利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

9 条记录 (耗时 0.024 秒)

    Method of manufacturing inkjet print head
    1.
    发明授权
    Method of manufacturing inkjet print head 失效
    制造喷墨打印头的方法

    公开(公告)号：US07895750B2

    公开(公告)日：2011-03-01

    申请号：US11875106

    申请日：2007-10-19

    申请人： Byung Ha Park ,  Sung Joon Park ,  Young Ung Ha ,  Kyong Il Kim

    发明人： Byung Ha Park ,  Sung Joon Park ,  Young Ung Ha ,  Kyong Il Kim

    IPC分类号： B23P17/00 ,  G01D15/00 ,  B41J2/045

    CPC分类号： B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1639 ,  B41J2/1642 ,  Y10T29/49124 ,  Y10T29/49126 ,  Y10T29/49128 ,  Y10T29/4913 ,  Y10T29/49146 ,  Y10T29/49401

    摘要： A method of manufacturing an inkjet print head that includes an improved process of forming an ink feed hole, thereby enabling an increase in productivity and a favorable ink supply via the ink feed hole. The method includes preparing a substrate on which a heater to heat an ink is formed on the front side thereof, forming a flow passage formation layer on the front side of the substrate such that the flow passage formation layer defines an ink flow passage, forming a nozzle layer provided with a nozzle on the flow passage formation layer, forming a first protective layer such that the first protective layer covers the flow passage formation layer and the nozzle layer, applying a mask material used to etch the substrate to the rear side of the substrate, applying a second protective layer to the lateral side of the substrate to protect the lateral side of the substrate, and forming an ink feed hole on the substrate by wet etching. Tantalum (Ta) is used as the mask material. Parylene is used as the second protective layer.

    摘要翻译： 一种制造喷墨打印头的方法，其包括形成供墨孔的改进方法，从而能够提高生产率并且通过供墨孔提供良好的供墨。 该方法包括：准备在其前侧形成有加热油墨的加热器的基板，在基板的前侧形成流路形成层，使得流路形成层限定油墨流路，形成 喷嘴层，其在流路形成层上设置有喷嘴，形成第一保护层，使得第一保护层覆盖流路形成层和喷嘴层，将用于蚀刻基板的掩模材料施加到第二保护层的背面 衬底，将第二保护层施加到衬底的侧面以保护衬底的侧面，以及通过湿蚀刻在衬底上形成供墨孔。 使用钽（Ta）作为掩模材料。 聚对二甲苯用作第二保护层。

    METHOD OF MANUFACTURING INKJET PRINT HEAD
    2.
    发明申请
    METHOD OF MANUFACTURING INKJET PRINT HEAD 失效
    制造喷墨打印头的方法

    公开(公告)号：US20080148567A1

    公开(公告)日：2008-06-26

    申请号：US11875106

    申请日：2007-10-19

    申请人： Byung Ha Park ,  Sung Joon Park ,  Young Ung Ha ,  Kyong II Kim

    发明人： Byung Ha Park ,  Sung Joon Park ,  Young Ung Ha ,  Kyong II Kim

    IPC分类号： B21D53/76

    CPC分类号： B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1639 ,  B41J2/1642 ,  Y10T29/49124 ,  Y10T29/49126 ,  Y10T29/49128 ,  Y10T29/4913 ,  Y10T29/49146 ,  Y10T29/49401

    摘要： A method of manufacturing an inkjet print head that includes an improved process of forming an ink feed hole, thereby enabling an increase in productivity and a favorable ink supply via the ink feed hole. The method includes preparing a substrate on which a heater to heat an ink is formed on the front side thereof, forming a flow passage formation layer on the front side of the substrate such that the flow passage formation layer defines an ink flow passage, forming a nozzle layer provided with a nozzle on the flow passage formation layer, forming a first protective layer such that the first protective layer covers the flow passage formation layer and the nozzle layer, applying a mask material used to etch the substrate to the rear side of the substrate, applying a second protective layer to the lateral side of the substrate to protect the lateral side of the substrate, and forming an ink feed hole on the substrate by wet etching. Tantalum (Ta) is used as the mask material. Parylene is used as the second protective layer.

    摘要翻译： 一种制造喷墨打印头的方法，其包括形成供墨孔的改进方法，从而能够提高生产率并且通过供墨孔提供良好的供墨。 该方法包括：准备在其前侧形成有加热油墨的加热器的基板，在基板的前侧形成流路形成层，使得流路形成层限定油墨流路，形成 喷嘴层，其在流路形成层上设置有喷嘴，形成第一保护层，使得第一保护层覆盖流路形成层和喷嘴层，将用于蚀刻基板的掩模材料施加到 衬底，将第二保护层施加到衬底的侧面以保护衬底的侧面，以及通过湿蚀刻在衬底上形成供墨孔。 使用钽（Ta）作为掩模材料。 聚对二甲苯用作第二保护层。

    Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition
    3.
    发明授权
    Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition 失效
    用于形成光敏聚合物复合物的组合物和使用该组合物制备含有银纳米颗粒的光敏聚合物复合物的方法

    公开(公告)号：US07875416B2

    公开(公告)日：2011-01-25

    申请号：US11806902

    申请日：2007-06-05

    申请人： Jong Jin Park ,  Byung Ha Park ,  Young Ung Ha

    发明人： Jong Jin Park ,  Byung Ha Park ,  Young Ung Ha

    IPC分类号： G03F7/06 ,  G03F7/028 ,  G03F7/20

    CPC分类号： G03F7/038 ,  G03F7/027 ,  G03F7/0285 ,  Y10S430/114

    摘要： A liquid-type composition for forming a photosensitive polymer complex and a method of preparing a photosensitive polymer complex containing silver nanoparticles using the same are provided. The composition for forming a photosensitive polymer complex includes a multifunctional epoxy resin, a photoacid generator, an organic solvent and a silver compound, or additionally includes a multifunctional acrylate resin and a photoinitiator, or an additive, e.g., a surfactant or a flow improver. This composition is applied, selectively exposed, and developed, thus preparing a photosensitive polymer complex, which contains silver nanoparticles uniformly dispersed and formed in the polymer pattern portion thereof through photo reduction and is therefore improved in terms of physical or chemical properties, e.g., heat resistance and wear resistance.

    摘要翻译： 提供了一种用于形成光敏聚合物复合物的液体组合物和使用其制备含有银纳米颗粒的光敏聚合物复合物的方法。 用于形成光敏聚合物配合物的组合物包括多官能环氧树脂，光酸产生剂，有机溶剂和银化合物，或者另外包括多官能丙烯酸酯树脂和光引发剂，或添加剂，例如表面活性剂或流动改进剂。 这种组合物被应用，选择性曝光和显影，从而制备光敏聚合物复合物，其包含通过光还原在其聚合物图案部分中均匀分散和形成的银纳米颗粒，因此在物理或化学性质方面得到改进，例如热 电阻和耐磨性。

    Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition
    4.
    发明申请
    Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition 失效
    用于形成光敏聚合物复合物的组合物和使用该组合物制备含有银纳米颗粒的光敏聚合物复合物的方法

    公开(公告)号：US20080166670A1

    公开(公告)日：2008-07-10

    申请号：US11806902

    申请日：2007-06-05

    申请人： Jong Jin Park ,  Byung Ha Park ,  Young Ung Ha

    发明人： Jong Jin Park ,  Byung Ha Park ,  Young Ung Ha

    IPC分类号： G03C1/005 ,  G03C5/04

    CPC分类号： G03F7/038 ,  G03F7/027 ,  G03F7/0285 ,  Y10S430/114

    摘要： A liquid-type composition for forming a photosensitive polymer complex and a method of preparing a photosensitive polymer complex containing silver nanoparticles using the same are provided. The composition for forming a photosensitive polymer complex includes a multifunctional epoxy resin, a photoacid generator, an organic solvent and a silver compound, or additionally includes a multifunctional acrylate resin and a photoinitiator, or an additive, e.g., a surfactant or a flow improver. This composition is applied, selectively exposed, and developed, thus preparing a photosensitive polymer complex, which contains silver nanoparticles uniformly dispersed and formed in the polymer pattern portion thereof through photo reduction and is therefore improved in terms of physical or chemical properties, e.g., heat resistance and wear resistance.

    摘要翻译： 提供了一种用于形成光敏聚合物复合物的液体组合物和使用其制备含有银纳米颗粒的光敏聚合物复合物的方法。 用于形成光敏聚合物配合物的组合物包括多官能环氧树脂，光酸产生剂，有机溶剂和银化合物，或者另外包括多官能丙烯酸酯树脂和光引发剂，或添加剂，例如表面活性剂或流动改进剂。 这种组合物被应用，选择性曝光和显影，从而制备光敏聚合物复合物，其包含通过光还原在其聚合物图案部分中均匀分散和形成的银纳米颗粒，因此在物理或化学性质方面得到改进，例如热 电阻和耐磨性。

    Micro electro mechanical system device and method of manufacturing the same
    5.
    发明授权
    Micro electro mechanical system device and method of manufacturing the same 有权
    微机电系统装置及其制造方法

    公开(公告)号：US08282196B2

    公开(公告)日：2012-10-09

    申请号：US12058946

    申请日：2008-03-31

    申请人： Il Woo Kim ,  Byung Ha Park ,  Moon Chul Lee ,  Dong Sik Shim ,  Kyong Il Kim

    发明人： Il Woo Kim ,  Byung Ha Park ,  Moon Chul Lee ,  Dong Sik Shim ,  Kyong Il Kim

    IPC分类号： B41J2/05

    CPC分类号： B41J2/1601 ,  B33Y80/00 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1639

    摘要： A MEMS (Micro Electro Mechanical System) device and a method of manufacturing the same, in which an detection indicator is formed on a chamber layer stacked on a substrate such that a user easily inspects whether the chamber layer has a required thickness. The MEMS device can include two detection indicators that are formed on the chamber layer and have different depth from each other, or an detection indicator which is formed on the chamber layer and has a tapered sectional shape in which an upper surface of the detection indicator is gradually narrowed in a downward direction such that a user can easily inspect whether the chamber layer has a required thickness. The user can precisely determine whether the chamber layer is planarized to a required thickness by planarizing the detection indicator formed on the chamber layer, and inspecting the detection indicator by using an optical microscope, thereby facilitating inspection for a thickness of the chamber layer.

    摘要翻译： 一种MEMS（微机电系统）装置及其制造方法，其中在层叠在基板上的室层上形成检测指示器，使得用户容易地检查室层是否具有所需的厚度。 MEMS器件可以包括形成在室层上并具有彼此不同深度的两个检测指示器，或者形成在腔室层上并具有锥形截面形状的检测指示器，其中检测指示器的上表面是 在向下的方向上逐渐变窄，使得使用者可以容易地检查腔室层是否具有所需的厚度。 用户可以通过平坦化形成在室层上的检测指示器，并且通过使用光学显微镜检查检测指示器来精确地确定室层是否被平坦化到所需厚度，从而便于检查室层的厚度。

    MICRO ELECTRO MECHANICAL SYSTEM DEVICE AND METHOD OF MANUFACTURING THE SAME
    6.
    发明申请
    MICRO ELECTRO MECHANICAL SYSTEM DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
    微电子机械系统装置及其制造方法

    公开(公告)号：US20080283495A1

    公开(公告)日：2008-11-20

    申请号：US12058946

    申请日：2008-03-31

    申请人： Il Woo KIM ,  Byung Ha Park ,  Moon Chul Lee ,  Dong Sik Shim ,  Kyong Il Kim

    发明人： Il Woo KIM ,  Byung Ha Park ,  Moon Chul Lee ,  Dong Sik Shim ,  Kyong Il Kim

    IPC分类号： C23F1/00 ,  B41J2/015

    CPC分类号： B41J2/1601 ,  B33Y80/00 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1639

    摘要： A MEMS (Micro Electro Mechanical System) device and a method of manufacturing the same, in which an detection indicator is formed on a chamber layer stacked on a substrate such that a user easily inspects whether the chamber layer has a required thickness. The MEMS device can include two detection indicators that are formed on the chamber layer and have different depth from each other, or an detection indicator which is formed on the chamber layer and has a tapered sectional shape in which an upper surface of the detection indicator is gradually narrowed in a downward direction such that a user can easily inspect whether the chamber layer has a required thickness. The user can precisely determine whether the chamber layer is planarized to a required thickness by planarizing the detection indicator formed on the chamber layer, and inspecting the detection indicator by using an optical microscope, thereby facilitating inspection for a thickness of the chamber layer.

    摘要翻译： 一种MEMS（微机电系统）装置及其制造方法，其中在层叠在基板上的室层上形成检测指示器，使得用户容易地检查室层是否具有所需的厚度。 MEMS器件可以包括形成在室层上并具有彼此不同深度的两个检测指示器，或者形成在腔室层上并具有锥形截面形状的检测指示器，其中检测指示器的上表面是 在向下的方向上逐渐变窄，使得使用者可以容易地检查腔室层是否具有所需的厚度。 用户可以通过平坦化形成在室层上的检测指示器，并且通过使用光学显微镜检查检测指示器来精确地确定室层是否被平坦化到所需厚度，从而便于检查室层的厚度。