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公开(公告)号：US20130050673A1
公开(公告)日：2013-02-28
申请号：US13661381
申请日：2012-10-26
申请人： CARL ZEISS SMT GMBH
发明人： Ingo Saenger , Olaf Dittmann , Joerg Zimmermann
CPC分类号： G03F7/70116 , G03F7/70566
摘要： An optical system of a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes a polarization-influencing optical arrangement including a first lambda/2 plate and at least one additional lambda/2 plate.
摘要翻译： 微光刻投影曝光装置的光学系统包括具有多个镜元件的至少一个反射镜装置，所述多个反射镜元件可彼此独立地移位，以改变由反射镜装置反射的光的角分布。 光学系统还包括偏振影响光学装置，其包括第一λ/ 2板和至少一个附加的λ/ 2板。
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公开(公告)号：US09946161B2
公开(公告)日：2018-04-17
申请号：US13660146
申请日：2012-10-25
申请人： Carl Zeiss SMT GmbH
发明人： Ingo Saenger , Ralf Scharnweber , Olaf Dittmann , Toralf Gruner , Gundula Weiss , Andras G. Major , Martin Vogt , Markus Deguenther , Johannes Wangler , Thomas Korb , Severin Waldis
CPC分类号： G03F7/70116 , G03F7/70566
摘要： An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.
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3.发明授权公开(公告)号：US09581910B2
公开(公告)日：2017-02-28
申请号：US14747441
申请日：2015-06-23
申请人： Carl Zeiss SMT GmbH
发明人： Frank Schlesener , Ingo Saenger , Olaf Dittmann , Aksel Goehnermeier , Alexandra Pazidis , Thomas Schicketanz , Michael Patra , Markus Deguenther
CPC分类号： G03F7/70058
摘要： A method of lithographically transferring a pattern on a light sensitive surface in a multiple exposure process comprises the following steps: a) providing a mask comprising a first mask pattern area and a second mask pattern area; b) directing projection light on the mask, thereby producing on the light sensitive surface a first exposed pattern area, which is an image of the first mask pattern area, and a second exposed pattern area, which is an image of the second mask pattern area. The projection light illuminating the first and second mask pattern area has different angular light distributions. c) repeating step b) using the same mask so that an image of the first mask pattern area is superimposed on the second exposure pattern area.
摘要翻译： 在多次曝光过程中在光敏表面上光刻转印图案的方法包括以下步骤：a）提供包括第一掩模图案区域和第二掩模图案区域的掩模; b）将投影光引导到掩模上，从而在光敏表面上产生作为第一掩模图案区域的图像的第一曝光图案区域和作为第二掩模图案区域的图像的第二曝光图案区域 。 照射第一和第二掩模图案区域的投影光具有不同的角度光分布。 c）重复步骤b）使用相同的掩模，使得第一掩模图案区域的图像叠加在第二曝光图案区域上。
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公开(公告)号：US09323156B2
公开(公告)日：2016-04-26
申请号：US13661381
申请日：2012-10-26
申请人： Carl Zeiss SMT GmbH
发明人： Ingo Saenger , Olaf Dittmann , Joerg Zimmermann
CPC分类号： G03F7/70116 , G03F7/70566
摘要： An optical system of a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes a polarization-influencing optical arrangement including a first lambda/2 plate and at least one additional lambda/2 plate.
摘要翻译： 微光刻投影曝光装置的光学系统包括具有多个镜元件的至少一个反射镜装置，所述多个反射镜元件可彼此独立地移位，以改变由反射镜装置反射的光的角分布。 光学系统还包括偏振影响光学装置，其包括第一λ/ 2板和至少一个附加的λ/ 2板。
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5.发明授权公开(公告)号：US09170499B2
公开(公告)日：2015-10-27
申请号：US14563087
申请日：2014-12-08
申请人： Carl Zeiss SMT GmbH
发明人： Damian Fiolka , Manfred Maul , Markus Schwab , Wolfgang Seitz , Olaf Dittmann
CPC分类号： G03F7/70191 , G02B3/0056 , G02B5/1876 , G02B27/283 , G02B27/285 , G02B27/286 , G03F7/70566
摘要： The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolarizer which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarization of polarized light impinging on the depolarizer. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolarizer can be configured so that a contribution afforded by interaction of the depolarizer with the periodicity of the microlens array to a residual polarization distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarization of not more than 5%.
摘要翻译： 本公开涉及一种微光刻投影曝光装置的照明系统。 照明系统可以包括消偏振器，其与在光传播方向上设置的下游的光混合系统相结合，至少部分地引起偏振光对去偏振器的有效去极化。 照明系统还可以包括在光传播方向上布置在光混合系统的上游的微透镜阵列。 微透镜阵列可以包括以周期布置的多个微透镜。 去极化器可以被配置为使得通过去偏振器的相互作用提供的贡献与微透镜阵列的周期性对在光传播方向上布置在微透镜阵列下游的光瞳面中发生的残留极化分布产生的贡献具有最大极化度 不超过5％。
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6.发明申请公开(公告)号：US20150301455A1
公开(公告)日：2015-10-22
申请号：US14747441
申请日：2015-06-23
申请人： Carl Zeiss SMT GmbH
发明人： Frank Schlesener , Ingo Saenger , Olaf Dittmann , Aksel Goehnermeier , Alexandra Pazidis , Thomas Schicketanz , Michael Patra , Markus Deguenther
IPC分类号： G03F7/20
CPC分类号： G03F7/70058
摘要： A method of lithographically transferring a pattern on a light sensitive surface in a multiple exposure process comprises the following steps: a) providing a mask comprising a first mask pattern area and a second mask pattern area; b) directing projection light on the mask, thereby producing on the light sensitive surface a first exposed pattern area, which is an image of the first mask pattern area, and a second exposed pattern area, which is an image of the second mask pattern area. The projection light illuminating the first and second mask pattern area has different angular light distributions. c) repeating step b) using the same mask so that an image of the first mask pattern area is superimposed on the second exposure pattern area.
摘要翻译： 在多次曝光过程中在光敏表面上光刻转印图案的方法包括以下步骤：a）提供包括第一掩模图案区域和第二掩模图案区域的掩模; b）将投影光引导到掩模上，从而在光敏表面上产生作为第一掩模图案区域的图像的第一曝光图案区域和作为第二掩模图案区域的图像的第二曝光图案区域 。 照射第一和第二掩模图案区域的投影光具有不同的角度光分布。 c）重复步骤b）使用相同的掩模，使得第一掩模图案区域的图像叠加在第二曝光图案区域上。
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公开(公告)号：US20150153654A1
公开(公告)日：2015-06-04
申请号：US14563087
申请日：2014-12-08
申请人： Carl Zeiss SMT GmbH
发明人： Damian Fiolka , Manfred Maul , Markus Schwab , Wolfgang Seitz , Olaf Dittmann
CPC分类号： G03F7/70191 , G02B3/0056 , G02B5/1876 , G02B27/283 , G02B27/285 , G02B27/286 , G03F7/70566
摘要： The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolariser which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolariser can be configured so that a contribution afforded by interaction of the depolariser with the periodicity of the microlens array to a residual polarisation distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarisation of not more than 5%.
摘要翻译： 本公开涉及一种微光刻投影曝光装置的照明系统。 照明系统可以包括去极化器，其与在光传播方向上设置的下游的光混合系统相结合，至少部分地导致撞击在去极化器上的偏振光的有效去极化。 照明系统还可以包括在光传播方向上布置在光混合系统的上游的微透镜阵列。 微透镜阵列可以包括以周期布置的多个微透镜。 去极化器可以被配置为使得通过去极化器的相互作用提供的贡献与微透镜阵列的周期性对在光传播方向上布置在微透镜阵列的下游的光瞳面中发生的残留极化分布产生的贡献具有最大的偏振度 不超过5％。
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8.发明申请公开(公告)号：US20130077077A1
公开(公告)日：2013-03-28
申请号：US13660146
申请日：2012-10-25
申请人： CARL ZEISS SMT GMBH
发明人： Ingo Saenger , Ralf Scharnweber , Olaf Dittmann , Toralf Gruner , Gundula Weiss , Andras G. Major , Martin Vogt , Markus Deguenther , Johannes Wangler , Thomas Korb
CPC分类号： G03F7/70116 , G03F7/70566
摘要： An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.
摘要翻译： 公开了一种用于微光刻投影曝光装置和微光刻曝光方法的光学系统。 在一个实施例中，用于微光刻投影曝光装置的光学系统包括至少一个具有多个镜元件的反射镜装置，该多个反射镜装置可彼此独立地移位，以改变由反射镜装置反射的光的角分布。 光学系统还包括在光传播方向上的反射镜装置下游的至少一个操纵器。 操纵器具有操纵器元件的光栅布置，使得在光学系统的操作期间入射到机械手上的光在其偏振状态和/或其强度方面根据入射位置受到不同的影响。
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