公开(公告)号：US09977342B2

公开(公告)日：2018-05-22

申请号：US15315168

申请日：2015-06-26

Applicant: CSMC TECHNOLOGIES FAB2 CO., LTD.

Inventor： Zhenhai Yao

IPC: G03F9/00 ,  G03F7/20

CPC classification number: G03F7/70633 ,  G03F1/00 ,  G03F1/38 ,  G03F7/70775 ,  G03F9/7003 ,  G03F9/7019 ,  G03F9/7046 ,  G03F9/7069

Abstract: A lithography stepper alignment and control method, comprising: providing a test template having a plurality of field sizes, and deriving a set of overlay values for each field size (S1); calculating a set of compensation amounts for the overlay value of each field size (S2); and, comparing a set of estimated alignment compensation values for a product with each compensation amount for each field size, selecting as the product alignment compensation values the set of compensation amounts of a field size closest to the set of estimated alignment compensation values, and, using the product alignment compensation values to perform alignment compensation on said product (S3).