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    Transparent substrate comprising an antireflection coating
    4.
    发明申请
    Transparent substrate comprising an antireflection coating 审中-公开
    包含抗反射涂层的透明基材

    公开(公告)号：US20070188871A1

    公开(公告)日：2007-08-16

    申请号：US10567901

    申请日：2004-07-27

    申请人： Carinne Fleury ,  Nicolas Nadaud ,  Sylvain Belliot

    发明人： Carinne Fleury ,  Nicolas Nadaud ,  Sylvain Belliot

    IPC分类号： G02B1/10

    CPC分类号： C03C17/3626 ,  B32B17/10036 ,  B32B17/10761 ,  C03C17/3435 ,  C03C17/3441 ,  C03C17/36 ,  C03C17/3657 ,  C03C17/3681 ,  C03C2217/734 ,  C03C2217/78

    摘要： Transparent substrate (6) comprising an antireflection coating on at least one of its faces, especially at normal incidence, made from a thin-film multilayer (A), characterized in that the multilayer comprises, in succession: a first layer (1), having a refractive index n1 of between 1.8 and 2.3 and a geometrical thickness e1 of between 5 and 50 nm; a second layer (2), having a refractive index n2 of between 1.35 and 1.65 and a geometrical thickness e2 of between 5 and 50 nm; a third layer (3), having a refractive index n3 of between 1.8 and 2.3 and a geometrical thickness e3 of between 40 and 150 nm; and a fourth layer (4), having a refractive index n4 of between 1.35 and 1.65 and a geometrical thickness e4 of between 40 and 150 nm.

    摘要翻译： 透明基材（6）在薄膜多层（A）制成的其至少一个表面上的至少一个表面上，特别是在垂直入射处包括抗反射涂层，其特征在于，所述多层包括：第一层（1）， 折射率n1在1.8和2.3之间，几何厚度e1在5和50nm之间; 第二层（2），其折射率n2在1.35和1.65之间，几何厚度e2在5和50nm之间; 第三层（3），折射率n3在1.8和2.3之间，几何厚度e3在40和150nm之间; 和第四层（4），其折射率n4在1.35和1.65之间，几何厚度e4在40和150nm之间。

    Transparent substrate comprising antiglare coating
    5.
    发明申请
    Transparent substrate comprising antiglare coating 审中-公开
    包含防眩涂层的透明基材

    公开(公告)号：US20060165963A1

    公开(公告)日：2006-07-27

    申请号：US10519098

    申请日：2003-07-02

    申请人： Carinne Fleury ,  Thibaut Heitz ,  Nicolas Nadaud

    发明人： Carinne Fleury ,  Thibaut Heitz ,  Nicolas Nadaud

    IPC分类号： B32B7/02

    CPC分类号： G02B1/115 ,  B32B17/10174 ,  B32B17/10376 ,  C03C17/3417 ,  C03C17/3435 ,  G02B1/116 ,  Y10T428/24942

    摘要： A transparent substrate (6), comprising on at least one of its faces an antireflection coating, particularly at normal incidence made of a multilayer (A) of thin layers, characterized in that the multilayer comprises, in succession: a first layer (1), with a refractive index n1 of between 1.8 and 2.2 and geometrical thickness e1 of between 5 and 50 nm, a second layer (2), with a refractive index n2 of between 1.35 and 1.65 and a geometrical thickness e2 of between 5 and 50 nm, a third layer (3) with a refractive index n3 of between 1.8 and 2.2 and a geometrical thickness e3 of between 40 and 150 nm, a fourth layer (4) with a refractive index n4 of between 1.35 and 1.65 and a geometrical thickness e4 of between 40 and 150 nm,

    摘要翻译： 一种透明衬底（6），在其至少一个表面上包括抗反射涂层，特别是在由多层（A）薄层制成的正常入射处，其特征在于，所述多层包括：第一层（1） ，折射率n <1，在1.8和2.2之间，几何厚度e 1在5和50nm之间，第二层（2）具有折射率n 在5和50nm之间的几何厚度e 2 <2，在1.35和1.65之间，第三层（3）的折射率为n 3 / 的范围在1.8到2.2之间，几何厚度e 3在40和150nm之间，第四层（4）的折射率n <4 < 介于40和150nm之间的几何厚度e <4 <

    SUBSTRATE WHICH IS EQUIPPED WITH A STACK HAVING THERMAL PROPERTIES
    6.
    发明申请
    SUBSTRATE WHICH IS EQUIPPED WITH A STACK HAVING THERMAL PROPERTIES 审中-公开
    带有具有热性能的堆叠的基板

    公开(公告)号：US20100062245A1

    公开(公告)日：2010-03-11

    申请号：US12092083

    申请日：2006-11-08

    申请人： Estelle Martin ,  Nicolas Nadaud ,  Sylvain Belliot ,  Eric Mattmann ,  Pascal Reutler

    发明人： Estelle Martin ,  Nicolas Nadaud ,  Sylvain Belliot ,  Eric Mattmann ,  Pascal Reutler

    IPC分类号： B32B5/00 ,  B32B9/00 ,  B32B15/04 ,  B32B17/06 ,  B32B1/00 ,  C23C14/34

    CPC分类号： B32B17/10174 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/366 ,  Y10T428/24628 ,  Y10T428/265 ,  Y10T428/31678

    摘要： The invention relates to a substrate (10), especially a transparent glass substrate, provided with a thin-film multilayer coating comprising an alternation of n functional layers (40) having reflection properties in the infrared and/or in solar radiation, especially metallic functional layers based on silver, and (n+1) dielectric films (20, 60), where n≧1, said films being composed of a layer or a plurality of layers (22, 24, 62, 64), so that each functional layer (40) is placed between at least two dielectric films (20, 60), characterized in that at least one functional layer (40) includes a blocker film (30, 50) consisting of: on the one hand, an interface layer (32, 52) immediately in contact with said functional layer, this interface layer being made of a material that is not a metal; and on the other hand, at least one metal layer (34, 54) made of a metallic material, immediately in contact with said interface layer (32, 52).

    摘要翻译： 本发明涉及一种设置有薄膜多层涂层的基板（10），特别是透明玻璃基板，其包括在红外线和/或太阳辐射中具有反射特性的n个功能层（40）的交替，特别是金属功能 基于银的层，以及（n + 1）介电膜（20,60），其中n≥1，所述膜由一层或多层（22,24,62,64）组成，使得每个功能 层（40）被放置在至少两个电介质膜（20,60）之间，其特征在于，至少一个功能层（40）包括阻挡膜（30,50），其包括：一方面，界面层 32,52）与所述功能层立即接触，该界面层由不是金属的材料制成; 另一方面，由金属材料制成的至少一个金属层（34,54），其立即与所述界面层（32,52）接触。

    Thin film deposition method
    8.
    发明授权
    Thin film deposition method 有权
    薄膜沉积法

    公开(公告)号：US08815340B2

    公开(公告)日：2014-08-26

    申请号：US13148826

    申请日：2010-03-10

    申请人： Guillaume Bignon ,  Nicolas Nadaud ,  Binh Tran ,  Se-Jong Kim

    发明人： Guillaume Bignon ,  Nicolas Nadaud ,  Binh Tran ,  Se-Jong Kim

    IPC分类号： B05D3/08

    CPC分类号： C03C17/002 ,  C03C2218/156 ,  C03C2218/32 ,  C03C2218/345 ,  C23C14/5806

    摘要： The subject of the invention is a heat treatment process by flame treatment of at least one thin film deposited on a glass substrate (1) running in the path of at least one flame treatment device comprising at least one burner (2), said treatment being able to increase the degree of crystallization of said at least one thin film and/or to increase the size of the crystallites in said at least one thin film, said process being characterized in that the maximum transient bending “b” is less than 150 mm and respects the following condition: b≦0.9×d where the bending “b” corresponds to the distance, expressed in mm, between the plane of the substrate without heating (P1) and the point of the substrate closest to the plane (P2) passing through the tip (6) of the burner (2) and parallel to the plane of the substrate without heating (P1), “d” corresponds to the distance between the plane of the substrate without heating (P1) and the tip (6) of the burner (2), expressed in mm, the width of the substrate “L” in a direction perpendicular to the run direction (5) being greater than or equal to 1.1 m.

    摘要翻译： 本发明的主题是通过火焰处理沉积在包括至少一个燃烧器（2）的至少一个火焰处理装置的路径中的玻璃基板（1）上的至少一个薄膜的热处理工艺，所述处理是 能够增加所述至少一个薄膜的结晶度和/或增加所述至少一个薄膜中的微晶尺寸，所述方法的特征在于最大瞬态弯曲“b”小于150mm 并且满足以下条件：b＆nlE; 0.9×d其中弯曲“b”对应于不加热衬底的平面（P1）与最接近平面（P2）的衬底的点之间的距离（以mm表示） 通过燃烧器（2）的尖端（6）并且平行于基板的平面而不加热（P1），“d”对应于基板的平面与加热（P1）之间的距离和尖端（6） ）的燃烧器（2），以mm表示， 在与行进方向（5）垂直的方向上的基板“L”的宽度大于或等于1.1μm。

    Substrate comprising a stack having thermal properties
    9.
    发明授权
    Substrate comprising a stack having thermal properties 有权
    底物包括具有热性质的叠层

    公开(公告)号：US08420207B2

    公开(公告)日：2013-04-16

    申请号：US12281774

    申请日：2007-03-06

    申请人： Pascal Reutler ,  Nicolas Nadaud ,  Estelle Martin ,  Laurent Labrousse

    发明人： Pascal Reutler ,  Nicolas Nadaud ,  Estelle Martin ,  Laurent Labrousse

    IPC分类号： B32B17/06 ,  C23C14/34 ,  C23C14/35

    CPC分类号： B32B17/10036 ,  B32B17/10018 ,  B32B17/10174 ,  B32B17/10761 ,  B32B17/10788 ,  C03C17/36 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3668 ,  C03C17/3681 ,  Y10T428/2495 ,  Y10T428/24975

    摘要： The invention relates to a substrate (10), provided with a thin-film multilayer comprising an alternation of n functional layers (40, 80) having reflection properties in the infrared and/or in solar radiation and (n+1) coatings (20, 60, 100), where n is an integer ≧2, said coatings being composed of a plurality of dielectric layers (24, 26; 64, 66; 104), so that each functional layer (40, 80) is placed between two coatings (20, 60, 100), at least two functional layers (40, 80) each being deposited on a wetting layer (30, 70) itself deposited respectively directly onto a subjacent coating (20, 60), characterized in that two subjacent coatings (20, 60) each comprise at least one dielectric layer (24, 64) and at least one noncrystalline smoothing layer (26, 66) made from a material that is different from the material of said dielectric layer within each coating, said smoothing layer (26, 66) being in contact with said superjacent wetting layer (30, 70) and in that these two subjacent coatings (20, 60) being of different thicknesses, the thickness of the smoothing layer (26, 66) of the subjacent coating (20, 60) that has a total thickness of less than that of the other subjacent coating (60, 20) is less than or equal to the thickness of the smoothing layer (66, 26) of this other subjacent coating (60, 20).

    摘要翻译： 本发明涉及一种具有薄膜多层体的基片（10），该薄膜多层包括在红外和/或太阳辐射和（n + 1）涂层（20）中具有反射特性的n个功能层（40,80） ，60,100），其中n是≥2的整数，所述涂层由多个介电层（24,26; 64,66; 104）组成，使得每个功能层（40,80）位于两个 涂层（20,60,100），至少两个功能层（40,80）分别沉积在分别直接沉积在下层涂层（20,60）上的润湿层（30,70）上，其特征在于两个下层 涂层（20,60）各自包括至少一个介电层（24,64）和至少一个不同于每个涂层内的所述介电层材料的材料制成的非结晶平滑层（26,66），所述平滑化 层（26,66）与所述相邻的润湿层（30,70）接触，并且这两个下相 （20,60）的厚度不同于所述下层涂层（20,60）的平滑层（26,66）的总厚度小于所述另一个下层涂层（60,20）的厚度， 小于或等于该另一相邻涂层（60,20）的平滑层（66,26）的厚度。

    Substrate, in particular glass substrate, supporting at least one stack of a photocatalytic layer and a sublayer for the heteroepitaxial growth of said layer
    10.
    发明授权
    Substrate, in particular glass substrate, supporting at least one stack of a photocatalytic layer and a sublayer for the heteroepitaxial growth of said layer 失效
    基板，特别是玻璃基板，支撑至少一层光催化层和用于所述层的异质外延生长的子层

    公开(公告)号：US07737080B2

    公开(公告)日：2010-06-15

    申请号：US10576724

    申请日：2004-10-22

    申请人： Laurent Labrousse ,  Nicolas Nadaud

    发明人： Laurent Labrousse ,  Nicolas Nadaud

    IPC分类号： B01J21/06 ,  B01J23/02 ,  C23C16/40

    CPC分类号： C03C17/3417 ,  C03C17/3435 ,  C03C25/52 ,  C03C2217/71

    摘要： The invention relates to a structure, comprising a substrate supporting a layer with a photocatalytic and anti-soiling property on at least part of the surface thereof, said layer being based on titanium dioxide (TiO2) which is at least partially crystallized in the anatase form thereof. Said structure is characterised in comprising a sublayer (SC) directly under at least one TiO2 layer, said sublayer having a crystallographic structure which provides assistance to crystallization by heteroepitaxial growth in the anatase form of the TiO2-based upper layer, the photocatalytic property being obtained without any heating step.

    摘要翻译： 本发明涉及一种结构，其包括在其表面的至少一部分上支撑具有光催化和抗污染性质的层的基底，所述层基于二氧化钛（TiO 2），其以锐钛矿形式至少部分结晶 其中。 所述结构的特征在于，在至少一个TiO 2层下方具有亚层（SC），所述子层具有通过在锐钛矿形式的TiO 2类上层中异质外延生长而提供结晶的结晶结构，获得光催化性能 没有任何加热步骤。