Flood gun for charge neutralization
    1.
    发明授权
    Flood gun for charge neutralization 有权
    洪水枪用于中和电荷

    公开(公告)号:US07067821B2

    公开(公告)日:2006-06-27

    申请号:US11071998

    申请日:2005-03-04

    IPC分类号: H01J37/30 H01J49/10

    摘要: A flood gun 10 for charge neutralization of an analysis region Ra of a sample S downstream of the flood gun, comprising: a first source 30 of electrons; a second source 50 of positively charged particles; and an extraction and focusing assembly 60,64, arranged to: (i) extract a first, electron beam from the first source and focus the first beam to a first flood area Ae at the analysis region; and (ii) extract a second, positive particle beam from the second source and focus the second beam to a second flood area Ai at the analysis region. The electron beam and the positive particle beam may both be extracted and focused simultaneously, in a single mode of operation or, alternately, in a dual mode of operation. A corresponding method of providing charge neutralization and a spectroscopic system for secondary particle emission analysis are disclosed.

    摘要翻译: 用于对洪水枪下游的样品S的分析区域R a a进行电荷中和的喷枪10,包括:电子的第一源30; 带正电的颗粒的第二源50; 以及提取和聚焦组件60,64,其布置成:(i)从第一源提取第一电子束,并将第一光束聚焦到分析区域处的第一泛洪区域A 1; 和(ii)从第二源提取第二个正的粒子束,并将第二个光束聚焦到分析区域的第二个洪泛区域A 1。 电子束和正粒子束可以在单一操作模式中或者以双重操作模式同时被提取和聚焦。 公开了提供电荷中和的相应方法和用于二次粒子发射分析的光谱系统。

    Spectrometer for surface analysis and method therefor
    2.
    发明授权
    Spectrometer for surface analysis and method therefor 有权
    用于表面分析的光谱仪及其方法

    公开(公告)号:US07714285B2

    公开(公告)日:2010-05-11

    申请号:US11588689

    申请日:2006-10-27

    IPC分类号: G01N23/00

    摘要: A spectrometer (10) for sample surface analysis by irradiation of the surface by primary particles and a corresponding method of surface analysis spectroscopy. The spectrometer (10) provides sample viewing and secondary charged particle collection substantially normal to the sample surface. A collection chamber (22) comprises a secondary charged particle lens arrangement (20) to focus the emitted particles in a downstream direction along a first normal axis (24) and thereby to define a charged particle optical crossover location (25); and a light-reflecting optical element (50) downstream of the lens arrangement and arranged to receive image light (41) and reflect it away from a second normal axis (42) for providing a viewable image of the surface. The optical element (50) is positioned at, or near to, the crossover location (25) and comprises an opening (52) therethrough, such that the focused particles pass through the opening for downstream spectroscopic analysis substantially without obstruction by the optical element.

    摘要翻译: 用于通过初级粒子照射表面进行样品表面分析的光谱仪(10)和相应的表面分析光谱法。 光谱仪(10)提供基本上垂直于样品表面的样品观察和二次带电粒子收集。 收集室(22)包括二次带电粒子透镜装置(20),以沿着第一法线轴线(24)沿下游方向聚焦发射的颗粒,从而限定带电粒子光学交叉位置(25); 以及在所述透镜装置的下游的光反射光学元件(50),并被布置成接收图像光(41)并将其反射离开第二法线轴(42),以提供所述表面的可视图像。 光学元件(50)位于交叉位置(25)处或附近,并且包括通过其的开口(52),使得聚焦的微粒基本上不受光学元件的阻碍而穿过开口进行下游光谱分析。

    X-ray photoelectron spectroscopy analysis system for surface analysis and method therefor
    3.
    发明授权
    X-ray photoelectron spectroscopy analysis system for surface analysis and method therefor 有权
    用于表面分析的X射线光电子能谱分析系统及其方法

    公开(公告)号:US07875857B2

    公开(公告)日:2011-01-25

    申请号:US11866489

    申请日:2007-10-03

    IPC分类号: H01J47/00 H01J49/00 G21K1/06

    摘要: An X-ray photoelectron spectroscopy analysis system for analysing an insulating sample 20, and a method of XPS analysis. The system comprises an X-ray generating means 30 having an exit opening 32 and being arranged to generate primary X-rays 46,56 which pass out of the exit opening in a sample direction towards a sample surface 22 for irradiation thereof. It has been found that the X-ray generating means in use additionally generates unwanted electrons 258 which may pass out of the exit opening substantially in the sample direction and cause undesirable sample charging effects. The system further comprises an electron deflection field generating means 380,480,580 arranged to generate a deflection field upstream of the sample surface. The deflection field is configured to deflect the unwanted electrons away from the sample direction, such that the unwanted electrons are prevented from reaching the sample surface.

    摘要翻译: 用于分析绝缘样品20的X射线光电子能谱分析系统和XPS分析方法。 该系统包括具有出口开口32的X射线产生装置30,并被布置成产生主要X射线46,56,其在取样方向上从出口开口向样品表面22射出,用于照射。 已经发现,使用的X射线产生装置另外产生不想要的电子258,其可以基本上沿着样品方向从出口开口流出,并引起不期望的样品充电效应。 该系统还包括电子偏转场产生装置380,480,580,其被设置为在样本表面上游产生偏转场。 偏转场被配置为使不需要的电子偏离样品方向,使得不需要的电子被阻止到达样品表面。