-
公开(公告)号：US07352440B2
公开(公告)日：2008-04-01
申请号：US11008576
申请日：2004-12-10
申请人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
发明人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
CPC分类号： G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
摘要： A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
-
公开(公告)号：US20120050740A1
公开(公告)日：2012-03-01
申请号：US13288714
申请日：2011-11-03
申请人： CHRISTIAAN ALEXANDER HOOGENDAM , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
发明人： CHRISTIAAN ALEXANDER HOOGENDAM , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
IPC分类号： G01B11/00
CPC分类号： G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
摘要： A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
摘要翻译： 用于确定衬底的中心和卡盘中的凹陷的中心之间的偏移的方法包括向所述凹陷提供测试衬底，所述测试衬底具有小于所述凹陷的尺寸的尺寸，测量对准的位置 在凹陷期间测试基板的标记，并且从对准标记的位置确定基板的中心与凹陷的中心之间的偏移。
-
公开(公告)号：US08441617B2
公开(公告)日：2013-05-14
申请号：US13288714
申请日：2011-11-03
申请人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
发明人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
CPC分类号： G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
摘要： A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
-
公开(公告)号：US20130182231A1
公开(公告)日：2013-07-18
申请号：US13672539
申请日：2012-11-08
申请人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
发明人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
CPC分类号： G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
摘要： A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
摘要翻译： 用于确定衬底的中心和卡盘中的凹陷的中心之间的偏移的方法包括向所述凹陷提供测试衬底，所述测试衬底具有小于所述凹陷的尺寸的尺寸，测量对准的位置 在凹陷期间测试基板的标记，并且从对准标记的位置确定基板的中心与凹陷的中心之间的偏移。
-
公开(公告)号：US20110013188A1
公开(公告)日：2011-01-20
申请号：US12838200
申请日：2010-07-16
CPC分类号： G01B11/0608 , G01B11/272
摘要： A lithographic apparatus includes apparatus for measuring the alignment of an object. The measuring apparatus includes a plurality of alignment sensors, each including an alignment detector for measuring the position of an alignment mark over an alignment detection area. The measuring apparatus further includes a leveling sensor for measuring the height and/or tilt of an object in a leveling sensor detection area, and a feed-forward connection between said leveling sensor and said alignment sensors.
摘要翻译： 光刻设备包括用于测量物体的对准的装置。 测量装置包括多个对准传感器，每个对准传感器包括对准检测器，用于测量对准检测区域上的对准标记的位置。 测量装置还包括用于测量调平传感器检测区域中的物体的高度和/或倾斜的调平传感器以及所述调平传感器和所述对准传感器之间的前馈连接。
-
-
-
-
搜索结果
5 条记录 (耗时 0.023 秒)