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公开(公告)号：US11532465B2
公开(公告)日：2022-12-20
申请号：US16280028
申请日：2019-02-19
摘要： A parallelepipedal low-pressure plasma chamber body of glass is disclosed. The low-pressure plasma chamber may have electrodes at opposing sides of the low-pressure plasma chamber body. Furthermore, the low-pressure plasma chamber may have at opposing sides a door and a rear wall closure. The door and rear wall closure may in each case have at least one media connection in order to achieve a uniform gas flow in the low-pressure plasma chamber. The door may be assembled on the collar of the low-pressure plasma chamber body which extends radially away from the longitudinal axis of the low-pressure plasma chamber body. The low-pressure plasma chamber body is preferably produced using the pressing method or blow-and-blow method, in an analogous manner to industrial glass bottle production.
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公开(公告)号：US10041730B2
公开(公告)日：2018-08-07
申请号：US15405644
申请日：2017-01-13
摘要： A vacuum system, such as the form of a plasma system, includes a vacuum chamber. The side walls of the vacuum chamber are configured in the form of a completely closed chamber extruded profile. A first end face of the chamber extruded profile is closed off with a plate. A second end face of the chamber extruded profile, which lies opposite the first end face, has a reversibly openable and closable door. The door is fastened by at least one hinge pivotably to the chamber extruded profile. The side walls, which are fully closed transversely to the longitudinal axis of the chamber extruded profile, enable a simple and cost-effective production of the vacuum chamber. The vacuum chamber may be accommodated at least partially in a housing, which may likewise be configured at least partially in the form of an extruded profile.
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3.发明申请公开(公告)号：US20190259584A1
公开(公告)日：2019-08-22
申请号：US16280028
申请日：2019-02-19
摘要： A parallelepipedal low-pressure plasma chamber body of glass is disclosed. The low-pressure plasma chamber may have electrodes at opposing sides of the low-pressure plasma chamber body. Furthermore, the low-pressure plasma chamber may have at opposing sides a door and a rear wall closure. The door and rear wall closure may in each case have at least one media connection in order to achieve a uniform gas flow in the low-pressure plasma chamber. The door may be assembled on the collar of the low-pressure plasma chamber body which extends radially away from the longitudinal axis of the low-pressure plasma chamber body. The low-pressure plasma chamber body is preferably produced using the pressing method or blow-and-blow method, in an analogous manner to industrial glass bottle production.
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公开(公告)号：USD836212S1
公开(公告)日：2018-12-18
申请号：US29553563
申请日：2016-02-02
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公开(公告)号：US09741547B2
公开(公告)日：2017-08-22
申请号：US15271137
申请日：2016-09-20
IPC分类号： H01J37/32 , H01J37/18 , H01J37/244
CPC分类号： H01J37/32449 , H01J37/18 , H01J37/244 , H01J37/32009 , H01J37/32825 , H01J37/32926 , H01J2237/186
摘要： The low pressure plasma system includes a treatment chamber which is pumped out in a first process step by means of a pump. In a second process step a gas supply valve is opened in order to achieve a defined gas composition in the treatment chamber at low pressure. In a third process step a plasma generator is switched on in order to ignite a plasma in the treatment chamber. In a fourth process step a flushing valve can be opened in order to flush the treatment chamber. In a fifth process step the treatment chamber can be ventilated by way of a ventilation valve. The sequential switching element can be a rotary switch and include a zero switching position where the low pressure plasma system is off. The sequential switching element renders possible a simple embodiment of the low pressure plasma system and its intuitive operation.
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公开(公告)号：US20170122663A1
公开(公告)日：2017-05-04
申请号：US15405644
申请日：2017-01-13
CPC分类号： F26B5/04 , B01J19/088 , B01J2219/0894 , H01J37/16 , H01J37/32458 , H01L21/6719
摘要： A vacuum system, such as the form of a plasma system, includes a vacuum chamber. The side walls of the vacuum chamber are configured in the form of a completely closed chamber extruded profile. A first end face of the chamber extruded profile is closed off with a plate. A second end face of the chamber extruded profile, which lies opposite the first end face, has a reversibly openable and closable door. The door is fastened by at least one hinge pivotably to the chamber extruded profile. The side walls, which are fully closed transversely to the longitudinal axis of the chamber extruded profile, enable a simple and cost-effective production of the vacuum chamber. The vacuum chamber may be accommodated at least partially in a housing, which may likewise be configured at least partially in the form of an extruded profile.
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公开(公告)号：US11459278B2
公开(公告)日：2022-10-04
申请号：US17601365
申请日：2020-04-09
摘要： The invention relates to a coating method for energetic material (12), in particular in a vacuum. The energetic material (12) is coated by chemical or physical vapor deposition. The coating material (16) is electrically conductive and/or hydrophobic or hydrophilic. The energetic material (12) is shaped as grains and/or pellets and/or is in the form of a powder.
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公开(公告)号：US10580619B2
公开(公告)日：2020-03-03
申请号：US16303265
申请日：2017-05-04
摘要： A circuit assembly (12) includes a direct voltage supply (13) providing a direct voltage (Ucc), a step-up converter circuit (16), and a control unit (17). The step-up converter circuit (16) contains a series circuit consisting of an inductor (18) and a controllable switch (19), wherein the inductor (18) is connected between a pole (21) of the direct voltage supply (13) and a first electrode (D) of the switch (19). The control unit (17) controls the switch (19) with a high-frequency to generate high-frequency energy with a periodic pulse-like output voltage (UDS) at the first electrode (D) of the switch (19), said output voltage having a peak value larger than the value of the direct voltage (Ucc). The high-frequency energy is directly output without transformation at an output connection (24) designed to directly connect to an electrode (8) of the vacuum chamber (2).
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公开(公告)号：US20170011888A1
公开(公告)日：2017-01-12
申请号：US15271137
申请日：2016-09-20
IPC分类号： H01J37/32 , H01J37/244 , H01J37/18
CPC分类号： H01J37/32449 , H01J37/18 , H01J37/244 , H01J37/32009 , H01J37/32825 , H01J37/32926 , H01J2237/186
摘要： The low pressure plasma system includes a treatment chamber which is pumped out in a first process step by means of a pump. In a second process step a gas supply valve is opened in order to achieve a defined gas composition in the treatment chamber at low pressure. In a third process step a plasma generator is switched on in order to ignite a plasma in the treatment chamber. In a fourth process step a flushing valve can be opened in order to flush the treatment chamber. In a fifth process step the treatment chamber can be ventilated by way of a ventilation valve. The sequential switching element can be a rotary switch and include a zero switching position where the low pressure plasma system is off. The sequential switching element renders possible a simple embodiment of the low pressure plasma system and its intuitive operation.
摘要翻译： 低压等离子体系统包括处理室，其通过泵在第一工艺步骤中泵出。 在第二工艺步骤中，打开气体供给阀以便在处理室中以低压实现确定的气体组成。 在第三工艺步骤中，等离子体发生器被接通以点燃处理室中的等离子体。 在第四个处理步骤中，可以打开冲洗阀以便冲洗处理室。 在第五工艺步骤中，处理室可以通过通风阀来通风。 顺序开关元件可以是旋转开关，并且包括零开关位置，其中低压等离子体系统关闭。 顺序开关元件使得低压等离子体系统的简单实施例及其直观的操作成为可能。
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公开(公告)号：US20160287735A1
公开(公告)日：2016-10-06
申请号：US15184844
申请日：2016-06-16
CPC分类号： A61L2/0011 , A61L2/14 , A61L2202/182 , A61L2202/21 , A61L2202/23
摘要： A plasma installation includes at least two separate components being a vessel for an object to be processed and a plasma unit having an electrical plasma source for igniting a plasma in the vessel. The plasma unit has no additional subassembly for other media so that the plasma unit can be constructed in a structurally particularly simple manner and readily operated. In a particularly preferred manner, the vessel comprises a vessel body of glass. The vessel body is preferably constructed in one piece and surrounds the object completely. The plasma can be ignited spaced apart from the plasma unit by means of a high-frequency generator, an induction coil and/or a magnetron of the electrical plasma source.
摘要翻译： 等离子体装置包括至少两个单独的组件，其是用于待处理物体的容器和具有用于点燃容器中的等离子体的电等离子体源的等离子体单元。 等离子体单元没有用于其它介质的附加子组件，使得等离子体单元可以以结构上特别简单的方式构造并且容易操作。 在特别优选的方式中，容器包括玻璃容器体。 容器体优选构造成一体并且完全包围物体。 等离子体可以通过电等离子体源的高频发生器，感应线圈和/或磁控管与等离子体单元间隔开。
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