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公开(公告)号：US20130132037A1
公开(公告)日：2013-05-23
申请号：US13747118
申请日：2013-01-22
申请人： Carl Zeiss SMT GmbH
发明人： Christian Kempter
CPC分类号： G06F15/00 , G01J3/00 , G03F7/70116 , G03F7/70508
摘要： A microlithographic projection exposure apparatus has a measuring device, by which a sequence of measurement values can be generated, and a processing unit for processing the measurement values. The processing unit has a processing chain which includes a plurality of digital signal processors. The first digital signal processor in the processing chain is connected to the measuring device to receive the sequence of measurement values. Each subsequent digital signal processor in the processing chain is connected to a respectively preceding digital signal processor in the processing chain. The digital signal processors are programmed so that each digital signal processor processes only a fraction of the measurement values and generates processing results therefrom, and forwards the remaining fraction of the measurement values to the respective next digital signal processor in the processing chain for processing.
摘要翻译： 微光刻投影曝光装置具有测量装置，通过该测量装置可以产生一系列测量值，以及处理单元，用于处理测量值。 处理单元具有包括多个数字信号处理器的处理链。 处理链中的第一个数字信号处理器连接到测量装置以接收测量值序列。 处理链中的每个随后的数字信号处理器连接到处理链中的分别在前的数字信号处理器。 对数字信号处理器进行编程，使得每个数字信号处理器只处理测量值的一部分，并从中产生处理结果，并将测量值的剩余部分转发到处理链中的相应的下一个数字信号处理器进行处理。
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公开(公告)号：US20170023869A1
公开(公告)日：2017-01-26
申请号：US15283659
申请日：2016-10-03
申请人： Carl Zeiss SMT GmbH
IPC分类号： G03F7/20
CPC分类号： G03F7/70766 , G02B7/181 , G02B7/1828 , G03F7/70758 , G03F7/70825 , G03F7/70891
摘要： The disclosure relates to a method and an arrangement for actuating an element in a system for microlithography. According to an aspect in at least one degree of freedom an actuator force is exerted on the element via at least two actuator components. The actuator components are driven independently of one another for generating the actuator force. Driving is effected so that a thermal power introduced into the system on account of the generation of the actuator force by the actuator components deviates from a predefined constant value by not more than 20%.
摘要翻译： 本公开涉及一种用于致动用于微光刻的系统中的元件的方法和装置。 根据至少一个自由度的方面，致动器力经由至少两个致动器部件施加在元件上。 致动器部件彼此独立地驱动以产生致动器力。 进行驱动，使得由于致动器部件的致动器力的产生引入系统的热功率偏离预定的常数值不大于20％。
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公开(公告)号：US10128429B2
公开(公告)日：2018-11-13
申请号：US15608397
申请日：2017-05-30
申请人： Carl Zeiss SMT GmbH
发明人： Christian Kempter , Ulrich Korten , Juergen Anic
摘要： A piezoelectric positioning device (1) has at least one piezoelectric actuator (3) having a first connection contact (4) and a second connection contact (5). A control device (6) with digital/analog converters (12, 16) connected to the connection contacts (4, 5) is used to control the at least one piezoelectric actuator (3). In comparison with a coarse converter (12), a fine converter (16) has a comparatively smaller voltage range and lower voltage levels, with the result that a high degree of positioning accuracy can be achieved.
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公开(公告)号：US20130088698A1
公开(公告)日：2013-04-11
申请号：US13687887
申请日：2012-11-28
申请人： Carl Zeiss SMT GmbH
发明人： Jan Horn , Christian Kempter
IPC分类号： G03B27/72
CPC分类号： G03F7/70116 , G02B26/0841 , G02B27/0043 , G03B27/72 , G03F7/70075 , G03F7/702 , G03F7/70525
摘要： A micromirror of a micromirror array in an illumination system of a microlithographic projection exposure apparatus can be tilted through a respective tilt angle about two tilt axes. The micromirror is assigned three actuators which can respectively be driven by control signals in order to tilt the micromirror about the two tilt axes. Two control variables are specified, each of which is assigned to one tilt axis and which are both assigned to unperturbed tilt angles. For any desired combinations of the two control variables, as a function of the two control variables, one of the three actuators is selected and its control signal is set to a constant value, in particular zero. The control signals are determined so that, when the control signals are applied to the other two actuators, the micromirror adopts the unperturbed tilt angles as a function of the two control variables.
摘要翻译： 在微光刻投影曝光装置的照明系统中的微镜阵列的微反射镜可以通过围绕两个倾斜轴的相应倾斜角度倾斜。 微镜分配有三个致动器，它们可以分别由控制信号驱动，以便围绕两个倾斜轴倾斜微镜。 指定了两个控制变量，每个控制变量分配给一个倾斜轴，并分配给不受干扰的倾斜角。 对于两个控制变量的任何期望的组合，作为两个控制变量的函数，选择三个致动器中的一个，并且其控制信号被设置为恒定值，特别是零。 确定控制信号，使得当控制信号被施加到另外两个致动器时，微反射镜采用不受扰动的倾斜角度作为两个控制变量的函数。
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公开(公告)号：US10078271B2
公开(公告)日：2018-09-18
申请号：US14334281
申请日：2014-07-17
申请人： Carl Zeiss SMT GmbH
发明人： Severin Waldis , Matthias Orth , Roger Marc Bostock , Jian Deng , Sebastian Lani , Benedikt Knauf , Christian Kempter
CPC分类号： G03F7/702 , G02B7/1827 , G02B19/0023 , G02B19/0047 , G02B26/0833 , G03F7/00 , G03F7/70075 , G03F7/70116 , G03F7/7015 , G03F7/70291
摘要： An optical component comprises a mirror array having a multiplicity of mirror elements, which are each connected to at least one actuator for displacement, a multiplicity of signal lines for the signal-transmitting connection of the actuators to an external, global control/regulating device for predefining an absolute position of the individual mirror elements, and a multiplicity of local regulating devices for regulating the positioning of the mirror elements, wherein the regulating devices are in each case completely integrated into the component.
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公开(公告)号：US10061202B2
公开(公告)日：2018-08-28
申请号：US13687887
申请日：2012-11-28
申请人： Carl Zeiss SMT GmbH
发明人： Jan Horn , Christian Kempter
CPC分类号： G03F7/70116 , G02B26/0841 , G02B27/0043 , G03B27/72 , G03F7/70075 , G03F7/702 , G03F7/70525
摘要： A micromirror of a micromirror array in an illumination system of a microlithographic projection exposure apparatus can be tilted through a respective tilt angle about two tilt axes. The micromirror is assigned three actuators which can respectively be driven by control signals in order to tilt the micromirror about the two tilt axes. Two control variables are specified, each of which is assigned to one tilt axis and which are both assigned to unperturbed tilt angles. For any desired combinations of the two control variables, as a function of the two control variables, one of the three actuators is selected and its control signal is set to a constant value, in particular zero. The control signals are determined so that, when the control signals are applied to the other two actuators, the micromirror adopts the unperturbed tilt angles as a function of the two control variables.
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公开(公告)号：US09767068B2
公开(公告)日：2017-09-19
申请号：US13747118
申请日：2013-01-22
申请人： Carl Zeiss SMT GmbH
发明人： Christian Kempter
CPC分类号： G06F15/00 , G01J3/00 , G03F7/70116 , G03F7/70508
摘要： A microlithographic projection exposure apparatus has a measuring device, by which a sequence of measurement values can be generated, and a processing unit for processing the measurement values. The processing unit has a processing chain which includes a plurality of digital signal processors. The first digital signal processor in the processing chain is connected to the measuring device to receive the sequence of measurement values. Each subsequent digital signal processor in the processing chain is connected to a respectively preceding digital signal processor in the processing chain. The digital signal processors are programmed so that each digital signal processor processes only a fraction of the measurement values and generates processing results therefrom, and forwards the remaining fraction of the measurement values to the respective next digital signal processor in the processing chain for processing.
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公开(公告)号：US10025203B2
公开(公告)日：2018-07-17
申请号：US15283659
申请日：2016-10-03
申请人： Carl Zeiss SMT GmbH
摘要： The disclosure relates to a method and an arrangement for actuating an element in a system for microlithography. According to an aspect in at least one degree of freedom an actuator force is exerted on the element via at least two actuator components. The actuator components are driven independently of one another for generating the actuator force. Driving is effected so that a thermal power introduced into the system on account of the generation of the actuator force by the actuator components deviates from a predefined constant value by not more than 20%.
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公开(公告)号：US20140327896A1
公开(公告)日：2014-11-06
申请号：US14334281
申请日：2014-07-17
申请人： Carl Zeiss SMT GmbH
发明人： Severin Waldis , Matthias Orth , Roger Marc Bostock , Jian Deng , Sebastian Lani , Benedikt Knauf , Christian Kempter
IPC分类号： G03F7/20
CPC分类号： G03F7/702 , G02B7/1827 , G02B19/0023 , G02B19/0047 , G02B26/0833 , G03F7/00 , G03F7/70075 , G03F7/70116 , G03F7/7015 , G03F7/70291
摘要： An optical component comprises a mirror array having a multiplicity of mirror elements, which are each connected to at least one actuator for displacement, a multiplicity of signal lines for the signal-transmitting connection of the actuators to an external, global control/regulating device for predefining an absolute position of the individual mirror elements, and a multiplicity of local regulating devices for regulating the positioning of the mirror elements, wherein the regulating devices are in each case completely integrated into the component.
摘要翻译： 光学部件包括具有多个反射镜元件的反射镜阵列，每个反射镜元件各自连接至至少一个用于位移的致动器，用于将致动器的信号传输连接到外部全局控制/调节装置的多条信号线， 预先定义各个镜像元件的绝对位置，以及用于调节镜元件的定位的多个局部调节装置，其中调节装置在每种情况下完全集成到部件中。
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