公开(公告)号：US20170351275A1

公开(公告)日：2017-12-07

申请号：US15597921

申请日：2017-05-17

Applicant: CKD CORPORATION

Inventor： Minoru ITO ,  Masayuki WATANABE ,  Seiji HASHIGUCHI

IPC: G05D16/20 ,  F16K51/02 ,  F16K31/06

CPC classification number: F16K51/02 ,  F16J1/008 ,  F16K1/46 ,  G05D16/2053 ,  G05D16/2093

Abstract: A vacuum valve placed between a vacuum vessel and a vacuum pump to adjust a valve opening degree using an operating fluid includes a packing mounted in a recessed groove of a piston. The packing is provided with a contact portion on a radially inner side and a contact portion on a radially outer side, and a slide-contact portion contacting with an inner peripheral surface of a cylinder. A portion between the contact portion and the slide-contact portion has a thin thickness.

公开(公告)号：US20170299420A1

公开(公告)日：2017-10-19

申请号：US15516164

申请日：2015-11-05

Applicant: CKD CORPORATION

Inventor： Naoya SHIROYAMA ,  Akihito SUGINO ,  Minoru ITO

IPC: G01F25/00 ,  G01N7/14

CPC classification number: G01F25/0007 ,  G01F25/0053 ,  G01F25/0084 ,  G01N7/14

Abstract: A flow rate verification unit that uses the pressure variation value per unit time of a pressure measurement value measured by a pressure gauge and a temperature measurement value measured by a thermometer in a state where a second shut-off valve is closed to calculate the volume between a flow-rate control valve and the second shut-off valve and verifies the flow rates of mass flow controllers one at a time, wherein a first verification side connection part attachably and detachably connected to an integrated gas unit is provided upstream from the pressure gauge and a serially connected verification gas input valve, verification side mass flow controller, and verification side flow rate control valve are provided in parallel with the second shut-off valve.

公开(公告)号：US20170167026A1

公开(公告)日：2017-06-15

申请号：US15363854

申请日：2016-11-29

Applicant: CKD CORPORATION ,  HORIBA STEC, CO., LTD.

Inventor： Akiko NAKADA ,  Yasunori NISHIMURA ,  Minoru ITO ,  Masami NISHIKAWA ,  Shigeyuki HAYASHI ,  Atsushi IEKI

IPC: C23C16/52 ,  H01L21/66 ,  H01L21/67 ,  C23C16/455

CPC classification number: C23C16/52 ,  C23C16/45561 ,  G01F1/34 ,  G01F3/36 ,  G01F3/38

Abstract: In a gas flow monitoring method using a MFC (a flow control device) for controlling a flow rate of process gas from a process gas supply source and supply the process gas to a predetermined process chamber, a start shut-off valve placed upstream of the MFC, and a pressure gauge placed between the start shut-off valve and the MFC, the start shut-off valve is closed and a drop of pressure on an upstream side of the MFC is measured by the pressure gauge to measure a flow rate of the MFC, thereafter, the start shut-off valve is opened to monitor the flow rate of the MFC. The MFC is switched from an ON state to an OFF state before the start shut-off valve is opened. The method enables in-line monitoring a low rate of process gas without affecting a semiconductor manufacturing process.