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    ENHANCED, DURABLE SILVER COATING STACKS FOR HIGHLY REFLECTIVE MIRRORS
    3.
    发明申请
    ENHANCED, DURABLE SILVER COATING STACKS FOR HIGHLY REFLECTIVE MIRRORS 审中-公开

    公开(公告)号：US20180196173A1

    公开(公告)日：2018-07-12

    申请号：US15916603

    申请日：2018-03-09

    Applicant: Corning Incorporated

    Inventor： Jason S Ballou ,  Frederick J Gagliardi ,  Gary Allen Hart ,  Timothy R Soucy ,  Robin Merchant Walton ,  Leonard Gerard Wamboldt ,  Jue Wang

    IPC: G02B5/08 ,  G02B1/14

    CPC classification number: G02B5/0858 ,  G02B1/14 ,  G02B5/0808 ,  G02B5/0816

    Abstract: The disclosure is directed to a highly reflective multiband mirror that is reflective in the VIS-NIR-SWIR-MWIR-LWIR bands, the mirror being a complete thin film stack that consists of a plurality of layers on a selected substrate. In order from substrate to the final layer, the mirror consists of (a) substrate, (b) barrier layer, (c) first interface layer, (d) a reflective layer, (e) a second interface layer, (f) tuning layer(s) and (g) a protective layer. In some embodiments the tuning layer and the protective layer are combined into a single layer using a single coating material. The multiband mirror is more durable than existing mirrors on light weight metal substrates, for example 6061-Al, designed for similar applications. In each of the five layer types methods and materials are used to process each layer so as to achieve the desired layer characteristics, which aid to enhancing the durability performance of the stack.

    Plasma ion assisted deposition of Mo/Si multilayer EUV coatings
    5.
    发明授权
    Plasma ion assisted deposition of Mo/Si multilayer EUV coatings 有权
    Mo / Si多层EUV涂层的等离子体离子辅助沉积

    公开(公告)号：US08817367B2

    公开(公告)日：2014-08-26

    申请号：US13956816

    申请日：2013-08-01

    Applicant: Corning Incorporated

    Inventor： Horst Schreiber ,  Jue Wang

    IPC: G02B5/08 ,  C23C14/58 ,  G03F1/24 ,  G02B5/28 ,  B82Y40/00 ,  C23C14/22 ,  B82Y10/00 ,  C03C17/36

    CPC classification number: G02B5/283 ,  B82Y10/00 ,  B82Y40/00 ,  C03C17/3636 ,  C03C17/40 ,  C03C2218/32 ,  C23C14/22 ,  C23C14/5833 ,  C23C14/5873 ,  G02B5/0891 ,  G03F1/24

    Abstract: The disclosure is directed to multilayer Mo/Si coatings for reflective mirrors used in extreme ultraviolet lithographic systems and to a method of making such mirrors using plasma ion assisted deposition (PIAD) techniques. The coating are deposited on a substrate suitable for EUV lithography, and are Mo/Si coating consisting of 40-100 Mo/Si periods, each period consisting on a Mo layer followed by a Si layer. Each of the individual Mo and Si layers is deposited to a specified or target thickness in the range of 2 nm to 5 nm, and the thicknesses are controlled to ±0.1 nm. A plasma from a plasma source is used to densify and smooth the substrate prior to deposition of the coating, and each layer of the coating is plasma densified and smoothed.

    Abstract translation: 本公开涉及用于极紫外光刻系统的反射镜的多层Mo / Si涂层以及使用等离子体离子辅助沉积（PIAD）技术制造这种反射镜的方法。 涂层沉积在适用于EUV光刻的基板上，并且是由40-100Mo / Si周期组成的Mo / Si涂层，每个周期由Mo层和Si层组成。 将各个Mo和Si层分别沉积到2nm至5nm范围内的规定或目标厚度，并将其厚度控制在±0.1nm。 使用来自等离子体源的等离子体在沉积涂层之前使衬底致密化和平滑化，并且涂层的每层是等离子体致密化和平滑化的。

    ANTI-REFLECTIVE OPTICAL COATINGS AND METHODS OF FORMING THE SAME
    6.
    发明公开
    ANTI-REFLECTIVE OPTICAL COATINGS AND METHODS OF FORMING THE SAME 审中-公开

    公开(公告)号：US20230161077A1

    公开(公告)日：2023-05-25

    申请号：US17980139

    申请日：2022-11-03

    Applicant: CORNING INCORPORATED

    Inventor： Ming-Huang Huang ,  Hoon Kim ,  Jue Wang

    IPC: G02B1/115 ,  C23C16/455 ,  C23C16/40

    CPC classification number: G02B1/115 ,  C23C16/45527 ,  C23C16/45553 ,  C23C16/405 ,  C23C16/402 ,  C23C16/403

    Abstract: According to at least one feature of the present disclosure, a method of forming a film of an optical element, includes: positioning a substantially transparent lens in a reactor chamber, wherein the lens defines a curved surface; exposing the lens to a first precursor comprising one of lanthanum or gadolinium such that the first precursor is deposited on the curved surface of the lens; exposing the first precursor on the curved surface to a first oxidizer such that the first precursor present on the curved surface of the lens reacts with the first oxidizer to form a high refractive index layer of the film; exposing the high refractive index layer to a second precursor such that the second precursor is deposited on the high refractive index layer; and exposing the second precursor on the high refractive index layer to a second oxidizer such that the second precursor present on the high refractive index layer reacts with the second oxidizer to form a low refractive index layer of the film.

    Methods of reducing surface roughness of reflectance coatings for DUV mirrors
    8.
    发明授权
    Methods of reducing surface roughness of reflectance coatings for DUV mirrors 有权

    公开(公告)号：US10345494B2

    公开(公告)日：2019-07-09

    申请号：US15649736

    申请日：2017-07-14

    Applicant: Corning Incorporated

    Inventor： Michael Joseph D'Iallo ,  Jue Wang

    IPC: G02B1/14 ,  G02B5/08

    Abstract: A method of reducing surface roughness of DUV reflectance coatings for a DUV mirror to improve the reflectance of the DUV mirror includes: forming the reflectance coating on a substrate, the reflectance coating including a film stack comprising multiple dielectric layers, including an uppermost layer. The method also includes adding to the uppermost layer a cap layer comprising SiO2 and having an upper surface with an initial RMS amount of surface roughness. The method further includes adding a sacrificial layer to the upper surface of the cap layer, wherein the sacrificial layer comprises SiO2. The method also includes etching the sacrificial layer down to the cap layer so that the upper surface of the cap layer has a final RMS amount of surface roughness that is less than the initial amount of surface roughness.

    OPTICAL ELEMENTS WITH STRESS-BALANCING COATINGS
    9.
    发明申请
    OPTICAL ELEMENTS WITH STRESS-BALANCING COATINGS 审中-公开

    公开(公告)号：US20180024276A1

    公开(公告)日：2018-01-25

    申请号：US15646883

    申请日：2017-07-11

    Applicant: Corning Incorporated

    Inventor： Jue Wang

    IPC: G02B1/14 ,  G02B1/11 ,  G02B27/14

    CPC classification number: G02B1/14 ,  C23C14/0694 ,  C23C14/083 ,  C23C14/10 ,  C23C14/32 ,  G02B1/11 ,  G02B1/115 ,  G02B27/142

    Abstract: Optical elements with coatings having low surface figure are described. The optical element includes coatings on two or more surfaces. At least one of the coatings includes a stress-compensating layer. In the absence of the stress-compensating layer, the coatings are mismatched in stress. The difference in stress increases surface figure and distorts the wavefront of optical signals that are reflected and/or transmitted through the optical element. The stress-compensating layer acts to reduce mismatch in stress and leads to coatings with reduced surface figure and reduced distortion of wavefronts.

    UV and DUV expanded cold mirrors
    10.
    发明授权
    UV and DUV expanded cold mirrors 有权

    公开(公告)号：US09696467B2

    公开(公告)日：2017-07-04

    申请号：US14602550

    申请日：2015-01-22

    Applicant: Corning Incorporated

    Inventor： Horst Schreiber ,  Jue Wang

    IPC: G02B5/08 ,  G02B5/20 ,  G02B1/10 ,  G02B1/12 ,  G02B5/28

    CPC classification number: G02B5/0891 ,  G02B1/10 ,  G02B1/12 ,  G02B5/0833 ,  G02B5/283

    Abstract: An expanded cold mirror is provided. The mirror includes a substrate and a coating deposited on the substrate. The coating includes a first coating stack comprising at least one period of a low refractive index metal oxide coating layer and a high refractive index metal oxide coating layer, a second coating stack comprising at least one period of a low refractive index metal fluoride coating layer and a high refractive index metal oxide layer, and a third coating stack comprising at least one period of a low refractive index metal fluoride coating layer and a high refractive index metal fluoride coating layer.

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