MASK FOR EVAPORATION
    1.
    发明公开

    公开(公告)号:US20230167536A1

    公开(公告)日:2023-06-01

    申请号:US17921876

    申请日:2021-05-12

    IPC分类号: C23C14/04

    CPC分类号: C23C14/042

    摘要: The mask for evaporation includes a plurality of predetermined areas, each of the predetermined areas includes an opening and a blocking area, the blocking area includes a first area, a second area and a third area, first area has a first surface and a second surface, second area has a third surface and a fourth surface, third area has a fifth surface and a sixth surface, first surface, third surface and fifth surface are located on a same one side of mask, and second surface, fourth surface and sixth surface are located on a same one side of mask, thickness of second area is greater than thickness of first area and thickness of third area, first surface and third surface flush, and a plane where sixth surface is located is located between a plane where third surface is located and a plane where the fourth surface is located.

    MASK SHEET AND MASK DEVICE
    3.
    发明申请

    公开(公告)号:US20220205076A1

    公开(公告)日:2022-06-30

    申请号:US17436756

    申请日:2020-12-25

    IPC分类号: C23C14/04 C23C14/24

    摘要: A mask sheet for evaporation on a substrate is provided, and the mask sheet includes: a plurality of first ribs extending in a first direction; and a plurality of second ribs extending in a second direction intersecting the first direction, the mask sheet includes a first region for an evaporation of a first exposure region of the substrate and a second region for an evaporation of a second exposure region of the substrate, a third rib is provided at a boundary of the first region and the second region so as to shield an overlapping exposure region between the first exposure region and the second exposure region, the third rib includes a first sub-rib, a second sub-rib, and a spacer for separating the first sub-rib and the second sub-rib, and the third rib has a width greater than that of the first rib.

    Display substrate and related devices

    公开(公告)号:US11974482B2

    公开(公告)日:2024-04-30

    申请号:US17435917

    申请日:2020-11-30

    IPC分类号: H10K59/35

    CPC分类号: H10K59/353

    摘要: A display substrate and related devices are provided. The display substrate includes a plurality of first sub-pixels, second sub-pixels and third sub-pixels. In a first direction, the first sub-pixels and the third sub-pixels are arranged alternately to form a plurality of first sub-pixel rows, the second sub-pixels form a plurality of second sub-pixel rows, the first sub-pixel rows and the second sub-pixel rows are arranged alternately in a second direction, connection lines of center points of two first sub-pixels and two third sub-pixels form a first virtual quadrilateral, the two first sub-pixels are located at two vertex angles of the first virtual quadrilateral which are opposite to each other, one second sub-pixel is located within the first virtual quadrilateral, and the first virtual quadrilateral includes two interior angles each being equal to 90° and two interior angles each being not equal to 90°.

    DISPLAY PANEL AND DISPLAY DEVICE
    6.
    发明公开

    公开(公告)号:US20240276779A1

    公开(公告)日:2024-08-15

    申请号:US18041997

    申请日:2022-04-06

    摘要: A display panel and a display device are provided. The display panel includes: a plurality of sub-pixels disposed in a display region; at least one dam disposed in the peripheral region; a first electrode layer disposed on the base substrate; a pixel defining layer a spacer layer and an encapsulation structure including a first encapsulation layer, a second encapsulation layer and a third encapsulation layer. A plurality of spacers are located in the spacer layer. Among the spacers, a first spacer is located in the peripheral region, and is located at a position farthest away from a center of the display region. An orthographic projection of a boundary of the second encapsulation layer is located on a side of an orthographic projection of at least one dam, and an orthographic projection of the first spacer is located on a side of the orthographic projection of the boundary.