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    Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
    3.
    发明授权
    Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method 有权
    用于微光刻投影曝光装置和微光刻曝光方法的光学系统

    公开(公告)号：US09488918B2

    公开(公告)日：2016-11-08

    申请号：US14610212

    申请日：2015-01-30

    申请人： Carl Zeiss SMT GmbH

    发明人： Ingo Saenger ,  Frank Schlesener

    IPC分类号： G03B27/72 ,  G03B27/54 ,  G03F7/20 ,  G02B5/30 ,  G02B17/00 ,  G02B26/08 ,  G02B27/28

    CPC分类号： G03F7/70191 ,  G02B5/3075 ,  G02B17/002 ,  G02B26/0816 ,  G02B27/286 ,  G03F7/70116 ,  G03F7/70566

    摘要： The invention relates to an optical system for a microlithographic projection exposure apparatus, and to a microlithographic exposure method. An optical system for a microlithographic projection exposure apparatus comprises at least one mirror arrangement having a plurality of mirror elements, wherein these mirror elements can be adjusted independently of one another for changing an angular distribution of the light reflected by the mirror arrangement, and a polarization-influencing optical arrangement which is arranged downstream of the mirror arrangement in the light propagation direction, wherein the polarization-influencing optical arrangement reflects a light beam incident on the arrangement in at least two reflections, which do not occur in a common plane, for at least one angular distribution of the light reflected by the mirror arrangement.

    摘要翻译： 本发明涉及一种用于微光刻投影曝光装置的光学系统和一种微光刻曝光方法。 用于微光刻投影曝光装置的光学系统包括具有多个反射镜元件的至少一个反射镜装置，其中这些反射镜元件可以彼此独立地调节，以改变由反射镜装置反射的光的角分布，以及偏振 - 在光传播方向上布置在反射镜装置的下游的荧光光学布置，其中所述偏振影响光学布置反射入射在所述布置上的光束，所述至少两个反射不会发生在共同的平面中，用于在 反射镜布置反射的光的最小角度分布。

    ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY
    4.
    发明申请
    ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY 有权
    微观照明系统

    公开(公告)号：US20160161858A1

    公开(公告)日：2016-06-09

    申请号：US15012087

    申请日：2016-02-01

    申请人： Carl Zeiss SMT GmbH

    发明人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70191 ,  G02B3/0043 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083

    摘要： An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.

    摘要翻译： 用于微光刻的照明系统用于利用一次光源的照明光照射照明场。 第一光栅布置具有束形成的第一光栅元件，其布置在照明系统的第一平面中或与该平面相邻。 第一光栅布置用于产生二次光源的光栅布置。 传输光学器件用于将次级光源的照明光的叠加传输到照明场中。 传输光学器件具有第二光栅装置，其具有束形成第二光栅元件。 在每种情况下，第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一，用于引导整束照明光的部分束。 例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。 两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型（I至III）被分配至少一个单独距离（＆Dgr; I，＆Dgr; II，＆Dgr; III） 这种类型的第一光栅元素（I至III）和第二光栅布置的分配的第二光栅元素。 结果，获得允许特定照明参数受到影响的照明系统，使得最大程度地避免对其他照明参数的不期望的影响。

    OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MICROLITHOGRAPHIC EXPOSURE METHOD
    5.
    发明申请
    OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MICROLITHOGRAPHIC EXPOSURE METHOD 有权
    微观投影曝光装置和微观曝光方法的光学系统

    公开(公告)号：US20150160566A1

    公开(公告)日：2015-06-11

    申请号：US14610212

    申请日：2015-01-30

    申请人： Carl Zeiss SMT GmbH

    发明人： Ingo Saenger ,  Frank Schlesener

    IPC分类号： G03F7/20 ,  G02B26/08 ,  G02B17/00 ,  G02B27/28 ,  G02B5/30

    CPC分类号： G03F7/70191 ,  G02B5/3075 ,  G02B17/002 ,  G02B26/0816 ,  G02B27/286 ,  G03F7/70116 ,  G03F7/70566

    摘要： The invention relates to an optical system for a microlithographic projection exposure apparatus, and to a microlithographic exposure method. An optical system for a microlithographic projection exposure apparatus comprises at least one mirror arrangement having a plurality of mirror elements, wherein these mirror elements can be adjusted independently of one another for changing an angular distribution of the light reflected by the mirror arrangement, and a polarization-influencing optical arrangement which is arranged downstream of the mirror arrangement in the light propagation direction, wherein the polarization-influencing optical arrangement reflects a light beam incident on the arrangement in at least two reflections, which do not occur in a common plane, for at least one angular distribution of the light reflected by the mirror arrangement.

    摘要翻译： 本发明涉及一种用于微光刻投影曝光装置的光学系统和一种微光刻曝光方法。 用于微光刻投影曝光装置的光学系统包括具有多个反射镜元件的至少一个反射镜装置，其中这些反射镜元件可以彼此独立地调节，以改变由反射镜装置反射的光的角分布，以及偏振 - 在光传播方向上布置在反射镜装置的下游的荧光光学布置，其中所述偏振影响光学布置反射入射在所述布置上的光束，所述至少两个反射不会发生在共同的平面中，用于在 反射镜布置反射的光的最小角度分布。

    MIRROR SYSTEM COMPRISING AT LEAST ONE MIRROR FOR USE FOR GUIDING ILLUMINATION AND IMAGING LIGHT IN EUV PROJECTION LITHOGRAPHY
    7.
    发明申请
    MIRROR SYSTEM COMPRISING AT LEAST ONE MIRROR FOR USE FOR GUIDING ILLUMINATION AND IMAGING LIGHT IN EUV PROJECTION LITHOGRAPHY 有权
    包含至少一个镜子的镜像系统用于在EUV投影刻画中引导照明和成像光

    公开(公告)号：US20140226142A1

    公开(公告)日：2014-08-14

    申请号：US14255569

    申请日：2014-04-17

    申请人： Carl Zeiss SMT GmbH

    发明人： Ingo Saenger ,  Frank Schlesener

    IPC分类号： G03F7/20 ,  G02B5/08

    CPC分类号： G03F7/70191 ,  G02B5/0891 ,  G02B5/09 ,  G02B5/3075 ,  G03F7/702 ,  G03F7/70566 ,  G03F7/70958

    摘要： A mirror serves for use for guiding illumination and imaging light in EUV projection lithography. The mirror has a reflective surface, the reflective surface forming a magnetic field in such a way that at least one polarization property of the illumination and imaging light is influenced via the magnetic field upon reflection. A mirror system has, besides the mirror, additionally a magnetization predefining device for predefining a magnetization of the reflective surface of the mirror. An illumination optical unit has at least one mirror of this type or at least one facet mirror device comprising at least one individual mirror constructed in this way. In the case of a mirror of this type, the illumination and/or imaging properties of illumination and/or imaging light guided via the mirror are improved.

    摘要翻译： 镜子用于在EUV投影光刻中引导照明和成像光。 反射镜具有反射表面，反射表面以这样的方式形成磁场，使得照射和成像光的至少一个偏振特性在反射时经由磁场而受到影响。 除了镜子之外，镜子系统还具有用于预定义反射镜的反射表面的磁化的磁化预定义装置。 照明光学单元具有这种类型的至少一个反射镜或至少一个小面镜装置，其包括以这种方式构造的至少一个单个反射镜。 在这种类型的反射镜的情况下，通过反射镜引导的照明和/或成像光的照明和/或成像性能得到改善。

    METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    9.
    发明申请
    METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开

    公开(公告)号：US20190155166A1

    公开(公告)日：2019-05-23

    申请号：US16251149

    申请日：2019-01-18

    申请人： Carl Zeiss SMT GmbH

    发明人： Oliver Natt ,  Frank Schlesener

    IPC分类号： G03F7/20

    摘要： A method of operating an illumination system of a microlithographic projection exposure apparatus is provided. A set of illumination parameters that describe properties of a light bundle which converges at a point on a mask to be illuminated by the illumination system is first determined. Optical elements whose optical effect on the illumination parameters can be modified as a function of control commands are furthermore determined, as well as sensitivities with which the illumination parameters react to an adjustment of the optical elements, induced by the control commands. The control commands are then determined while taking the previously determined sensitivities into account, such that deviations of the illumination parameters from predetermined target illumination parameters satisfy a predetermined minimisation criterion. These control commands are applied to the optical elements, before the mask is illuminated.