels, and methods for using these devices. For example, one embodiment of a reaction vessel includes an outer container having an outer wall, a first outlet configured to introduce a primary fluid flow into the outer container, and at least one second outlet configured to introduce a secondary fluid flow into the outer container separate from the primary fluid flow. The reaction vessel can also include at least one electrode, and it can also have a field shaping unit. The field shaping unit, for example, can be a dielectric assembly coupled to the second outlet to receive the secondary flow and configured to contain the secondary flow separate from the primary flow through at least a portion of the outer container. The field shaping unit can also have at least one electrode compartment through which the secondary flow can pass separately from the primary flow. The electrode is positioned in the electrode compartment.

公开(公告)号：US20050000817A1

公开(公告)日：2005-01-06

申请号：US10734100

申请日：2003-12-11

申请人： Paul McHugh ,  Gregory Wilson ,  Daniel Woodruff ,  Nolan Zimmerman ,  James Erickson

发明人： Paul McHugh ,  Gregory Wilson ,  Daniel Woodruff ,  Nolan Zimmerman ,  James Erickson

IPC分类号： C25D5/00

CPC分类号： C25D5/006 ,  C25D5/08 ,  C25D17/001 ,  C25D17/008 ,  C25D17/10 ,  C25D17/12 ,  C25D21/10 ,  C25D21/12 ,  H01L21/6723

摘要： Reactors having multiple electrodes and/or enclosed reciprocating paddles are disclosed. The reactor can include multiple electrodes spaced apart from a process location to provide virtual electrodes proximate to the process location for transferring material to or from the workpiece. A magnet may be positioned proximate to the process plane to orient magnetically sensitive material deposited on the workpiece. The electrodes may be removable from the reactor without passing them through the magnet to reduce interference between the electrodes and the magnet. The workpiece may be carried by a rotatable workpiece support to orient the workpiece for processing. At least one of the electrodes can operate as a current thief to reduce terminal effects at the periphery of the workpiece. An electric field control element positioned between the electrodes and the workpiece circumferentially varies the effect of the thieving electrode current to account for effects created by elongated paddles as they oscillate proximate to the workpiece.

摘要翻译： 公开了具有多个电极和/或封闭的往复式叶片的反应器。 反应器可以包括与处理位置间隔开的多个电极，以提供靠近处理位置的虚拟电极，用于将材料转移到工件或从工件传送材料。 可以将磁体定位成靠近处理平面以定向沉积在工件上的感应敏感材料。 电极可以从反应器中移除，而不会使它们通过磁体，以减少电极和磁体之间的干扰。 工件可以由可旋转的工件支撑件承载以使工件定向以进行加工。 电极中的至少一个可以作为电流窃贼工作，以减少在工件周边处的终端效应。 定位在电极和工件之间的电场控制元件周向地改变了窃电电极电流的影响，以解决细长桨叶在靠近工件振荡时产生的效应。

公开(公告)号：US20070121123A1

公开(公告)日：2007-05-31

申请号：US11288770

申请日：2005-11-28

申请人： Daniel Woodruff ,  Marvin Bernt

发明人： Daniel Woodruff ,  Marvin Bernt

IPC分类号： G01B11/28

CPC分类号： H01L21/67253 ,  H01L22/26 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a workpiece process end point detection system, light is diffused and then light intensity or color is sensed. Optical noise is greatly reduced and more accurate end point detection can be made. A light emitter and a light sensor may be located within a workpiece process chamber. A housing around the light emitter and the light sensor seals out process fluids and also diffuses light passing through. The diffused light may be optically filtered before reaching the light sensor.

摘要翻译： 在工件处理终点检测系统中，光被漫射，然后感测到光强度或颜色。 光学噪声大大降低，可以进行更准确的端点检测。 光发射器和光传感器可以位于工件处理室内。 光发射器周围的壳体和光传感器密封工艺流体，并且散射通过的光。 扩散光可以在到达光传感器之前进行光学滤波。

公开(公告)号：US20080028984A1

公开(公告)日：2008-02-07

申请号：US11579288

申请日：2004-10-20

申请人： William Meredith ,  Joel Anderson ,  John German ,  Daniel Woodruff

发明人： William Meredith ,  Joel Anderson ,  John German ,  Daniel Woodruff

IPC分类号： B32B17/00 ,  G02B1/11

CPC分类号： C03C17/3417 ,  C03C17/34 ,  G02B1/115

摘要： An anti-reflective coating for a substrate which includes an outer metal oxide layer with a refractive index greater than the refractive index of the substrate. The invention also relates to a method for making the anti-reflection coating.

摘要翻译： 一种用于衬底的抗反射涂层，其包括折射率大于衬底的折射率的外部金属氧化物层。 本发明还涉及一种制造抗反射涂层的方法。

公开(公告)号：US20080011334A1

公开(公告)日：2008-01-17

申请号：US11782159

申请日：2007-07-24

申请人： Jason Rye ,  Kyle Hanson ,  Daniel Woodruff

发明人： Jason Rye ,  Kyle Hanson ,  Daniel Woodruff

IPC分类号： B08B3/08

CPC分类号： H01L21/68735 ,  H01L21/67051 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67259 ,  H01L21/68728 ,  H01L21/68785 ,  H01L21/68792

摘要： A centrifugal workpiece processor for processing semiconductor wafers and similar workpieces includes a head which holds and spins the workpiece. The head includes a rotor having a gas system. Gas or air is sprayed or jetted from inlets in the rotor to create a rotational gas flow. The rotational gas flow causes pressure conditions which hold the edges of a first side of the workpiece against an angled annular surface on the rotor. The rotor and the workpiece rotate together. Guide pins adjacent to a perimeter may help to align the workpiece with the rotor. Outlets through the rotor allow gas to flow out of the rotor.

摘要翻译： 用于处理半导体晶片和类似工件的离心工件处理器包括保持和旋转工件的头部。 头包括具有气体系统的转子。 气体或空气从转子中的入口喷射或喷射以产生旋转气体流。 旋转气流导致压力条件，其将工件的第一侧的边缘抵靠在转子上的成角度的环形表面上。 转子和工件一起旋转。 与周边相邻的导销可能有助于将工件与转子对准。 通过转子的出口允许气体流出转子。

公开(公告)号：US20050155864A1

公开(公告)日：2005-07-21

申请号：US11081030

申请日：2005-03-10

申请人： Daniel Woodruff ,  Kyle Hanson ,  Steve Eudy ,  Curtis Weber ,  Randy Harris

发明人： Daniel Woodruff ,  Kyle Hanson ,  Steve Eudy ,  Curtis Weber ,  Randy Harris

IPC分类号： B23H7/26 ,  C25D3/00 ,  C25D5/00 ,  C25D7/12 ,  C25D17/00 ,  C25D21/00

CPC分类号： H01L21/6723 ,  C25D7/123 ,  C25D17/001 ,  C25D17/10 ,  H01L21/6719 ,  H01L21/67751

摘要： An electrochemical processing chamber which can be modified for treating different workpieces and methods for so modifying electrochemical processing chambers. In one particular embodiment, an electrochemical processing chamber 200 includes a plurality of walls 510 defining a plurality of electrode compartments 520, each electrode compartment having at least one electrode 600 therein, and a virtual electrode unit 530 defining a plurality of flow conduits, with at least one of the flow conduits being in fluid communication with each of the electrode compartments. This first virtual electrode unit 530 may be exchanged for a second virtual electrode unit 540, without modification of any of the electrodes 600, to adapt the processing chamber 200 for treating a different workpiece.

摘要翻译： 一种电化学处理室，可用于处理不同的工件和改性电化学处理室的方法。 在一个特定实施例中，电化学处理室200包括限定多个电极隔室520的多个壁510，每个电极室中具有至少一个电极600，以及限定多个流动管道的虚拟电极单元530， 至少一个流动管道与每个电极隔室流体连通。 第一虚拟电极单元530可以被替换为第二虚拟电极单元540，而不改变任何电极600，以使处理室200适应于处理不同的工件。