摘要:
A method of manufacturing a selectively relief-treated image member that comprises: (a) providing a precursor of the image member, the precursor comprising a surface having an image-forming layer comprising a photosensitive resist composition comprising: (i) a polymerizable material, and (ii) a binder; (b) delivering radiation image-wise to the precursor; (c) developing the precursor in a developer in order to selectively remove the image-forming layer in regions to which said radiation was not delivered image-wise in step (b); and (d) contacting the image-wise exposed precursor with a relief-treatment material, in order to selectively relief-treat regions of the surface of the precursor in which the image-forming layer was removed on development in step (c).
摘要:
Imagable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as pendent groups on the polymer backbone. Certain infra-red absorbing groups may also act to insolubilize the polymer in a developer, until it is imagewise exposed to infra-red radiation. Imagewise application of heat, resulting from imagewise exposure of the precursor to infra-red radiation, renders the polymer layer more soluble in the developer than prior to exposure to the infra-red radiation.
摘要:
Infra-red absorbing polymers useful in imageable products and the lithographic printing field comprise infra-red absorbing groups carried as pendent groups on a polymer backbone. Certain infra-red absorbing groups may also act to insolublize the polymer in a developer, until it is imagewise exposed to infra-red radiation. The resulting heat renders the polymer soluble in the developer. Imagable products employing the infra-red absorbing polymers may include positive working lithographic printing plates.
摘要:
Thermally imagable elements are described comprising on a substrate with hydrophilic surface (a) a first layer comprising a first polymer soluble or swellable in aqueous alkaline developer and insoluble in organic solvents with low polarity and (b) a second layer comprising a second polymer soluble or swellable in aqueous alkaline developer, wherein the first polymer is different from the second polymer and the second polymer comprises vinyl acetal repeating units and pendant acidic groups selected from COOH, —SO3H, —PO3H2, —PO4H2, aromatic OH and groups having acidic amide or imide groups.
摘要翻译:描述了可热成像的元件,其包括在具有亲水表面的基底上(a)第一层,该第一层包含在碱性显影剂的水溶液中可溶或可溶胀的第一聚合物,并且不溶于低极性的有机溶剂中,和(b)第二层, 其中第一聚合物不同于第二聚合物,第二聚合物包含乙烯基缩醛重复单元和选自COOH,-SO 3 H,-PO 3 H 2,-PO 4 H 2,芳族OH的侧基酸基和具有酸性酰胺的基团或 酰亚胺组。
摘要:
Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer.
摘要:
Thermally imagable elements are described comprising on a substrate with hydrophilic surface (a) a first layer comprising a first polymer soluble or swellable in aqueous alkaline developer and insoluble in organic solvents with low polarity and (b) a second layer comprising a second polymer soluble or swellable in aqueous alkaline developer, wherein the first polymer is different from the second polymer and the second polymer comprises vinyl acetal repeating units and pendant acidic groups selected from COOH, —SO3H, —PO3H2, —PO4H2, aromatic OH and groups having acidic amide or imide groups.
摘要翻译:描述了可热成像的元件,其包括在具有亲水表面的基底上(a)第一层,该第一层包含在碱性显影剂的水溶液中可溶或可溶胀的第一聚合物,并且不溶于低极性的有机溶剂中,和(b)第二层, 在水性碱性显影剂中可膨胀,其中第一聚合物不同于第二聚合物,第二聚合物包含乙烯基缩醛重复单元和选自COOH,-SO 3 H,-PO 3, 3个H 2,-PO 4 H 2,芳香族OH和具有酸性酰胺或酰亚胺基团的基团。
摘要:
Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer.
摘要:
Polymeric acetal resins useful in lithographic printing are disclosed. The polymeric acetal resin contains units (A), (B), (C), (D), and (E). Unit (A) is a vinyl alcohol unit. Unit; (B) is a polyvinyl acetal unit containing an R group, where R is hydrogen, an aliphatic group, an aromatic group, or an arylaliphatic group. Unit (C) is a vinyl carboxylate unit. Unit (D) is an acidic vinyl acetal unit and/or a residue of an acidic vinyl monomer. Unit (E) is a free radical polymerization-inhibiting vinyl acetal unit and/or a free radical polymerization-inhibiting vinyl alcohol ester unit. The resin comprises about 10 to about 60 mol % of unit (A), about 5 to about 60 mol % of unit (B), about 0.3 to about 30 mol % of unit (C), about 1 to about 40 mol % of unit (D), and about 0.01 to about 2 mol % of unit (E).
摘要:
Infra-red absorbing polymers useful in imageable products and the lithographic printing field comprise infra-red absorbing groups carried as pendent groups on a polymer backbone. Certain infra-red absorbing groups may also act to insolublize the polymer in a developer, until it is imagewise exposed to infra-red radiation. The resulting heat renders the polymer soluble in the developer. Imageable products employing the infra-red absorbing polymers may include positive working lithographic printing plates.