公开(公告)号：US20030027499A1

公开(公告)日：2003-02-06

申请号：US10072413

申请日：2002-02-05

Applicant: Cabot Microelectronics Corporation

Inventor： Mingming Fang ,  Christopher C. Streinz ,  Shumin Wang

IPC: B24B001/00

CPC classification number: G11B23/505 ,  B24B37/044

Abstract: A method for polishing computer rigid disks comprising bringing at least one surface of the rigid disk into contact with a polishing pad and applying a composition to the rigid disk comprising at least one hydroxylamine additive and colloidal silica to give a polished rigid disk.

公开(公告)号：US20030209522A1

公开(公告)日：2003-11-13

申请号：US10456858

申请日：2003-06-06

Applicant: Cabot Microelectronics Corporation

Inventor： Steven K. Grumbine ,  Christopher C. Streinz ,  Shumin Wang

IPC: H01L021/304

CPC classification number: C09G1/02 ,  C09K3/1409 ,  C09K3/1436 ,  C09K3/1454 ,  H01L21/3212

Abstract: A polishing composition comprising a dispersion of silane-modified abrasive particles formed by combining at least one metal oxide abrasive having at least one surface metal hydroxide with at least one silane compound and methods for polishing substrate features such as metal features and oxide features using the polishing compositions.

Abstract translation: 一种抛光组合物，其包含通过将至少一种具有至少一种表面金属氢氧化物的至少一种表面金属氢氧化物与至少一种硅烷化合物组合的至少一种金属氧化物磨料形成的硅烷改性磨料颗粒的分散体和使用抛光 组合物。

公开(公告)号：US20030203635A1

公开(公告)日：2003-10-30

申请号：US10419659

申请日：2003-04-21

Applicant: Cabot Microelectronics Corporation

Inventor： Shumin Wang ,  Steven K. Grumbine ,  Christopher C. Streinz ,  Eric W.G. Hoglund

IPC: H01L021/461

CPC classification number: C09K3/1463 ,  C09G1/02 ,  C23F3/00 ,  H01L21/3212

Abstract: Chemical mechanical polishing compositions and slurries comprising a film-forming agent and at least one silane compound wherein the compositions are useful for polishing substrate features such as copper, tantalum, and tantalum nitride features.

Abstract translation: 化学机械抛光组合物和包含成膜剂和至少一种硅烷化合物的浆料，其中该组合物可用于抛光衬底特征如铜，钽和氮化钽的特征。