公开(公告)号：US20170351275A1

公开(公告)日：2017-12-07

申请号：US15597921

申请日：2017-05-17

Applicant: CKD CORPORATION

Inventor： Minoru ITO ,  Masayuki WATANABE ,  Seiji HASHIGUCHI

IPC: G05D16/20 ,  F16K51/02 ,  F16K31/06

CPC classification number: F16K51/02 ,  F16J1/008 ,  F16K1/46 ,  G05D16/2053 ,  G05D16/2093

Abstract: A vacuum valve placed between a vacuum vessel and a vacuum pump to adjust a valve opening degree using an operating fluid includes a packing mounted in a recessed groove of a piston. The packing is provided with a contact portion on a radially inner side and a contact portion on a radially outer side, and a slide-contact portion contacting with an inner peripheral surface of a cylinder. A portion between the contact portion and the slide-contact portion has a thin thickness.

公开(公告)号：US20130255793A1

公开(公告)日：2013-10-03

申请号：US13758498

申请日：2013-02-04

Applicant: CKD CORPORATION

Inventor： Masayuki WATANABE ,  Yoshiyuki YAMADA ,  Shunsuke UMEZAWA

IPC: F17D3/00

CPC classification number: F17D3/00 ,  Y10T137/0396 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/86485

Abstract: A fluid control system includes a vacuum chamber, a gas supply source to supply gas as a fluid, an exhaust pipe to discharge the fluid from the vacuum chamber, a gas supply pipe to connect the vacuum chamber to the gas supply source, and a pressure sensor to detect an internal pressure of the vacuum chamber. This system further includes a flowmeter placed between the gas supply source and the vacuum chamber, a proportional valve placed between the flowmeter and the vacuum chamber, a pressure controller to control the proportional valve based on output of the pressure sensor, a metering valve placed on the exhaust pipe, and a flow controller to control the metering valve based on an output of the flowmeter.

Abstract translation: 流体控制系统包括真空室，用于供应气体作为流体的气体供应源，用于从真空室排放流体的排气管，将真空室连接到气体供应源的气体供应管，以及压力 传感器来检测真空室的内部压力。 该系统还包括设置在气体供应源和真空室之间的流量计，放置在流量计和真空室之间的比例阀，压力控制器，用于基于压力传感器的输出来控制比例阀;计量阀， 排气管和流量控制器，以根据流量计的输出来控制计量阀。

公开(公告)号：US20170234437A1

公开(公告)日：2017-08-17

申请号：US15414091

申请日：2017-01-24

Applicant: CKD CORPORATION

Inventor： Yasunori NISHIMURA ,  Masayuki WATANABE ,  Seiji HASHIGUCHI

IPC: F16K1/226

CPC classification number: F16K1/2265 ,  F16K1/2266

Abstract: A vacuum pressure control apparatus includes an annular elastic seal member formed with a valve seat, and a doubly eccentric butterfly valve element configured to come into contact or separate from the valve seat. The vacuum pressure control apparatus is to be placed on a pipe connecting a vacuum chamber and a vacuum pump. The vacuum pressure control apparatus is configured to rotate the butterfly valve element in a first direction from a first valve closed position corresponding to an initial state to change vacuum pressure in the vacuum chamber. The vacuum pressure control apparatus further includes a control unit configured to rotate the butterfly valve element in a direction opposite to a first direction so that the butterfly valve element is moved to a second valve closed position different from the first valve closed position.