公开(公告)号：US09828574B2

公开(公告)日：2017-11-28

申请号：US14993837

申请日：2016-01-12

Applicant: Cabot Microelectronics Corporation

Inventor： Roman Ivanov ,  Fernando Hung ,  Cheng-Yuan Ko ,  Fred Sun

IPC: C11D7/32 ,  C11D11/00 ,  H01L21/02 ,  C11D7/06

CPC classification number: C11D11/0047 ,  C11D3/0073 ,  C11D7/06 ,  C11D7/261 ,  C11D7/265 ,  C11D7/32 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/3281 ,  C11D7/329 ,  C11D7/34 ,  H01L21/02074

Abstract: The invention provides a composition for cleaning contaminants from semiconductor wafers following chemical-mechanical polishing. The cleaning composition contains one or more quaternary ammonium hydroxides, one or more organic amines, one or more metal inhibitors, and water. The invention also provides methods for using the cleaning composition.

公开(公告)号：US20160201016A1

公开(公告)日：2016-07-14

申请号：US14993837

申请日：2016-01-12

Applicant: Cabot Microelectronics Corporation

Inventor： Roman Ivanov ,  Fernando Hung ,  Cheng-Yuan Ko ,  Fred Sun

IPC: C11D11/00 ,  H01L21/02 ,  C11D7/32

CPC classification number: C11D11/0047 ,  C11D3/0073 ,  C11D7/06 ,  C11D7/261 ,  C11D7/265 ,  C11D7/32 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/3281 ,  C11D7/329 ,  C11D7/34 ,  H01L21/02074

Abstract: The invention provides a composition for cleaning contaminants from semiconductor wafers following chemical-mechanical polishing. The cleaning composition contains one or more quaternary ammonium hydroxides, one or more organic amines, one or more metal inhibitors, and water. The invention also provides methods for using the cleaning composition.

Abstract translation: 本发明提供了用于在化学机械抛光之后从半导体晶片清洗污染物的组合物。 清洁组合物含有一种或多种季铵氢氧化物，一种或多种有机胺，一种或多种金属抑制剂和水。 本发明还提供了使用清洁组合物的方法。