公开(公告)号：US09864279B2

公开(公告)日：2018-01-09

申请号：US13812844

申请日：2011-06-14

申请人： Catharinus De Schiffart ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Andre Bernardus Jeunink ,  Gregor Edward Van Baars ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Norbert Erwin Therenzo Jansen ,  Toon Hardeman ,  George Arie Jan De Fockert ,  Johan Frederik Dijksman

发明人： Catharinus De Schiffart ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Andre Bernardus Jeunink ,  Gregor Edward Van Baars ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Norbert Erwin Therenzo Jansen ,  Toon Hardeman ,  George Arie Jan De Fockert ,  Johan Frederik Dijksman

IPC分类号： G03B27/04 ,  G03F7/20 ,  B29C43/02 ,  B29C43/14 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B29C43/04

CPC分类号： G03F7/7035 ,  B29C43/021 ,  B29C43/04 ,  B29C43/14 ,  B29C2043/142 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/70775 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/709 ,  G03F9/7042

摘要： An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US20130182236A1

公开(公告)日：2013-07-18

申请号：US13812844

申请日：2011-06-14

申请人： Catharinus De Schiffart ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Andre Bernardus Jeunink ,  Gregor Edward Van Baars ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Norbert Erwin Therenzo Jansen ,  Toon Hardeman ,  George Arie Jan De Fockert ,  Johan Frederik Dijksman

发明人： Catharinus De Schiffart ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Andre Bernardus Jeunink ,  Gregor Edward Van Baars ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Norbert Erwin Therenzo Jansen ,  Toon Hardeman ,  George Arie Jan De Fockert ,  Johan Frederik Dijksman

IPC分类号： G03F7/00

CPC分类号： G03F7/7035 ,  B29C43/021 ,  B29C43/04 ,  B29C43/14 ,  B29C2043/142 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/70775 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/709 ,  G03F9/7042

摘要： An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

摘要翻译： 一种压印光刻设备，具有要安装在地板上的第一框架，通过运动耦合安装在第一框架上的第二框架，安装在第二框架上的对准传感器，以将压印光刻模板布置与目标部分对准 基板和位置传感器，用于测量压印光刻模板布置和/或基板台相对于第二框架的位置。

公开(公告)号：US08692978B2

公开(公告)日：2014-04-08

申请号：US12792476

申请日：2010-06-02

申请人： Toon Hardeman

发明人： Toon Hardeman

IPC分类号： G03B27/32

CPC分类号： G01D5/34715 ,  G03F7/70775

摘要： A method of determining a defect in a grid plate of an encoder-type position measurement system, the method including providing an encoder-type position measurement system to measure a position of a movable object with respect to another object, the encoder-type position measurement system including a grid plate and an encoder head, measuring a quantity of light reflected on each of the two or more detectors, using a combined light intensity of the reflected light on the two or more detectors to determine a reflectivity signal representative for the reflectivity of the grid plate at the measurement location, and determining a presence of a defect at the measurement location on the basis of the reflectivity signal of the grid plate.

摘要翻译： 一种确定编码器型位置测量系统的格板的缺陷的方法，所述方法包括提供编码器型位置测量系统以测量可移动物体相对于另一物体的位置，所述编码器型位置测量 系统，包括栅格板和编码器头，使用两个或更多个检测器上的反射光的组合光强度来测量在两个或更多个检测器中的每一个上反射的光量，以确定表示反射率的反射率信号 在测量位置处的格栅板，并且基于栅格板的反射率信号来确定测量位置处的缺陷的存在。