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公开(公告)号：US20030194482A1
公开(公告)日：2003-10-16
申请号：US10425652
申请日：2003-04-30
IPC分类号： C23C014/00 , C23C014/32 , B05D003/02
CPC分类号： C23C16/545 , G21K5/10 , H01L31/03921 , H01L31/206 , Y02E10/50 , Y02P70/521
摘要： A substrate-processing apparatus comprising at least a substrate delivery chamber, a substrate-processing chamber and a substrate takeup chamber, wherein in said substrate delivery chamber, a web substrate and an interleaf are delivered from a delivery bobbin comprising said web substrate and said interleaf alternately wound while said web substrate delivered is transported into said substrate-processing chamber to process said web substrate therein and said interleaf delivered is wound on an interleaf takeup bobbin; in said substrate takeup chamber, said web substrate transported from said substrate-processing chamber and an interleaf delivered from an interleaf delivery bobbin are alternately wound in a roll form on a substrate takeup bobbin, characterized in that said substrate-processing apparatus is provided with a mechanism for detecting transport abnormality of the interleaf at least either in the substrate delivery chamber or in the substrate takeup chamber in order to previously prevent occurrence of trouble(s) due to transport abnormality of the interleaf during the processing of the web substrate, whereby the web substrate can be efficiently processed as desired.
摘要翻译： 一种基板处理装置，其至少包括基板输送室，基板处理室和基板卷取室，其中在所述基板输送室中，幅材基板和介质从包括所述网状基板和所述介质的输送线轴输送 交替地卷绕，同时将所输送的网状基材输送到所述基板处理室中以在其中处理所述网状基材，并且将所递送的所述中间层卷绕在中间卷绕筒管上; 在所述基板卷取室中，从所述基板处理室输送的所述网状基板和从中间输送线轴输送的中间层以卷状交替地卷绕在基板卷绕筒管上，其特征在于，所述基板处理装置设置有 至少在衬底输送室或衬底收容室中检测插入物的运输异常的机构，以便防止在纸幅衬底的加工期间由于插入物的运输异常而发生故障， 可以根据需要高效地处理网状基材。
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公开(公告)号：US20040163593A1
公开(公告)日：2004-08-26
申请号：US10745604
申请日：2003-12-29
发明人： Yukito Aota , Masahiro Kanai , Atsushi Koike , Tomokazu Sushihara
IPC分类号： C23C016/00
CPC分类号： H01J37/32174 , H01J37/32082
摘要： A plasma-processing apparatus having a high frequency power application electrode in which a plasma is generated by supplying a VHF power to said high frequency power application electrode, characterized in that said plasma-processing apparatus has an impedance matching equipment comprising a capacitive element and an inductive element which are mutually connected in series connection and which is arranged such that said capacitive element and said inductive element of said impedance matching equipment are symmetrical to the center of said high frequency power application electrode.
摘要翻译： 一种具有高频功率施加电极的等离子体处理装置，其中通过向所述高频电力施加电极提供VHF电力而产生等离子体，其特征在于，所述等离子体处理装置具有包括电容元件和 电感元件，它们串联连接并且被布置成使得所述阻抗匹配设备的所述电容元件和所述电感元件与所述高频功率施加电极的中心对称。
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公开(公告)号：US20030010623A1
公开(公告)日：2003-01-16
申请号：US10195543
申请日：2002-07-16
IPC分类号： C23C014/32 , C25B013/00
CPC分类号： C23C14/564 , C23C14/562 , H01L31/20 , Y02E10/50
摘要： A gas adsorptive member is disposed in a space communicating with film deposition chambers, and deposition films are deposited while continuously feeding gas components released from this member, thereby enabling the high quality and uniform deposition films to be formed on the substrate with good reproducibility.
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