Dummy pattern performance aware analysis and implementation
    1.
    发明授权
    Dummy pattern performance aware analysis and implementation 有权
    虚拟模式性能意识分析和实现

    公开(公告)号:US09262568B2

    公开(公告)日:2016-02-16

    申请号:US12763889

    申请日:2010-04-20

    IPC分类号: G06F17/50

    摘要: Embodiments of the present invention are a system, a computer program product, and a method for implementing an integrated circuit design. The method for implementing an integrated circuit design includes accessing an original electronic representation of an integrated circuit layout from a first user file, and accessing a defined sensitivity index that characterizes an impact of the dummy pattern on the functional component. The impact of the dummy pattern on the functional component is analyzed and it is determined whether the impact is within a limit of the sensitivity index. One of a plurality of features of the dummy pattern is adjusted if the impact is not within the limit to form a generated electronic representation of a modified integrated circuit layout, and the generated electronic representation is output to a second user file. The integrated circuit layout includes a dummy pattern and a functional component.

    摘要翻译: 本发明的实施例是一种用于实现集成电路设计的系统,计算机程序产品和方法。 用于实现集成电路设计的方法包括从第一用户文件访问集成电路布局的原始电子表示,以及访问表征虚拟图案对功能组件的影响的定义的灵敏度指标。 分析虚拟模式对功能组件的影响,确定影响是否在灵敏度指标的极限之内。 如果影响不在限制内以形成经修改的集成电路布局的生成的电子表示,则调整虚拟图案的多个特征之一,并且所生成的电子表示被输出到第二用户文件。 集成电路布局包括虚拟图案和功能部件。

    Dummy Pattern Performance Aware Analysis and Implementation
    2.
    发明申请
    Dummy Pattern Performance Aware Analysis and Implementation 有权
    虚拟模式性能意识分析与实现

    公开(公告)号:US20110016443A1

    公开(公告)日:2011-01-20

    申请号:US12763889

    申请日:2010-04-20

    IPC分类号: G06F17/50

    摘要: Embodiments of the present invention are a system, a computer program product, and a method for implementing an integrated circuit design. An embodiment is a method for implementing an integrated circuit design. The method comprises accessing an original electronic representation of an integrated circuit layout from a first user file, accessing a defined sensitivity index that characterizes an impact of the dummy pattern on the functional component, analyzing the impact of the dummy pattern on the functional component, determining whether the impact is within a limit of the sensitivity index, adjusting one of a plurality of features of the dummy pattern if the impact is not within the limit to form a generated electronic representation of a modified integrated circuit layout, and outputting the generated electronic representation to a second user file. The integrated circuit layout comprises a dummy pattern and a functional component.

    摘要翻译: 本发明的实施例是一种用于实现集成电路设计的系统,计算机程序产品和方法。 实施例是用于实现集成电路设计的方法。 该方法包括从第一用户文件访问集成电路布局的原始电子表示,访问表征虚拟模式对功能组件的影响的定义的灵敏度指标,分析虚拟模式对功能组件的影响,确定 影响是否在灵敏度指标的极限内,如果影响不在限制内,则调整虚拟图案的多个特征之一以形成经修改的集成电路布局的生成的电子表示,并输出生成的电子表示 到第二个用户文件。 集成电路布局包括虚拟图案和功能部件。

    DFM improvement utility with unified interface
    3.
    发明授权
    DFM improvement utility with unified interface 有权
    具有统一接口的DFM改进实用程序

    公开(公告)号:US08726208B2

    公开(公告)日:2014-05-13

    申请号:US13186241

    申请日:2011-07-19

    IPC分类号: G06F9/455 G06F17/50

    摘要: A utility includes a design-for-manufacturing (DFM) checker configured to check layout patterns of an integrated circuit, and a layout change instruction generator configured to generate a layout change instruction based on a result generated by the DFM checker. The DFM checker and the layout change instruction generator are embodied on a non-transitory storage media. The layout change instruction specifies an identifier of a layout pattern among the layout patterns, and a respective layout change to be performed on the layout pattern.

    摘要翻译: 一种实用程序包括:被配置为检查集成电路的布局图案的制造设计(DFM)检查器,以及布局改变指令生成器,其被配置为基于由DFM检验器生成的结果生成布局改变指令。 DFM检查器和布局改变指令生成器体现在非暂时性的存储介质上。 布局改变指令指定布局图案之间的布局图案的标识符以及要在布局图案上执行的各自的布局改变。

    Method and system for predicting shrinkable yield for business assessment of integrated circuit design shrink
    4.
    发明授权
    Method and system for predicting shrinkable yield for business assessment of integrated circuit design shrink 有权
    集成电路设计业务评估收缩收益预测方法与系统收缩

    公开(公告)号:US08577717B2

    公开(公告)日:2013-11-05

    申请号:US11486521

    申请日:2006-07-13

    IPC分类号: G06Q99/00 G06Q30/02 G06Q10/04

    CPC分类号: G06Q30/0283 G06Q10/04

    摘要: A method and a system for predicting shrinkable yield for business assessment of integrated circuit design shrink are provided. An assessment system is provided to determine cost benefits of a design shrink of an integrated circuit chip. A cost benefit analysis across different design shrink technologies is provided early in the process, so that business decisions regarding employment of design shrinks can be made as early as possible.

    摘要翻译: 提供了一种用于预测集成电路设计收缩业务评估的收缩收益的方法和系统。 提供评估系统来确定集成电路芯片设计收缩的成本优势。 在早期提供不同设计收缩技术的成本效益分析,以便尽可能早地制定有关就业设计缩减的业务决策。

    Cell-context aware integrated circuit design
    6.
    发明授权
    Cell-context aware integrated circuit design 有权
    电池背景感知集成电路设计

    公开(公告)号:US08677292B2

    公开(公告)日:2014-03-18

    申请号:US12708098

    申请日:2010-02-18

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5072

    摘要: A method of designing an integrated circuit includes providing a standard cell database including a plurality of standard cells; providing an index file having cell-context information indexed to the plurality of standard cells; retrieving the cell-context information of one of the plurality of standard cells from the cell-context file; and applying the index information to a design of the integrated circuit.

    摘要翻译: 设计集成电路的方法包括提供包括多个标准单元的标准单元数据库; 提供具有索引到所述多个标准单元的单元格上下文信息的索引文件; 从所述小区上下文文件中检索所述多个标准单元之一的小区上下文信息; 以及将所述索引信息应用于所述集成电路的设计。

    DFM Improvement Utility with Unified Interface
    7.
    发明申请
    DFM Improvement Utility with Unified Interface 有权
    带统一接口的DFM改进实用程序

    公开(公告)号:US20130024832A1

    公开(公告)日:2013-01-24

    申请号:US13186241

    申请日:2011-07-19

    IPC分类号: G06F17/50

    摘要: A utility includes a design-for-manufacturing (DFM) checker configured to check layout patterns of an integrated circuit, and a layout change instruction generator configured to generate a layout change instruction based on a result generated by the DFM checker. The DFM checker and the layout change instruction generator are embodied on a non-transitory storage media. The layout change instruction specifies an identifier of a layout pattern among the layout patterns, and a respective layout change to be performed on the layout pattern.

    摘要翻译: 一种实用程序包括:被配置为检查集成电路的布局图案的制造设计(DFM)检查器,以及布局改变指令生成器,其被配置为基于由DFM检验器生成的结果生成布局改变指令。 DFM检查器和布局改变指令生成器体现在非暂时性的存储介质上。 布局改变指令指定布局图案之间的布局图案的标识符以及要在布局图案上执行的相应布局改变。

    Alternative methodology for defect simulation and system
    8.
    发明申请
    Alternative methodology for defect simulation and system 有权
    缺陷模拟和系统的替代方法

    公开(公告)号:US20060230371A1

    公开(公告)日:2006-10-12

    申请号:US11099834

    申请日:2005-04-06

    IPC分类号: G06F17/50 G06F9/45

    CPC分类号: G06F17/5081

    摘要: A system for defect simulation is provided. A defect layout generator generates a defect layout comprising a given number of spot defects of a given size. A processor first compares the defect layout and a provided circuit layout comprising a plurality of conductive regions. The processor further determines whether the spot defects are located on the conductive regions, and determines whether short-circuits and/or open circuits are caused by the spot defects in the conductive regions.

    摘要翻译: 提供了一种用于缺陷模拟的系统。 缺陷布局生成器生成包括给定尺寸的给定数量的斑点缺陷的缺陷布局。 处理器首先比较缺陷布局和提供的包括多个导电区域的电路布局。 处理器还确定斑点缺陷是否位于导电区域上,并且确定短路和/或开路是否由导电区域中的斑点缺陷引起。

    Semiconductor Devices and Methods of Manufacture Thereof
    9.
    发明申请
    Semiconductor Devices and Methods of Manufacture Thereof 有权
    半导体器件及其制造方法

    公开(公告)号:US20140001638A1

    公开(公告)日:2014-01-02

    申请号:US13540464

    申请日:2012-07-02

    IPC分类号: H01L23/50 H01L21/306

    摘要: Semiconductor devices and methods of manufacture thereof are disclosed. In one embodiment, a semiconductor device includes a workpiece and a plurality of first conductive lines disposed over the workpiece in a metallization layer. A plurality of second conductive lines is disposed over the workpiece in the metallization layer. The plurality of second conductive lines comprises a greater vertical height in a cross-sectional view of the workpiece than a vertical height of the plurality of first conductive lines.

    摘要翻译: 公开了半导体器件及其制造方法。 在一个实施例中,半导体器件包括工件和在金属化层中设置在工件上的多个第一导电线。 多个第二导线设置在金属化层中的工件上方。 多个第二导电线在工件的横截面视图中包括比多个第一导电线的垂直高度更大的垂直高度。

    Cell-Context Aware Integrated Circuit Design
    10.
    发明申请
    Cell-Context Aware Integrated Circuit Design 有权
    电池上下文感知集成电路设计

    公开(公告)号:US20100275167A1

    公开(公告)日:2010-10-28

    申请号:US12708098

    申请日:2010-02-18

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5072

    摘要: A method of designing an integrated circuit includes providing a standard cell database including a plurality of standard cells; providing an index file having cell-context information indexed to the plurality of standard cells; retrieving the cell-context information of one of the plurality of standard cells from the cell-context file; and applying the index information to a design of the integrated circuit.

    摘要翻译: 设计集成电路的方法包括提供包括多个标准单元的标准单元数据库; 提供具有索引到所述多个标准单元的单元格上下文信息的索引文件; 从所述小区上下文文件中检索所述多个标准小区之一的小区上下文信息; 以及将所述索引信息应用于所述集成电路的设计。