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1.发明授权公开(公告)号：US07924397B2
公开(公告)日：2011-04-12
申请号：US10702664
申请日：2003-11-06
申请人： Burn Jeng Lin , David Lu
发明人： Burn Jeng Lin , David Lu
CPC分类号： G03F7/70983 , G02B1/105 , G02B1/111 , G02B1/113 , G02B1/115 , G02B1/14 , G02B13/143 , G03F7/70341
摘要： Disclosed is an objective lens adapted for use in liquid immersion photolithography and a method for making such a lens. In one example, the objective lens has multiple lens elements, one of which includes a transparent substrate and a layer of anti-corrosion coating (ACC). The ACC is formed proximate to the transparent substrate and is positioned between a liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid.
摘要翻译： 公开了适用于液浸光刻的物镜和制造这种透镜的方法。 在一个示例中，物镜具有多个透镜元件，其中之一包括透明基板和一层防腐涂层（ACC）。 ACC形成在透明基板附近，并且位于液浸光刻期间使用的液体和透明基板之间，以保护透明基板免于液体。
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公开(公告)号：US20060028628A1
公开(公告)日：2006-02-09
申请号：US11222319
申请日：2005-09-07
申请人： Burn-Jeng Lin , David Lu
发明人： Burn-Jeng Lin , David Lu
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is disclosed. The lens cleaning module includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module is provided adjacent to the scanning stage for cleaning the objective lens in a non-manual cleaning process.
摘要翻译： 公开了一种具有包括物镜的曝光装置的光刻系统的透镜清洁模块。 透镜清洁模块包括用于在物镜下方支撑晶片的扫描台。 在非手动清洁过程中，用于在扫描台附近设置清洁模块以清洁物镜。
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公开(公告)号：US20120038894A1
公开(公告)日：2012-02-16
申请号：US13282745
申请日：2011-10-27
申请人： Burn-Jeng Lin , David Lu
发明人： Burn-Jeng Lin , David Lu
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is disclosed. The lens cleaning module includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module is provided adjacent to the scanning stage for cleaning the objective lens in a non-manual cleaning process.
摘要翻译： 公开了一种具有包括物镜的曝光装置的光刻系统的透镜清洁模块。 透镜清洁模块包括用于在物镜下方支撑晶片的扫描台。 在非手动清洁过程中，用于在扫描台附近设置清洁模块以清洁物镜。
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公开(公告)号：US08054444B2
公开(公告)日：2011-11-08
申请号：US11222319
申请日：2005-09-07
申请人： Burn-Jeng Lin , David Lu
发明人： Burn-Jeng Lin , David Lu
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is provided. The lens cleaning module includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module is provided adjacent to the scanning stage for cleaning the objective lens in a non-manual cleaning process.
摘要翻译： 提供一种具有包括物镜的曝光装置的光刻系统的透镜清洁模块。 透镜清洁模块包括用于在物镜下方支撑晶片的扫描台。 在非手动清洁过程中，用于在扫描台附近设置清洁模块以清洁物镜。
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公开(公告)号：US07420188B2
公开(公告)日：2008-09-02
申请号：US11251330
申请日：2005-10-14
申请人： Ching-Yu Chang , Chin-Hsiang Lin , Burn Jeng Lin , David Lu
发明人： Ching-Yu Chang , Chin-Hsiang Lin , Burn Jeng Lin , David Lu
IPC分类号： G03F7/20
CPC分类号： G03F7/2041 , G03F7/70341 , G03F7/70941
摘要： A method for immersion lithography includes providing a substrate coated with an imaging layer, dispensing a conductive immersion fluid between the substrate and an imaging lens of a lithography system, and performing an exposure process to the imaging layer using a radiation energy through the conductive immersion fluid.
摘要翻译： 一种用于浸没式光刻的方法包括提供涂覆有成像层的基底，在基底和光刻系统的成像透镜之间分配导电浸渍流体，以及使用辐射能量通过导电浸渍流体对成像层进行曝光处理 。
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公开(公告)号：US07224427B2
公开(公告)日：2007-05-29
申请号：US10910480
申请日：2004-08-03
申请人： Ching-Yu Chang , Chien-Hung Lin , Chin-Hsiang Lin , David Lu , Horng-Huei Tseng , Burn-Jeng Lin
发明人： Ching-Yu Chang , Chien-Hung Lin , Chin-Hsiang Lin , David Lu , Horng-Huei Tseng , Burn-Jeng Lin
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A megasonic immersion lithography exposure apparatus and method for substantially eliminating microbubbles from an exposure liquid in immersion lithography is disclosed. The apparatus includes an optical system for projecting light through a mask and onto a wafer.An optical transfer chamber is provided adjacent to the optical system for containing an exposure liquid. At least one megasonic plate operably engages the optical transfer chamber for inducing sonic waves in and eliminating microbubbles from the exposure liquid.
摘要翻译： 公开了一种用于在浸没式光刻中基本上消除曝光液体中的微泡的兆声浸没式光刻曝光装置和方法。 该装置包括用于通过掩模将光投射到晶片上的光学系统。 光学传递室邻近光学系统设置，用于容纳曝光液体。 至少一个兆欧表板可操作地接合光学传递室，用于在曝光液体中引入声波并消除微泡。
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7.发明授权Protective layer on objective lens for liquid immersion lithography applications 有权用于液浸光刻应用的物镜上的保护层公开(公告)号：US08179516B2
公开(公告)日：2012-05-15
申请号：US11548551
申请日：2006-10-11
申请人： Burn Jeng Lin , David Lu
发明人： Burn Jeng Lin , David Lu
CPC分类号： G03F7/70983 , G02B1/105 , G02B1/111 , G02B1/113 , G02B1/115 , G02B1/14 , G02B13/143 , G03F7/70341
摘要： Disclosed is an objective lens adapted for use in liquid immersion photolithography and a method for making such a lens. In one example, the objective lens has multiple lens elements, one of which includes a transparent substrate and a layer of protective coating (PC). The PC is formed proximate to the transparent substrate and is positioned between a liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid.
摘要翻译： 公开了适用于液浸光刻的物镜和制造这种透镜的方法。 在一个示例中，物镜具有多个透镜元件，其中一个透镜元件包括透明基板和一层保护涂层（PC）。 PC形成在透明基板附近，并且位于液浸光刻期间使用的液体和透明基板之间，以保护透明基板免于液体。
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公开(公告)号：US20060028626A1
公开(公告)日：2006-02-09
申请号：US10910480
申请日：2004-08-03
申请人： Ching-Yu Chang , Chien-Hung Lin , Chin-Hsiang Lin , David Lu , Horng-Huei Tseng , Burn-Jeng Lin
发明人： Ching-Yu Chang , Chien-Hung Lin , Chin-Hsiang Lin , David Lu , Horng-Huei Tseng , Burn-Jeng Lin
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A megasonic immersion lithography exposure apparatus and method for substantially eliminating microbubbles from an exposure liquid in immersion lithography is disclosed. The apparatus includes an optical system for projecting light through a mask and onto a wafer. An optical transfer chamber is provided adjacent to the optical system for containing an exposure liquid. At least one megasonic plate operably engages the optical transfer chamber for inducing sonic waves in and eliminating microbubbles from the exposure liquid.
摘要翻译： 公开了一种用于在浸没式光刻中基本上消除曝光液体中的微泡的兆声浸没式光刻曝光装置和方法。 该装置包括用于通过掩模将光投射到晶片上的光学系统。 光学传递室邻近光学系统设置，用于容纳曝光液体。 至少一个兆欧表板可操作地接合光学传递室，用于在曝光液体中引入声波并消除微泡。
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9.发明授权Method and apparatus for providing signature based predictive maintenance in communication networks 有权用于在通信网络中提供基于签名的预测维护的方法和装置公开(公告)号：US08274904B1
公开(公告)日：2012-09-25
申请号：US11067936
申请日：2005-02-28
申请人： David Lu , Hossein Eslambolchi , Paritosh Bajpay , John McCanuel , Roberta Bienfait , Carolyn Bekampis , Mihail Vasilescu , Mark Rogaski , Wen-Jui Li , Mohammed Shariff , Thomas Dickey , John Soares
发明人： David Lu , Hossein Eslambolchi , Paritosh Bajpay , John McCanuel , Roberta Bienfait , Carolyn Bekampis , Mihail Vasilescu , Mark Rogaski , Wen-Jui Li , Mohammed Shariff , Thomas Dickey , John Soares
CPC分类号： H04L1/22
摘要： A method and apparatus for collecting and processing line performance data transmitted over cables, e.g., Y-cables, is disclosed. The present invention applies a method based on specific performance measurements, specific measurement time intervals, and compare results from different measurement time intervals to produce a “signature” that indicates deteriorating performance of a particular Y-cable. Once a “signature” is detected, the method will proactively and automatically generate a trouble ticket to trigger the dispatch maintenance staffs to service the cable, e.g., to perform the replacement of the Y-cable in question, thus completing the predictive maintenance process. A trouble ticket is a record used to report and manage the resolution of network related problems.
摘要翻译： 公开了一种用于收集和处理通过电缆（例如Y电缆）传输的线路性能数据的方法和装置。 本发明应用基于特定性能测量，特定测量时间间隔的方法，并且从不同测量时间间隔比较结果以产生指示特定Y线缆性能下降的“签名”。 一旦检测到“签名”，该方法将主动且自动地生成故障单以触发调度维护人员来维护电缆，例如执行所述Y电缆的更换，从而完成预测维护过程。 故障单是用于报告和管理网络相关问题的解决方案的记录。
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10.发明授权公开(公告)号：US08180716B2
公开(公告)日：2012-05-15
申请号：US12077974
申请日：2008-03-24
申请人： Madhukar Kshirsagar , Muhammad Azam , Angelo Estela , Ajay Joshi , David Lu
发明人： Madhukar Kshirsagar , Muhammad Azam , Angelo Estela , Ajay Joshi , David Lu
CPC分类号： G06F9/5083 , G06F11/3419 , G06F11/3442 , G06F11/3452 , G06F11/3476 , G06F11/3495 , G06F2209/5019
摘要： The invention comprises methods and devices of forecasting future computational needs of an application based on input load, where the application comprises a plurality of processes executed on a plurality of computing devices. The method of the invention proceeds by monitoring at least a computational load characteristic of at least a first process executed on a first computing device and a second process executed on a second computing device. A mathematical relationship between input load and the computational load characteristic is established, and future computational needs are forecasted based on the established mathematical relationship.
摘要翻译： 本发明包括基于输入负载预测应用的未来计算需求的方法和装置，其中应用包括在多个计算设备上执行的多个进程。 本发明的方法通过监视在第一计算设备上执行的至少第一处理和在第二计算设备上执行的第二处理的至少一个计算负载特性来进行。 建立输入负荷与计算负荷特性之间的数学关系，并根据建立的数学关系预测未来的计算需求。
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