公开(公告)号：US20150241605A1

公开(公告)日：2015-08-27

申请号：US14623993

申请日：2015-02-17

Applicant: CORNING INCORPORATED

Inventor： Gerald Philip Cox ,  Michael Joseph D'lallo ,  Jean-Francois Oudard ,  Jue Wang

IPC: G02B1/14 ,  C09D1/00

CPC classification number: G02B1/14 ,  C04B41/00 ,  C09D1/00 ,  C23C14/024 ,  C23C14/0694 ,  C23C14/22 ,  G02B1/115 ,  Y10T428/265

Abstract: A coated metal fluoride optic is provided. The coated metal fluoride optic includes an alkaline earth metal fluoride substrate and a coating disposed on at least one surface of the substrate. The coating includes an adhesion layer comprising a fluoride-containing material, a non-densified intermediate layer deposited on the adhesion layer, and a densified capping layer deposited on the intermediate layer.

Abstract translation: 提供涂覆金属氟化物光学元件。 涂覆的金属氟化物光学元件包括碱土金属氟化物基底和设置在基底的至少一个表面上的涂层。 该涂层包括包含含氟化物材料，沉积在粘合层上的非致密化中间层和沉积在中间层上的致密化覆盖层的粘附层。

公开(公告)号：US10295707B2

公开(公告)日：2019-05-21

申请号：US14623993

申请日：2015-02-17

Applicant: Corning Incorporated

Inventor： Gerald Philip Cox ,  Michael Joseph D'lallo ,  Jean-Francois Oudard ,  Jue Wang

IPC: G02B1/14 ,  C09D1/00 ,  G02B1/115 ,  C04B41/00 ,  C23C14/02 ,  C23C14/06 ,  C23C14/22 ,  C30B25/00

Abstract: A coated metal fluoride optic is provided. The coated metal fluoride optic includes an alkaline earth metal fluoride substrate and a coating disposed on at least one surface of the substrate. The coating includes an adhesion layer comprising a fluoride-containing material, a non-densified intermediate layer deposited on the adhesion layer, and a densified capping layer deposited on the intermediate layer.

公开(公告)号：US20180017719A1

公开(公告)日：2018-01-18

申请号：US15649736

申请日：2017-07-14

Applicant: Corning Incorporated

Inventor： Michael Joseph D'lallo ,  Jue Wang

IPC: G02B5/08

CPC classification number: G02B5/0833 ,  G02B1/14 ,  G02B5/0891

Abstract: A method of reducing surface roughness of DUV reflectance coatings for a DUV mirror to improve the reflectance of the DUV mirror includes: forming the reflectance coating on a substrate, the reflectance coating including a film stack comprising multiple dielectric layers, including an uppermost layer. The method also includes adding to the uppermost layer a cap layer comprising SiO2 and having an upper surface with an initial RMS amount of surface roughness. The method further includes adding a sacrificial layer to the upper surface of the cap layer, wherein the sacrificial layer comprises SiO2. The method also includes etching the sacrificial layer down to the cap layer so that the upper surface of the cap layer has a final RMS amount of surface roughness that is less than the initial amount of surface roughness.