公开(公告)号：US08802200B2

公开(公告)日：2014-08-12

申请号：US12795896

申请日：2010-06-08

申请人： Jung-Min Lee ,  Choong-Ho Lee ,  Yoon-Chan Oh ,  Hee-Seong Jeong

发明人： Jung-Min Lee ,  Choong-Ho Lee ,  Yoon-Chan Oh ,  Hee-Seong Jeong

IPC分类号： B05D3/00

CPC分类号： C23C14/042 ,  B08B7/0035 ,  B08B7/0042 ,  C23C14/564 ,  H01L51/56

摘要： A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.

摘要翻译： 清理积聚在掩模上的有机沉积材料的方法包括：在包括沉积源的沉积室中，使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。 一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统，包括：沉积室，包括沉积源; 以及保持在与沉积室基本相同的真空的储存室，并且包括清除积聚在掩模上的有机沉积材料的清洁装置。

公开(公告)号：US08746169B2

公开(公告)日：2014-06-10

申请号：US12986894

申请日：2011-01-07

申请人： Choong-Ho Lee ,  Jung-Min Lee ,  Yoon-Chan Oh

发明人： Choong-Ho Lee ,  Jung-Min Lee ,  Yoon-Chan Oh

IPC分类号： B05C11/00 ,  C25D1/10 ,  C23C16/00 ,  C23C14/04 ,  H01L51/00 ,  C23C14/12

CPC分类号： C23C14/042 ,  C23C14/12 ,  C25D1/10 ,  G03F1/10 ,  H01L51/0011

摘要： A mask frame assembly for thin film deposition includes a frame having an opening and at least two unit masks having end parts in a longitudinal direction fixed to the frame, each of the unit masks comprising first regions and second regions, the first regions having unit masking patterns, each of the unit masking patterns having a plurality of openings for thin film deposition, the unit masking pattern being spaced apart from each other, each of the second regions being interposed between a pair of adjacent ones of the first regions, the first regions having a first thickness from a first surface of the unit masks, and at least a portion of the second regions having a second thickness from a second surface of the unit masks opposite to the first surface of the unit masks, such that the first regions and the at least the portion of the second regions are offset from each other in a direction normal to the first and second surfaces. A plurality of unit masks are each half etched from different surfaces and thus a height of wrinkles generated in the mask of the mask frame assembly may be reduced.

摘要翻译： 用于薄膜沉积的掩模框架组件包括具有开口的框架和至少两个单元掩模，其具有沿着固定到框架的纵向方向上的端部，每个单元掩模包括第一区域和第二区域，第一区域具有单元屏蔽 图案，每个单位掩模图案具有多个用于薄膜沉积的开口，单元掩模图案彼此间隔开，每个第二区域插入在一对相邻的第一区域之间，第一区域 具有来自所述单元掩模的第一表面的第一厚度，并且所述第二区域的至少一部分具有来自所述单元的第二表面的第二厚度，掩模与所述单元掩模的第一表面相反，使得所述第一区域和 所述第二区域的至少所述部分在垂直于所述第一和第二表面的方向上彼此偏移。 多个单元掩模每个从不同的表面被半蚀刻，因此可以减少在掩模框组件的掩模中产生的皱纹的高度。

公开(公告)号：US20110293819A1

公开(公告)日：2011-12-01

申请号：US13208261

申请日：2011-08-11

申请人： Jung-Min Lee ,  Choong-Ho Lee ,  Yoon-Chan Oh ,  Hee-Seong Jeong

发明人： Jung-Min Lee ,  Choong-Ho Lee ,  Yoon-Chan Oh ,  Hee-Seong Jeong

IPC分类号： B05D5/06 ,  C23C14/04

CPC分类号： B08B7/0035 ,  B08B7/0042 ,  C23C14/042 ,  C23C14/564 ,  H01L51/0025 ,  H01L51/56

摘要： A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.

摘要翻译： 清理积聚在掩模上的有机沉积材料的方法包括：在包括沉积源的沉积室中，使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。 一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统，包括：沉积室，包括沉积源; 以及保持在与沉积室基本相同的真空的储存室，并且包括清除积聚在掩模上的有机沉积材料的清洁装置。

公开(公告)号：US20110220019A1

公开(公告)日：2011-09-15

申请号：US12796509

申请日：2010-06-08

申请人： Choong-Ho Lee ,  Yoon-Chan Oh ,  Jung-Min Lee

发明人： Choong-Ho Lee ,  Yoon-Chan Oh ,  Jung-Min Lee

IPC分类号： B05C11/00 ,  B23P11/00

CPC分类号： C23C14/042 ,  H01L51/0011 ,  H01L51/56

摘要： A mask frame assembly for thin film deposition, the mask frame assembly including a frame having an opening; a plurality of masks having deposition patterns, the masks being fixed to the frame such that the deposition patterns extend over the opening; and a balance stick being fixed to the frame such that the balance stick is between two of the plurality of masks, the balance stick made from an elastically tensile material.

摘要翻译： 一种用于薄膜沉积的面罩框架组件，所述面罩框架组件包括具有开口的框架; 具有沉积图案的多个掩模，所述掩模固定到所述框架，使得所述沉积图案在所述开口上延伸; 以及平衡杆，其被固定到所述框架上，使得所述平衡杆在所述多个掩模中的两个之间，所述平衡杆由弹性拉伸材料制成。

公开(公告)号：US20110168087A1

公开(公告)日：2011-07-14

申请号：US12986894

申请日：2011-01-07

申请人： Choong-Ho Lee ,  Jung-Min Lee ,  Yoon-Chan Oh

发明人： Choong-Ho Lee ,  Jung-Min Lee ,  Yoon-Chan Oh

IPC分类号： C25D1/10 ,  B05C11/00

CPC分类号： C23C14/042 ,  C23C14/12 ,  C25D1/10 ,  G03F1/10 ,  H01L51/0011

摘要： A mask frame assembly for thin film deposition includes a frame having an opening and at least two unit masks having end parts in a longitudinal direction fixed to the frame, each of the unit masks comprising first regions and second regions, the first regions having unit masking patterns, each of the unit masking patterns having a plurality of openings for thin film deposition, the unit masking pattern being spaced apart from each other, each of the second regions being interposed between a pair of adjacent ones of the first regions, the first regions having a first thickness from a first surface of the unit masks, and at least a portion of the second regions having a second thickness from a second surface of the unit masks opposite to the first surface of the unit masks, such that the first regions and the at least the portion of the second regions are offset from each other in a direction normal to the first and second surfaces. A plurality of unit masks are each half etched from different surfaces and thus a height of wrinkles generated in the mask of the mask frame assembly may be reduced.

摘要翻译： 用于薄膜沉积的掩模框架组件包括具有开口的框架和至少两个单元掩模，其具有沿着固定到框架的纵向方向上的端部，每个单元掩模包括第一区域和第二区域，第一区域具有单元屏蔽 图案，每个单位掩模图案具有多个用于薄膜沉积的开口，单元掩模图案彼此间隔开，每个第二区域插入在一对相邻的第一区域之间，第一区域 具有来自所述单元掩模的第一表面的第一厚度，并且所述第二区域的至少一部分具有来自所述单元的第二表面的第二厚度，掩模与所述单元掩模的第一表面相反，使得所述第一区域和 所述第二区域的至少所述部分在垂直于所述第一和第二表面的方向上彼此偏移。 多个单元掩模每个从不同的表面被半蚀刻，因此可以减少在掩模框组件的掩模中产生的皱纹的高度。

公开(公告)号：US20100310759A1

公开(公告)日：2010-12-09

申请号：US12795896

申请日：2010-06-08

申请人： Jung-Min Lee ,  Choong-Ho Lee ,  Yoon-Chan Oh ,  Hee-Seong Jeong

发明人： Jung-Min Lee ,  Choong-Ho Lee ,  Yoon-Chan Oh ,  Hee-Seong Jeong

IPC分类号： C23C16/04 ,  B05D5/06

CPC分类号： C23C14/042 ,  B08B7/0035 ,  B08B7/0042 ,  C23C14/564 ,  H01L51/56

摘要： A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.

摘要翻译： 清理积聚在掩模上的有机沉积材料的方法包括：在包括沉积源的沉积室中，使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。 一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统，包括：沉积室，包括沉积源; 以及保持在与沉积室基本相同的真空的储存室，并且包括清除积聚在掩模上的有机沉积材料的清洁装置。

公开(公告)号：US09174250B2

公开(公告)日：2015-11-03

申请号：US13208261

申请日：2011-08-11

申请人： Jung-Min Lee ,  Choong-Ho Lee ,  Yoon-Chan Oh ,  Hee-Seong Jeong

发明人： Jung-Min Lee ,  Choong-Ho Lee ,  Yoon-Chan Oh ,  Hee-Seong Jeong

IPC分类号： B05D5/12 ,  B08B7/00 ,  C23C14/04 ,  C23C14/56 ,  H01L51/00 ,  H01L51/56

CPC分类号： B08B7/0035 ,  B08B7/0042 ,  C23C14/042 ,  C23C14/564 ,  H01L51/0025 ,  H01L51/56

摘要： A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.

摘要翻译： 清理积聚在掩模上的有机沉积材料的方法包括：在包括沉积源的沉积室中，使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。 一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统，包括：沉积室，包括沉积源; 以及保持在与沉积室基本相同的真空的储存室，并且包括清除积聚在掩模上的有机沉积材料的清洁装置。

公开(公告)号：US08707894B2

公开(公告)日：2014-04-29

申请号：US12796509

申请日：2010-06-08

申请人： Choong-Ho Lee ,  Yoon-Chan Oh ,  Jung-Min Lee

发明人： Choong-Ho Lee ,  Yoon-Chan Oh ,  Jung-Min Lee

IPC分类号： B05C11/00

CPC分类号： C23C14/042 ,  H01L51/0011 ,  H01L51/56

摘要： A mask frame assembly for thin film deposition, the mask frame assembly including a frame having an opening; a plurality of masks having deposition patterns, the masks being fixed to the frame such that the deposition patterns extend over the opening; and a balance stick being fixed to the frame such that the balance stick is between two of the plurality of masks, the balance stick made from an elastically tensile material.

摘要翻译： 一种用于薄膜沉积的面罩框架组件，所述面罩框架组件包括具有开口的框架; 具有沉积图案的多个掩模，所述掩模固定到所述框架，使得所述沉积图案在所述开口上延伸; 以及平衡杆，其被固定到所述框架上，使得所述平衡杆在所述多个掩模中的两个之间，所述平衡杆由弹性拉伸材料制成。

公开(公告)号：US08536057B2

公开(公告)日：2013-09-17

申请号：US12797858

申请日：2010-06-10

申请人： Choong-Ho Lee ,  Yoon-Chan Oh ,  Jung-Min Lee

发明人： Choong-Ho Lee ,  Yoon-Chan Oh ,  Jung-Min Lee

IPC分类号： H01L21/44

CPC分类号： C23C14/12 ,  C23C14/042 ,  C23C14/243

摘要： A thin film deposition apparatus and a method of manufacturing an organic light emitting device (OLED) using the thin film deposition apparatus. The thin film deposition apparatus includes a deposition source; a first nozzle in which a plurality of first slits are formed in one direction; a second nozzle in which a plurality of second slits are formed in the one direction; a second nozzle frame combined with the second nozzle to support the second nozzle; a first barrier wall assembly including a plurality of first barrier walls disposed in the one direction to form a space between the first nozzle and the second nozzle; and a second barrier wall assembly having a plurality of second barrier walls disposed in the one direction and a second barrier wall frame to support the second barrier walls, the second barrier wall assembly disposed at one side of the first barrier wall assembly, wherein the second barrier walls are mounted on the second barrier wall frame in the one direction and the second barrier walls slide on the second barrier wall frame.

摘要翻译： 一种薄膜沉积设备和使用该薄膜沉积设备制造有机发光器件（OLED）的方法。 薄膜沉积设备包括沉积源; 第一喷嘴，其中在一个方向上形成有多个第一狭缝; 第二喷嘴，其中在所述一个方向上形成有多个第二狭缝; 与所述第二喷嘴结合以支撑所述第二喷嘴的第二喷嘴框架; 第一阻挡壁组件，其包括沿所述一个方向设置的多个第一阻挡壁，以在所述第一喷嘴和所述第二喷嘴之间形成空间; 以及第二阻挡壁组件，其具有沿所述一个方向设置的多个第二阻挡壁和用于支撑所述第二阻挡壁的第二阻挡壁框架，所述第二阻挡壁组件设置在所述第一阻挡壁组件的一侧，其中所述第二阻挡壁组件 阻挡壁沿一个方向安装在第二阻挡壁框架上，第二阻挡壁在第二阻挡壁框架上滑动。

公开(公告)号：US20100330712A1

公开(公告)日：2010-12-30

申请号：US12797858

申请日：2010-06-10

申请人： Choong-Ho LEE ,  Yoon-Chan Oh ,  Jung-Min Lee

发明人： Choong-Ho LEE ,  Yoon-Chan Oh ,  Jung-Min Lee

IPC分类号： H01L51/56

CPC分类号： C23C14/12 ,  C23C14/042 ,  C23C14/243

摘要： A thin film deposition apparatus and a method of manufacturing an organic light emitting device (OLED) using the thin film deposition apparatus. The thin film deposition apparatus includes a deposition source; a first nozzle in which a plurality of first slits are formed in one direction; a second nozzle in which a plurality of second slits are formed in the one direction; a second nozzle frame combined with the second nozzle to support the second nozzle; a first barrier wall assembly including a plurality of first barrier walls disposed in the one direction to form a space between the first nozzle and the second nozzle; and a second barrier wall assembly having a plurality of second barrier walls disposed in the one direction and a second barrier wall frame to support the second barrier walls, the second barrier wall assembly disposed at one side of the first barrier wall assembly, wherein the second barrier walls are mounted on the second barrier wall frame in the one direction and the second barrier walls slide on the second barrier wall frame.

摘要翻译： 一种薄膜沉积设备和使用该薄膜沉积设备制造有机发光器件（OLED）的方法。 薄膜沉积设备包括沉积源; 第一喷嘴，其中在一个方向上形成有多个第一狭缝; 第二喷嘴，其中在所述一个方向上形成有多个第二狭缝; 与所述第二喷嘴结合以支撑所述第二喷嘴的第二喷嘴框架; 第一阻挡壁组件，其包括沿所述一个方向设置的多个第一阻挡壁，以在所述第一喷嘴和所述第二喷嘴之间形成空间; 以及第二阻挡壁组件，其具有沿所述一个方向设置的多个第二阻挡壁和用于支撑所述第二阻挡壁的第二阻挡壁框架，所述第二阻挡壁组件设置在所述第一阻挡壁组件的一侧，其中所述第二阻挡壁组件 阻挡壁沿一个方向安装在第二阻挡壁框架上，第二阻挡壁在第二阻挡壁框架上滑动。