摘要:
A coating liquid including one or more of metal complexes selected from a metal complex A represented by Chemical Formula 1, a metal complex B represented by Chemical Formula 2, and a metal complex C represented by Chemical Formula 3. M in Formula 1, 2 and 3 represents a metal ion. Each of X1-X4 in Formula 1, 2 and 3 is one of O, NH, CO2 and S. Each of Y1-Y8 in Formula 1 and Y1-Y4 in Formula 3 is either CH or N. Each of Z1-Z3 in Formula 2 and 3 and Z4-Z6 in Formula 2 is one selected from a group of O, NH and S, and two selected from a group of CH and N. L represents an axial ligand. k represents a valence of each of the metal complexes and is equal to a sum of electric charges of M, X1-X4 and L.
摘要:
The present invention provides a technology related to a conductive film which is high in transparency, conductivity, and adhesiveness to a base plate. The present invention also provides a coating liquid including metal materials reacting with a ligand represented by Chemical Formula 1 and including indium (In), tin (Sn), or both thereof. Each of R21—R24 in the Chemical Formula 1 is one of the followings (1)-(11) and X11 and X12 is either hetero atoms or carboxylic acid. (1) a group represented by ClH2l+1 (aforementioned l is an integral number of 0 to 4), (2) a group represented by CmH2m (aforementioned m is an integral number of 2 to 4), (3) a group represented by CnH2n−1 (aforementioned n is an integral number of 2 to 4), (4) a group represented by COOR (aforementioned R is CpH2p+1 (aforementioned p is an integral number of 0 to 4) or a group represented by R═C6H5), (5) a group represented by aldehyde, ketones, COCqH2q+1 (aforementioned q is an integral number of 0 to 4), or benzophenone, (6) hydroxyl (OH) or ethers, (7) amine (NH2) or alkylamine, (8) amide (9) halogens (10) nitrile (CN) (11) nitro (NO2)
摘要:
The present invention provides a technology related to a conductive film which is high in transparency, conductivity, and adhesiveness to a base plate. The present invention also provides a coating liquid including metal materials reacting with a ligand represented by a particular Chemical Formula and including indium (In), tin (Sn), or both thereof.
摘要:
A coating liquid including one or more of metal complexes selected from a metal complex A represented by Chemical Formula 1, a metal complex B represented by Chemical Formula 2, and a metal complex C represented by Chemical Formula 3. M in Chemical Formula 1, Chemical Formula 2 and Chemical Formula 3 represents a metal ion. Each of X1-X4 in Chemical Formula 1, Chemical Formula 2 and Chemical Formula 3 is one of O, NH, CO2 and S. Each of Y1-Y8 in Chemical Formula 1 and Y1-Y4 in Chemical Formula 3 is either CH or N. Each of Z1-Z3 in Chemical Formula 2 and Chemical Formula 3 and Z4-Z6 in Chemical Formula 2 is one selected from a group of O, NH and S, and two selected from a group of CH and N. L in Chemical Formula 1, Chemical Formula 2 and Chemical Formula 3 represents an axial ligand. k in Chemical Formula 1, Chemical Formula 2 and Chemical Formula 3 represents a valence of each of the metal complexes and is equal to a sum of electric charges of M, X1-X4 and L.
摘要:
The present invention provides a coating liquid including organic metal complexes represented by Chemical Formula 1. R1-R8 in Chemical Formula 1 is one of the followings (1)-(4): (1) a group represented by CnH2n+1 (aforementioned n is an integral number equal to or larger than 0); (2) a group represented by COOR9 (aforementioned R9 is a group represented by CmH2m+1, and aforementioned m is an integral number equal to or larger than 0); (3) a halogen atom; and (4) CN or NO2.
摘要:
The present invention provides a coating liquid including organic metal complexes represented by Chemical Formula 1. R1-R8 in Chemical Formula 1 is one of the followings (1)-(4): (1) a group represented by CnH2n+1 (aforementioned n is an integral number equal to or larger than 0); (2) a group represented by COOR9 (aforementioned R9 is a group represented by CmH2m+1, and aforementioned m is an integral number equal to or larger than 0); (3) a halogen atom; and (4) CN or NO2.
摘要翻译:本发明提供包含化学式1表示的有机金属配合物的涂布液。化学式1中的R 1 -R 8是以下(1)〜(4)之一:(1)由C n H 2n + 1表示的基团(上述n 是等于或大于0的整数); (2)由COOR9表示的基团(上述R9为由CmH2m + 1表示的基团,上述m为0以上的整数)。 (3)卤原子; 和(4)CN或NO2。
摘要:
The present invention provides a coating liquid including organic metal complexes represented by Chemical Formula 1. R1-R8 in Chemical Formula 1 is one of the followings (1)-(4): (1) a group represented by CnH2n+1 (aforementioned n is an integral number equal to or larger than 0); (2) a group represented by COOR9 (aforementioned R9 is a group represented by CmH2m+1, and aforementioned m is an integral number equal to or larger than 0); (3) a halogen atom; and (4) CN or NO2.
摘要翻译:本发明提供包含化学式1表示的有机金属配合物的涂布液。化学式1中的R 1 -R 8是以下(1)〜(4)之一:(1)由C n H 2n + 1表示的基团(上述n 是等于或大于0的整数); (2)由COOR9表示的基团(上述R9为由CmH2m + 1表示的基团,上述m为0以上的整数)。 (3)卤原子; 和(4)CN或NO2。
摘要:
The present invention provides a coating liquid including organic metal complexes represented by Chemical Formula 1. R1—R8 in Chemical Formula 1 is one of the followings (1)-(4): (1) a group represented by CnH2n+1 (aforementioned n is an integral number equal to or larger than 0); (2) a group represented by COOR9 (aforementioned R9 is a group represented by CmH2m+1, and aforementioned m is an integral number equal to or larger than 0); (3) a halogen atom; and (4) CN or NO2.
摘要翻译:本发明提供包含化学式1表示的有机金属配合物的涂布液。化学式1中的R 1 -R 8是以下(1)〜(4)之一:(1)由C n H 2n + 1表示的基团(上述n 是等于或大于0的整数); (2)由COOR9表示的基团(上述R9为由CmH2m + 1表示的基团,上述m为0以上的整数)。 (3)卤原子; 和(4)CN或NO2。
摘要:
Disclosed is a positive-type photosensitive composition which can form a metal compound film pattern at high resolution and with less affection by organic residues. The positive-type photosensitive composition comprises: a metal complex component (A) which can form a metal compound film when applied and subsequently fired; and a photosensitizing agent (B). In the composition, a ligand in the component (A) is preferably a multidentate ligand having an aromatic compound as its skeleton. According to this construction, even a composition containing substantially no photosensitive resin can impart photosensitivity and a metal compound film pattern can be formed readily.
摘要:
Disclosed is a positive-type photosensitive composition which can form a metal compound film pattern at high resolution and with less affection by organic residues. The positive-type photosensitive composition comprises: a metal complex component (A) which can form a metal compound film when applied and subsequently fired; and a photosensitizing agent (B). In the composition, a ligand in the component (A) is preferably a multidentate ligand having an aromatic compound as its skeleton. According to this construction, even a composition containing substantially no photosensitive resin can impart photosensitivity and a metal compound film pattern can be formed readily.