公开(公告)号：US20140238301A1

公开(公告)日：2014-08-28

申请号：US14233669

申请日：2013-06-20

Applicant: CHUGAI RO CO., LTD.

Inventor： Shinya Akano

IPC: H01J37/32

CPC classification number: H01J37/32669 ,  C23C14/32 ,  C23C14/54 ,  H01J37/32009 ,  H01J37/32357 ,  H01J37/32651 ,  H01J37/3266 ,  H05H1/26

Abstract: The present invention provides a plasma processing apparatus capable of bringing plasma close to a processing target and separating the plasma from the processing target. The plasma processing apparatus 1 according to the present invention has a chamber internally having a holding space 2a in which a processing target object 5 is held, and a plasma space 2b in which plasma is to be formed, a plasma gun 3 for emitting electrons into the plasma space 2b to form the plasma, and at least one pair of position-adjustable opposed magnets 4 for forming a magnetic flux passing across the chamber 2, between the holding space 2a and the plasma space 2b.

Abstract translation: 本发明提供一种等离子体处理装置，其能够使等离子体接近处理对象，并将等离子体与处理对象物分离。 根据本发明的等离子体处理装置1具有内部具有保持处理对象物5的保持空间2a和要形成等离子体的等离子体空间2b的室，用于发射电子的等离子体枪3 用于形成等离子体的等离子体空间2b和用于在保持空间2a和等离子体空间2b之间形成通过室2的磁通的至少一对位置可调的相对磁体4。

公开(公告)号：US08986458B2

公开(公告)日：2015-03-24

申请号：US14233669

申请日：2013-06-20

Applicant: Chugai Ro Co., Ltd.

Inventor： Shinya Akano

IPC: C23C16/00 ,  C23C14/00 ,  C23F1/00 ,  H01L21/306 ,  H01J37/32 ,  C23C14/32 ,  C23C14/54 ,  H05H1/26

CPC classification number: H01J37/32669 ,  C23C14/32 ,  C23C14/54 ,  H01J37/32009 ,  H01J37/32357 ,  H01J37/32651 ,  H01J37/3266 ,  H05H1/26

Abstract: The present invention provides a plasma processing apparatus capable of bringing plasma close to a processing target and separating the plasma from the processing target. The plasma processing apparatus 1 according to the present invention has a chamber internally having a holding space 2a in which a processing target object 5 is held, and a plasma space 2b in which plasma is to be formed, a plasma gun 3 for emitting electrons into the plasma space 2b to form the plasma, and at least one pair of position-adjustable opposed magnets 4 for forming a magnetic flux passing across the chamber 2, between the holding space 2a and the plasma space 2b.

Abstract translation: 本发明提供一种等离子体处理装置，其能够使等离子体接近处理对象，并将等离子体与处理对象物分离。 根据本发明的等离子体处理装置1具有内部具有保持处理对象物5的保持空间2a和要形成等离子体的等离子体空间2b的室，用于发射电子的等离子体枪3 用于形成等离子体的等离子体空间2b和用于在保持空间2a和等离子体空间2b之间形成通过室2的磁通的至少一对位置可调的相对磁体4。