公开(公告)号：US20230417961A1

公开(公告)日：2023-12-28

申请号：US18467095

申请日：2023-09-14

Applicant: Carl Zeiss SMT GmbH

Inventor： Thomas SCHICKETANZ

IPC: G02B5/08 ,  G03F7/00 ,  B24B13/00 ,  G21K1/06

CPC classification number: G02B5/0891 ,  G21K1/062 ,  B24B13/00 ,  G03F7/70958

Abstract: Production techniques of a reflective optical element for the extreme ultraviolet wavelength range having a multilayer system reflective coating arranged on a substrate. The multilayer system has mutually alternating layers of at least two different materials with different real parts of their refractive indexes at a wavelength in the extreme ultraviolet wavelength range. A layer of one of the at least two materials forms a stack with the layer or layers arranged between the former and the closest layer of the same material with increasing distance from the substrate. At least one layer of the multilayer system is polished during or after deposition thereof, such roughness of the reflective optical element rises significantly less over all layers than in a corresponding reflective optical element with a reflective coating in the form of a multilayer system composed of unpolished layers. The multilayer system may have more than 50 layer stacks.

公开(公告)号：US20190212659A1

公开(公告)日：2019-07-11

申请号：US16241462

申请日：2019-01-07

Applicant: Carl Zeiss SMT GmbH

Inventor： Hartmut ENKISCH ,  Thomas SCHICKETANZ ,  Matus KALISKY ,  Oliver DIER

IPC: G03F7/20 ,  G21K1/06

Abstract: An optical system, in particular for a microlithographic projection exposure apparatus, with at least one mirror (200) which has an optically effective surface and, for electromagnetic radiation of a predefined operating wavelength impinging on the optically effective surface at an angle of incidence of at least 65° relative to the respective surface normal, has a reflectivity of at least 0.5. The mirror has a reflection layer (210) and a compensation layer (220) which is arranged above this reflection layer (210) in the direction of the optically effective surface. The compensation layer (220), for an intensity distribution generated in a pupil plane or a field plane of the optical system during operation thereof, reduces the difference between the maximum and the minimum intensity value by at least 20% compared to an analogous structure without the compensation layer.

公开(公告)号：US20210140762A1

公开(公告)日：2021-05-13

申请号：US17151017

申请日：2021-01-15

Applicant: Carl Zeiss SMT GmbH

Inventor： Steffen SIEGLER ,  Thomas SCHICKETANZ

IPC: G01B11/24 ,  G01B9/02 ,  G01M11/00 ,  G03F7/20

Abstract: A method and a device for characterizing the surface shape of an optical element. In the method, in at least one interferogram measurement carried out by an interferometric test arrangement, a test wave reflected at the optical element is caused to be superimposed with a reference wave not reflected at the optical element. In this case, the figure of the optical element is determined on the basis of at least two interferogram measurements using electromagnetic radiation having in each case linear input polarization or in each case circular input polarization, wherein the input polarizations for the two interferogram measurements differ from one another.

公开(公告)号：US20160327702A1

公开(公告)日：2016-11-10

申请号：US15215123

申请日：2016-07-20

Applicant: Carl Zeiss SMT GmbH

Inventor： Thomas SCHICKETANZ ,  Oliver DIER ,  Sebastian STROBEL ,  Ralf WINTER

IPC: G02B5/08 ,  G21K1/06

CPC classification number: G02B5/0891 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0875 ,  G21K1/062

Abstract: An EUV mirror has a multilayer arrangement applied on a substrate. The multilayer arrangement includes a first layer group having ten or more first layer pairs. Each first layer pair has a first layer composed of a high refractive index first layer material having a first layer thickness, has a second layer composed of a low refractive index second layer material having a second layer thickness and has a period thickness corresponding to the sum of the layer thicknesses of all the layers of a first layer pair. The layer thicknesses of one of the layer materials are defined, depending on the period number, by a simply monotonic first layer thickness profile function, e.g. by a linear, quadratic or exponential layer thickness profile function. The layer thicknesses of the other of the layer materials vary, depending on the period number, in accordance with a second layer thickness profile function.

Abstract translation: EUV反射镜具有应用于基板上的多层布置。 多层布置包括具有十个或更多个第一层对的第一层组。 每个第一层对具有由具有第一层厚度的高折射率第一层材料构成的第一层，具有由具有第二层厚度的低折射率第二层材料构成的第二层，并且具有对应于总和的周期厚度 的第一层对的所有层的层厚度。 根据周期数，通过简单单调的第一层厚度分布函数（例如，第一层）来定义层材料之一的层厚度。 通过线性，二次或指数层厚度分布函数。 根据第二层厚度分布函数，层材料中的另一层的层厚度根据周期数而变化。

公开(公告)号：US20160377988A1

公开(公告)日：2016-12-29

申请号：US15257349

申请日：2016-09-06

Applicant: Carl Zeiss SMT GmbH

Inventor： Hans-Jochen PAUL ,  Boris BITTNER ,  Norbert WABRA ,  Thomas SCHICKETANZ

IPC: G03F7/20 ,  G02B27/00 ,  G21K1/06 ,  G02B5/08 ,  G02B5/20

Abstract: An optical arrangement includes an optical element (1) and a thermal manipulation device. The optical element has a substrate (2), a coating (3, 9, 5) applied to the substrate (2), and an antireflection coating (3). The coating (3, 9, 5) includes: a reflective multi-layer coating (5b) configured to reflect radiation (4) with a used wavelength (λEUV). The antireflection coating (3) is arranged between the substrate (2) and the reflective multi-layer coating (5b) to suppress reflection of heating radiation (7) with a heating wavelength (λH) that differs from the used wavelength (λEUV). The thermal manipulation device has at least one heating light source (8) to produce heating radiation (7).

Abstract translation: 光学装置包括光学元件（1）和热操纵装置。 光学元件具有基板（2），施加到基板（2）的涂层（3,9,5）和抗反射涂层（3）。 涂层（3,9,5）包括：反射性多层涂层（5b），被配置成以所使用的波长（λEUV）反射辐射（4）。 抗反射涂层（3）布置在基板（2）和反射多层涂层（5b）之间，以抑制加热辐射（7）的反射，其加热波长（λH）不同于使用的波长（λEUV）。 热处理装置具有至少一个加热光源（8）以产生加热辐射（7）。

公开(公告)号：US20160299268A1

公开(公告)日：2016-10-13

申请号：US15135019

申请日：2016-04-21

Applicant: CARL ZEISS SMT GmbH

Inventor： Juergen MUELLER ,  Thomas SCHICKETANZ ,  Dirk Heinrich EHM

IPC: G02B5/08 ,  G03F7/20 ,  G21K1/06

CPC classification number: G02B5/0816 ,  B82Y10/00 ,  G02B5/0891 ,  G02B27/0025 ,  G03F7/70166 ,  G03F7/70191 ,  G03F7/70233 ,  G03F7/70308 ,  G03F7/70958 ,  G21K1/062

Abstract: A minor reflecting radiation with an operating wavelength of 5-30 nm, includes a substrate and a reflective coating. The reflective coating includes a first group of layers (19) and a second group (5) of layers, such that the second group of layers is arranged between the substrate and the first group of layers. The first group and the second group of layers comprise a plurality of first and second layers (9, 11). The first layers have a refractive index for radiation having the operating wavelength which is greater than a refractive index of the second layers for radiation having the operating wavelength. A correction layer (13) has a layer thickness variation for correcting the surface form of the minor and is arranged between the second group and the first group of layers. The correction layer contains carbon, sulfur, phosphorus, fluorine or organic compounds thereof, and inorganic metal compounds.

Abstract translation: 工作波长为5-30nm的次要反射辐射包括基底和反射涂层。 反射涂层包括第一组层（19）和第二组（5）层，使得第二组层布置在衬底和第一组层之间。 第一组和第二组层包括多个第一和第二层（9,11）。 第一层对于具有大于具有工作波长的辐射的第二层的折射率的工作波长的辐射具有折射率。 校正层（13）具有用于校正次要面的表面形状的层厚度变化，并且布置在第二组和第一组层之间。 校正层含有碳，硫，磷，氟或其有机化合物，以及无机金属化合物。

公开(公告)号：US20160266499A1

公开(公告)日：2016-09-15

申请号：US15160616

申请日：2016-05-20

Applicant: Carl Zeiss SMT GmbH

Inventor： Hartmut ENKISCH ,  Hans-Jochen PAUL ,  Thomas SCHICKETANZ ,  Oliver DIER ,  Joern WEBER ,  Christian GRASSE ,  Ralf WINTER ,  Sebastian STROBEL

IPC: G03F7/20 ,  G02B5/08

CPC classification number: G03F7/7015 ,  G02B5/0875 ,  G02B5/0891 ,  G03F7/70316 ,  G21K1/062

Abstract: A reflective optical element (50) having a substrate (52) and a multilayer system (51) that has a plurality of partial stacks (53), each with a first layer (54) of a first material and a second layer (55) of a second material. The first material and the second material differ from one another in refractive index at an operating wavelength of the optical element. Each of the partial stacks has a thickness (Di) and a layer thickness ratio (Γi), wherein the layer thickness ratio is the quotient of the thickness of the respective first layer and the partial stack thickness (Di). In a first section of the multilayer system, for at least one of the two variables of partial stack thickness (Di) and layer thickness ratio (Γi), the mean square deviation from the respective mean values therefor is at least 10% less than in a second section of the multilayer system.

Abstract translation: 一种具有基板（52）和多层系统（51）的反射光学元件（50），所述多层系统具有多个部分叠层（53），每个具有第一材料的第一层（54）和第二层（55） 的第二种材料。 第一材料和第二材料在光学元件的工作波长处的折射率彼此不同。 每个部分堆叠具有厚度（Di）和层厚度比（Γi），其中层厚度比是相应第一层的厚度和部分叠层厚度（Di）的商。 在多层系统的第一部分中，对于局部叠层厚度（Di）和层厚度比（Γi）的两个变量中的至少一个，与其相应平均值的平均平方偏差至少比 多层系统的第二部分。

公开(公告)号：US20140078481A1

公开(公告)日：2014-03-20

申请号：US14026486

申请日：2013-09-13

Applicant: CARL ZEISS SMT GmbH

Inventor： Juergen MUELLER ,  Thomas SCHICKETANZ ,  Dirk Heinrich EHM

IPC: G02B5/08 ,  G03F7/20

CPC classification number: G02B5/0816 ,  B82Y10/00 ,  G02B5/0891 ,  G02B27/0025 ,  G03F7/70166 ,  G03F7/70191 ,  G03F7/70233 ,  G03F7/70308 ,  G03F7/70958 ,  G21K1/062

Abstract: A method for correcting a surface form of a mirror (1) for reflecting radiation in the wavelength range of 5-30 nm, which includes: applying a correction layer (13) having a layer thickness variation (21) for correcting the mirror's surface form, and applying a first group (19) of layers to the correction layer. The first group (19) of layers includes first (9) and second (11) layers arranged alternately one above another, wherein the first layers have a refractive index at the operating wavelength which is greater than the refractive index of the second layers for that radiation.The correction layer (13) is applied by: introducing the mirror into an atmosphere including a reaction gas (15), applying a correction radiation (17) having a location-dependent radiation energy density, such that a correction layer having a location-dependent layer thickness variation (21) grows on the mirror's irradiated surface.

Abstract translation: 一种用于校正反射镜（1）的表面形式的方法，用于反射5-30nm的波长范围内的辐射，其包括：施加具有用于校正反射镜表面形式的层厚度变化（21）的校正层（13） ，以及将第一组（19）层应用于所述校正层。 层的第一组（19）包括彼此交替布置的第一层（9）层和第二层（11）层，其中第一层在工作波长处的折射率大于第二层的折射率，为此， 辐射。 通过以下方式施加校正层（13）：将反射镜引入包括反应气体（15）的气氛中，施加具有位置相关辐射能量密度的校正辐射（17），使得具有位置相关 层厚度变化（21）在镜子的照射表面上生长。

公开(公告)号：US20130242279A1

公开(公告)日：2013-09-19

申请号：US13871366

申请日：2013-04-26

Applicant: CARL ZEISS SMT GMBH

Inventor： Alexander EPPLE ,  Vladimir KAMENOV ,  Toralf GRUNER ,  Thomas SCHICKETANZ

IPC: G02B17/08

CPC classification number: G02B17/0892 ,  G02B1/11 ,  G02B17/08 ,  G02B17/0896 ,  G03F7/70 ,  G03F7/70225 ,  G03F7/70275

Abstract: Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.1% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.