PLASMA GENERATION APPARATUS, DEPOSITION APPARATUS, AND PLASMA GENERATION METHOD
    2.
    发明申请
    PLASMA GENERATION APPARATUS, DEPOSITION APPARATUS, AND PLASMA GENERATION METHOD 有权
    等离子体生成装置,沉积装置和等离子体生成方法

    公开(公告)号:US20150107987A1

    公开(公告)日:2015-04-23

    申请号:US14391499

    申请日:2013-02-27

    Inventor: Eiji Furuya

    Abstract: Provided is a plasma generation apparatus capable of generating uniform plasma over a wide range. The plasma generation apparatus includes two oppositely arranged plasma guns each injecting a discharge gas to be ionized, and having a cathode for emitting electrons, and a converging coil for forming a magnetic flux to guide the emitted electrons, and polarities of the converging coils with respect to the cathodes in the two plasma guns are opposite to each other.

    Abstract translation: 提供了能够在宽范围内产生均匀等离子体的等离子体产生装置。 等离子体产生装置包括两个相对布置的等离子体枪,每个等离子体枪喷射待离子化的放电气体,并且具有用于发射电子的阴极,以及用于形成用于引导发射的电子的磁通的会聚线圈和会聚线圈的极性 两个等离子体枪中的阴极彼此相对。

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