Electronic dictionary and language interpreter with multiple inflection
display
    6.
    发明授权
    Electronic dictionary and language interpreter with multiple inflection display 失效
    电子词典和多语言翻译显示

    公开(公告)号:US6009443A

    公开(公告)日:1999-12-28

    申请号:US671533

    申请日:1996-06-27

    申请人: Shuji Kawamura

    发明人: Shuji Kawamura

    CPC分类号: G06F17/2735 G06F17/2872

    摘要: An electronic dictionary searching all conjugations of combinations of the person and the tense easily and quickly, displaying them, and switching the display of the inflection and the original. The electronic dictionary has original buffer memory 13 for storing original data and inflection buffer memory 14 for storing inflection data searched by data reference means 5. The person and the tense of inflection are set up by person set up counter 10 and tense set up counter 11. The electronic dictionary has switching means for switching to display either the original buffer memory 13 or the inflection buffer memory 14, and for selecting data of the inflection buffer memory 14 and inflection message memory 29. Moreover, person detecting means 31 and tense detecting means 32 are connected to the input buffer memory 8 to detect grammatical mistakes of the language input in phrase form and to correct them.

    摘要翻译: 一个电子词典可以方便,快速地搜索人与时态的组合的所有变体,并显示它们,以及切换拐点和原始的显示。 电子词典具有用于存储原始数据的原始缓冲存储器13和用于存储由数据参考装置5搜索的变形数据的拐点缓冲存储器14.人和时态由人设置计数器10和时态设置计数器11 电子词典具有用于切换显示原始缓冲存储器13或弯曲缓冲存储器14以及用于选择拐点缓冲存储器14和拐弯消息存储器29的数据的切换装置。此外,人物检测装置31和时态检测装置 32连接到输入缓冲存储器8以检测语言输入的语法错误,并纠正它们。

    Exposure apparatus, producing method of exposure apparatus, and producing method of microdevice
    7.
    发明授权
    Exposure apparatus, producing method of exposure apparatus, and producing method of microdevice 有权
    曝光装置,曝光装置的制造方法以及微型装置的制造方法

    公开(公告)号:US09280069B2

    公开(公告)日:2016-03-08

    申请号:US11661296

    申请日:2006-03-28

    申请人: Shuji Kawamura

    发明人: Shuji Kawamura

    摘要: An exposure apparatus for exposing a pattern formed on a mask (M) onto a photosensitive substrate (P) through a projection optical system (PL), comprising an upper pedestal (26) on which at least one of the projection optical system (PL) and a mask stage (MST) which is to hold the mask (M) is mounted, and a plurality of lower pedestals (6a) which supports the upper pedestal (26) and which has a longitudinal direction in a predetermined direction.

    摘要翻译: 一种曝光装置,用于通过投影光学系统(PL)将形成在掩模(M)上的图案曝光到感光基板(P)上,该投影光学系统包括上基座(26),至少一个投影光学系统(PL) 并且安装有用于保持掩模(M)的掩模台(MST)以及支撑上基座(26)并且沿预定方向具有纵向方向的多个下基座(6a)。

    Exposure Apparatus, Producing Method of Exposure Apparatus, and Producing Method of Microdevice
    8.
    发明申请
    Exposure Apparatus, Producing Method of Exposure Apparatus, and Producing Method of Microdevice 有权
    曝光装置,曝光装置的制作方法和微型装置的制作方法

    公开(公告)号:US20080030702A1

    公开(公告)日:2008-02-07

    申请号:US11661296

    申请日:2006-03-28

    申请人: Shuji Kawamura

    发明人: Shuji Kawamura

    IPC分类号: G03B27/42 G03B27/58

    摘要: An exposure apparatus for exposing a pattern formed on a mask (M) onto a photosensitive substrate (P) through a projection optical system (PL), comprising an upper pedestal (26) on which at least one of the projection optical system (PL) and a mask stage (MST) which is to hold the mask (M) is mounted, and a plurality of lower pedestals (6a) which supports the upper pedestal (26) and which has a longitudinal direction in a predetermined direction.

    摘要翻译: 一种曝光装置,用于通过投影光学系统(PL)将形成在掩模(M)上的图案曝光到感光基板(P)上,该投影光学系统包括上基座(26),至少一个投影光学系统(PL) 并且安装有用于保持掩模(M)的掩模台(MST)和支撑上基座(26)并且沿预定方向具有纵向方向的多个下基座(6a)。

    Method for measuring orthogonality having a third interferometer which
is not orthogonal
    9.
    发明授权
    Method for measuring orthogonality having a third interferometer which is not orthogonal 有权
    正交性测量方法,舞台装置和曝光装置

    公开(公告)号:US6134007A

    公开(公告)日:2000-10-17

    申请号:US310959

    申请日:1999-05-13

    摘要: A projection exposure apparatus has a function to measure orthogonality between movement mirrors for interferometers for measuring positions of a substrate table in X and Y directions. The substrate table is moved by a distance L along a direction of a third axis which is included in an XY plane and inclined at an angle .alpha. with respect to a Y axis, while operating a movement mirror and an interferometer for the direction of the third axis. A component in the Y direction corresponding to the distance L in the direction of the third axis is defined as d. A movement distance of the substrate table in the X direction after movement of the substrate table by the distance L in the direction of the third axis is determined by the interferometer for measuring the position in the X direction, which is defined as S. An orthogonality error .theta. can be determined in accordance with .theta.=tan.sup.-1 [(d-S)/d]. The position of the substrate table can be correctly controlled by moving the substrate table while giving an offset to correct the error. This function can be also applied to a mask stage.

    摘要翻译: 投影曝光装置具有测量用于干涉仪的移动反射镜之间在X和Y方向上测量基板台的位置的正交性的功能。 衬底台沿着包括在XY平面中的第三轴的方向移动距离L,并相对于Y轴以α角倾斜,同时操作用于第三个方向的移动镜和干涉仪 轴。 对应于在第三轴方向上的距离L的Y方向的分量被定义为d。 基板台沿着第三轴方向移动距离L后的X方向上的X方向的移动距离由用于测量X方向的位置的干涉仪决定,该方向被定义为S.正交性 可以根据θ= tan-1 [(dS)/ d]来确定误差θ。 通过移动衬底台,同时给出偏移以校正误差,可以正确地控制衬底台的位置。 此功能也可应用于遮罩舞台。

    Method for measuring orthogonality in a stage of an exposure apparatus
    10.
    发明授权
    Method for measuring orthogonality in a stage of an exposure apparatus 失效
    用于在曝光装置的阶段中测量正交性的方法

    公开(公告)号:US5995225A

    公开(公告)日:1999-11-30

    申请号:US754012

    申请日:1996-11-20

    摘要: A projection exposure apparatus has a function to measure orthogonality between movement mirrors for interferometers for measuring positions of a substrate table in X and Y directions. The substrate table is moved by a distance L along a direction of a third axis which is included in an XY plane and inclined at an angle .alpha. with respect to a Y axis, while operating a movement mirror and an interferometer for the direction of the third axis. A component in the Y direction corresponding to the distance L in the direction of the third axis is defined as d. A movement distance of the substrate table in the X direction after movement of the substrate table by the distance L in the direction of the third axis is determined by the interferometer for measuring the position in the X direction, which is defined as S. An orthogonality error .theta. can be determined in accordance with .theta.=tan.sup.-1 [(d-S)/d]. The position of the substrate table can be correctly controlled by moving the substrate table while giving an offset to correct the error. This function can be also applied to a mask stage.

    摘要翻译: 投影曝光装置具有测量用于干涉仪的移动反射镜之间在X和Y方向上测量基板台的位置的正交性的功能。 衬底台沿着包括在XY平面中的第三轴的方向移动距离L,并相对于Y轴以α角倾斜,同时操作用于第三个方向的移动镜和干涉仪 轴。 对应于在第三轴方向上的距离L的Y方向的分量被定义为d。 基板台沿着第三轴方向移动距离L后的X方向上的X方向的移动距离由用于测量X方向的位置的干涉仪决定,该方向被定义为S.正交性 可以根据θ= tan-1 [(dS)/ d]来确定误差θ。 通过移动衬底台,同时给出偏移以校正误差,可以正确地控制衬底台的位置。 此功能也可应用于遮罩舞台。