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公开(公告)号：US20200319447A1
公开(公告)日：2020-10-08
申请号：US16826458
申请日：2020-03-23
Applicant: CANON KABUSHIKI KAISHA
Inventor： Hironobu Fujishima , Hironori Maeda
Abstract: Position detection apparatus includes illumination optical system for illuminating target, detection optical system for forming image of the illuminated target illuminated on photoelectric converter, first array having first aperture stops, second array having second aperture stops, first driving mechanism for arranging the selected first aperture stop on pupil of the illumination optical system by driving the first array such that first aperture stop crossing optical axis of the illumination optical system moves in first direction, second driving mechanism for arranging the selected second aperture stop on pupil of the detection optical system by driving the second array such that second aperture stop crossing optical axis of the detection optical system moves in second direction. The first and second driving mechanisms fine-tune positions of the selected first and second aperture stops in the first and second directions, respectively.
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公开(公告)号：US11231573B2
公开(公告)日：2022-01-25
申请号：US16826458
申请日：2020-03-23
Applicant: CANON KABUSHIKI KAISHA
Inventor： Hironobu Fujishima , Hironori Maeda
Abstract: Position detection apparatus includes illumination optical system for illuminating target, detection optical system for forming image of the illuminated target illuminated on photoelectric converter, first array having first aperture stops, second array having second aperture stops, first driving mechanism for arranging the selected first aperture stop on pupil of the illumination optical system by driving the first array such that first aperture stop crossing optical axis of the illumination optical system moves in first direction, second driving mechanism for arranging the selected second aperture stop on pupil of the detection optical system by driving the second array such that second aperture stop crossing optical axis of the detection optical system moves in second direction. The first and second driving mechanisms fine-tune positions of the selected first and second aperture stops in the first and second directions, respectively.
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Patent Agency Ranking
公开(公告)号：US20150124073A1
公开(公告)日：2015-05-07
申请号：US14397345
申请日：2013-08-29
Applicant: CANON KABUSHIKI KAISHA
Inventor： Hironobu Fujishima , Hideki Morishima , Hiroshi Matsuura
CPC classification number: G02B21/16 , G01N21/6458 , G02B21/0092 , G02B21/06 , G02B21/361
Abstract: The illumination optical system is configured to illuminate a sample placed on an object plane with light. The illumination optical system includes multiple light source areas which are mutually coherent and arranged separately from one another in a pupil plane of the illumination optical system. Among distances from a center of a pupil of the illumination optical system to centers of the multiple light source areas, at least one of the distances is different from the other distances.
Abstract translation: 照明光学系统被配置为用光照射放置在物体平面上的样品。 照明光学系统包括彼此相干并且在照明光学系统的光瞳平面中彼此分开布置的多个光源区域。 在从照明光学系统的瞳孔的中心到多个光源区域的中心的距离中，至少一个距离与其他距离不同。
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公开(公告)号：US10747116B2
公开(公告)日：2020-08-18
申请号：US16292953
申请日：2019-03-05
Applicant: CANON KABUSHIKI KAISHA
Inventor： Hironobu Fujishima
Abstract: There is provided a pattern forming apparatus including a holding unit configured to suction and hold a substrate, and an optical system configured to detect, from a suction surface side of the substrate, an alignment mark formed on the substrate held by the holding unit. The pattern forming apparatus is provided with a wavelength separation element for performing wavelength separation between pattern forming light for forming a pattern on the substrate and alignment mark detection light for detecting the alignment mark.
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公开(公告)号：US10545415B2
公开(公告)日：2020-01-28
申请号：US15926258
申请日：2018-03-20
Applicant: CANON KABUSHIKI KAISHA
Inventor： Hironobu Fujishima
Abstract: A detection apparatus that detects a mark formed on a substrate is provided. The detection apparatus includes a substrate holder configured to hold the substrate, an optical system accommodated in the substrate holder, an image sensor configured to capture an image of the mark from the reverse surface side of the substrate through the optical system, and a processor configured to perform detection processing for the mark based on the image of the mark captured by the image sensor. The processor corrects a detection value of the mark based on the position of the mark on the substrate in the height direction and information concerning the telecentricity of the optical system.
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公开(公告)号：US20190278186A1
公开(公告)日：2019-09-12
申请号：US16292953
申请日：2019-03-05
Applicant: CANON KABUSHIKI KAISHA
Inventor： Hironobu Fujishima
Abstract: There is provided a pattern forming apparatus including a holding unit configured to suction and hold a substrate, and an optical system configured to detect, from a suction surface side of the substrate, an alignment mark formed on the substrate held by the holding unit. The pattern forming apparatus is provided with a wavelength separation element for performing wavelength separation between pattern forming light for forming a pattern on the substrate and alignment mark detection light for detecting the alignment mark.
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7.发明申请公开(公告)号：US20180275535A1
公开(公告)日：2018-09-27
申请号：US15926258
申请日：2018-03-20
Applicant: CANON KABUSHIKI KAISHA
Inventor： Hironobu Fujishima
CPC classification number: G03F9/7088 , G03F7/70216 , G03F7/707 , G03F7/7085 , G03F9/7019 , G03F9/708 , G03F9/7084 , G03F2009/005
Abstract: A detection apparatus that detects a mark formed on a substrate is provided. The detection apparatus includes a substrate holder configured to hold the substrate, an optical system accommodated in the substrate holder, an image sensor configured to capture an image of the mark from the reverse surface side of the substrate through the optical system, and a processor configured to perform detection processing for the mark based on the image of the mark captured by the image sensor. The processor corrects a detection value of the mark based on the position of the mark on the substrate in the height direction and information concerning the telecentricity of the optical system.
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