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公开(公告)号:US20210252505A1
公开(公告)日:2021-08-19
申请号:US17251010
申请日:2019-06-10
Applicant: CORNING INCORPORATED
Inventor: Donald Erwin Allen , Ye Fang , Jeffrey Glenn Lynn , Barry James Paddock
IPC: B01L3/00
Abstract: A process of manufacturing a microfluidic device (200, 201, 202, 300, 301, 302, 400, 401, 402) includes the steps of attaching a monolayer of polymer beads onto a first substrate (210, 410) depositing a metal oxide film onto the first substrate (210, 410) over the monolayer of polymer beads, and removing the polymer beads to form an array of metal oxide nano-wells (240, 440) wherein the first substrate (210, 410) is exposed at the bottom of the nano-wells (240, 440). The process also includes depositing an organophosphate layer onto the metal oxide film. The process also calls for depositing a silane coating layer or an acrylate polymer onto the exposed first substrate (210, 410). The method further includes bonding a second substrate (220, 420) to the first substrate (210, 410) to enclose the array of metal oxide nano-wells (240, 440) in a cavity within the first and second substrates (210, 220, 410, 420).
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公开(公告)号:US20240427235A1
公开(公告)日:2024-12-26
申请号:US18746402
申请日:2024-06-18
Applicant: CORNING INCORPORATED
Inventor: Robert Alan Bellman , Leonard Charles Dabich, II , Barry James Paddock , Mark Alejandro Quesada , Bin Zhu
Abstract: A method of forming a nanopatterned substrate includes imprinting a deposited photoresist on a substrate with a stamp to form a nanopattern including nanofeatures on the substrate, the nanofeatures including a gap therebetween. The method includes performing glancing angle deposition of a metal on the nanopattern to deposit the metal on the nanofeatures. The method includes directionally etching the nanopattern including the metal in a direction normal to a surface of the nanopattern to remove the photoresist in the gap between the nanofeatures and to expose the substrate in the gap between the nanofeatures. The method includes depositing a deposition material on the directionally etched nanopattern such that the deposition material is deposited on the exposed substrate in the gap between the nanofeatures and on the metal that is on the nanofeatures. The method also includes dissolving the deposited photoresist including the deposited deposition material thereon to remove the photoresist, the metal, and portions of the deposited deposition material that are on the photoresist from the substrate, to form the nanopatterned substrate including the deposition material deposited on the substrate in the gap between the nanofeatures.
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公开(公告)号:US11329228B2
公开(公告)日:2022-05-10
申请号:US16471446
申请日:2017-12-19
Applicant: CORNING INCORPORATED
Inventor: Robert George Manley , Karan Mehrotra , Barry James Paddock , Rajesh Vaddi , Nikolay Zhelev Zhelev , Bin Zhu
Abstract: A method of fabricating microstructures of polar elastomers includes coating a substrate with a dielectric material including a polar elastomer, coating the dielectric material with a photoresist, exposing the photoresist to ultraviolet (UV) light through a photomask to define a pattern on the photoresist, developing the photoresist to form the pattern on the photoresist, etching the dielectric material to transfer the pattern from the photoresist to the dielectric material, and removing the photoresist from the patterned dielectric material.
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公开(公告)号:US20210213448A1
公开(公告)日:2021-07-15
申请号:US17251016
申请日:2019-06-10
Applicant: CORNING INCORPORATED
Inventor: Donald Erwin Allen , Ye Fang , Wei Jiang , Jeffrey Glenn Lynn , Barry James Paddock , Ying Zhang
Abstract: A method of making a microfluidic device (200, 201, 300) can include depositing a layer of photoresist onto a first substrate (210, 270, 310), selectively removing the photoresist to expose portions of the first substrate (210, 270, 310), etching the exposed portions of the first substrate (210, 270, 310) to form an array of nano-wells (240, 340), coating each nano-well (240, 340) with metal oxide, and coating the metal oxide on each nano-well (240, 340) with a first material to increase binding of DNA, proteins, and polynucleotides to the metal oxide. A layer of a second material can be deposited on interstitial areas between the nano-wells (240, 340) to inhibit binding of DNA, proteins, and polynucleotides to the interstitial areas. A second substrate (220, 320) can be bonded to the first substrate (210, 270, 310) to enclose the array of nano-wells (240, 340) in a cavity.
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公开(公告)号:US20210135114A1
公开(公告)日:2021-05-06
申请号:US16471446
申请日:2017-12-19
Applicant: CORNING INCORPORATED
Inventor: Robert George Manley , Karan Mehrotra , Barry James Paddock , Rajesh Vaddi , Nikolay Zhelev Zhelev , Bin Zhu
Abstract: A method of fabricating microstructures of polar elastomers includes coating a substrate with a dielectric material including a polar elastomer, coating the dielectric material with a photoresist, exposing the photoresist to ultraviolet (UV) light through a photomask to define a pattern on the photoresist, developing the photoresist to form the pattern on the photoresist, etching the dielectric material to transfer the pattern from the photoresist to the dielectric material, and removing the photoresist from the patterned dielectric material
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