公开(公告)号：US20050277368A1

公开(公告)日：2005-12-15

申请号：US11160197

申请日：2005-06-13

申请人： Cormac Walsh ,  Jun Liu ,  Gerard Moloney ,  A. Ernesto Saldana

发明人： Cormac Walsh ,  Jun Liu ,  Gerard Moloney ,  A. Ernesto Saldana

IPC分类号： B24B1/00 ,  B24B37/20 ,  B24B37/34 ,  B24D13/14

CPC分类号： B24B37/34 ,  B24B37/20

摘要： The invention provides a pad removal apparatus and method that enables improved pad removal from a platen.

摘要翻译： 本发明提供一种能够改进从压盘移除垫的去除装置和方法。

公开(公告)号：US07125326B2

公开(公告)日：2006-10-24

申请号：US11160197

申请日：2005-06-13

申请人： Cormac Walsh ,  Jun Liu ,  Gerard Moloney ,  A. Ernesto Saldana

发明人： Cormac Walsh ,  Jun Liu ,  Gerard Moloney ,  A. Ernesto Saldana

IPC分类号： B24D11/00

CPC分类号： B24B37/34 ,  B24B37/20

摘要： The invention provides a pad removal apparatus and method that enables improved pad removal from a platen.

摘要翻译： 本发明提供一种能够改进从压盘移除垫的去除装置和方法。

公开(公告)号：US20050130566A1

公开(公告)日：2005-06-16

申请号：US11043531

申请日：2005-01-25

申请人： Jiro Kajiwara ,  Gerard Moloney ,  Jun Liu ,  Junsheng Yang ,  Ernesto Saldana ,  Cormac Walsh ,  Alejandro Reyes

发明人： Jiro Kajiwara ,  Gerard Moloney ,  Jun Liu ,  Junsheng Yang ,  Ernesto Saldana ,  Cormac Walsh ,  Alejandro Reyes

IPC分类号： B24B37/04 ,  B24B57/02 ,  H01L21/304 ,  B24B49/00

CPC分类号： B24B37/04 ,  B24B57/02

摘要： A polishing apparatus (100) is provided for polishing a substrate (102) that has slurry distributor (125) which improves planarization uniformity. Generally, apparatus (100) includes: (i) platen (106) with polishing surface (110); (ii) head (116) adapted to hold substrate (102) against polishing surface; (iii) mechanism to rotate platen (106) during polishing; (iv) dispenser (124) having nozzles (126, 128) to dispense slurry on the surface (110); and (v) distributor (125) between the nozzles (126, 128) and head (116). In one embodiment, apparatus (100) further includes a wiper (180) between head (116) and distributor (125) to remove used slurry and polishing byproducts from surface (110), thereby reducing agglomerations or deposits that can damage substrate (102) and improving yield. Optionally, apparatus (100) further includes dispenser (186) for dispensing a fluid before and/or after wiper (180) to substantially eliminate buildup of deposits. Method for polishing and substrate polished according to method.

摘要翻译： 提供抛光装置（100），用于抛光具有改善平坦化均匀性的浆料分配器（125）的基底（102）。 通常，设备（100）包括：（i）具有抛光表面（110）的压板（106）; （ii）适于将衬底（102）保持在抛光表面上的头部（116） （iii）在抛光期间旋转压板（106）的机构; （iv）具有喷嘴（126,128）的分配器（124），用于在所述表面（110）上分配浆料; 和（v）在喷嘴（126,128）和头部（116）之间的分配器（125）。 在一个实施例中，设备（100）还包括头部（116）和分配器（125）之间的擦拭器（180），以去除使用的浆料并从表面（110）抛光副产物，从而减少可损坏基底（102）的团聚或沉积， 并提高产量。 可选地，装置（100）还包括用于在擦拭器（180）之前和/或之后分配流体以基本上消除沉积物累积的分配器（186）。 抛光方法和基材抛光方法。

公开(公告)号：US06887132B2

公开(公告)日：2005-05-03

申请号：US10234780

申请日：2002-09-03

申请人： Jiro Kajiwara ,  Gerard Moloney ,  Jun Liu ,  Junsheng Yang ,  Ernesto Saldana ,  Cormac Walsh ,  Alejandro Reyes

发明人： Jiro Kajiwara ,  Gerard Moloney ,  Jun Liu ,  Junsheng Yang ,  Ernesto Saldana ,  Cormac Walsh ,  Alejandro Reyes

IPC分类号： B24B37/04 ,  B24B57/02 ,  H01L21/304 ,  B24B1/00

CPC分类号： B24B37/04 ,  B24B57/02

摘要： A polishing apparatus (100) is provided for polishing a substrate (102) that has slurry distributor (125) which improves planarization uniformity. Generally, the apparatus (100) includes: (i) a platen (106) with a polishing surface (110); (ii) a head (116) adapted to hold the substrate (102) against the polishing surface; (iii) a mechanism to rotate the platen (106) during polishing; (iv) a dispenser (124) having nozzles (126, 128) to dispense slurry on the surface (110); and (v) a distributor (125) between the nozzles (126, 128) and the head (116). In one embodiment, the apparatus (100) further includes a wiper (180) between the head (116) and the distributor (125) to remove used slurry and polishing byproducts from the surface (110), thereby reducing agglomerations or deposits that can damage the substrate (102) and improving yield. Optionally, the apparatus (100) further includes a dispenser (186) for dispensing a cleaning fluid before and/or after the wiper (180) to substantially eliminate buildup of deposits.

摘要翻译： 提供抛光装置（100），用于抛光具有改善平坦化均匀性的浆料分配器（125）的基底（102）。 通常，设备（100）包括：（i）具有抛光表面（110）的压板（106）; （ii）适于将衬底（102）保持在抛光表面上的头部（116）; （iii）在抛光期间使压板（106）旋转的机构; （iv）具有用于在所述表面（110）上分配浆料的喷嘴（126,128）的分配器（124）; 和（v）在喷嘴（126,128）和头部（116）之间的分配器（125）。 在一个实施例中，设备（100）还包括位于头部（116）和分配器（125）之间的擦拭器（180），以从表面（110）去除所使用的浆料和抛光副产品，从而减少可能损坏的附聚物 基底（102）并提高产量。 可选地，装置（100）还包括用于在擦拭器（180）之前和/或之后分配清洁流体以基本上消除沉积物累积的分配器（186）。

公开(公告)号：US07326103B2

公开(公告)日：2008-02-05

申请号：US10700984

申请日：2003-11-04

申请人： Kunihiko Sakurai ,  Gerard Moloney ,  Huey-Ming Wang ,  Jun Liu ,  Peter Lao

发明人： Kunihiko Sakurai ,  Gerard Moloney ,  Huey-Ming Wang ,  Jun Liu ,  Peter Lao

IPC分类号： B24B49/00

CPC分类号： B24B37/30 ,  B24B47/22

摘要： The invention provides a vertically adjustable chemical mechanical polishing head having a pivot mechanism and method for use thereof.

摘要翻译： 本发明提供了一种具有枢转机构和方法的可垂直调节的化学机械抛光头。

公开(公告)号：USD1025525S1

公开(公告)日：2024-04-30

申请号：US29850874

申请日：2022-08-24

申请人： Jun Liu

设计人： Jun Liu

摘要： FIG. 1 is a top perspective view of a bed vacuum cleaner, showing my new design;
FIG. 2 is a bottom perspective view thereof;
FIG. 3 is a front view thereof;
FIG. 4 is a rear view thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a right side view thereof;
FIG. 7 is a top view thereof; and,
FIG. 8 is a bottom view thereof.
It is mainly composed of HEPA Filter, high-frequency tapping, vacuum motor, and visual trash can. It combines three functions of purple light, polaroid and vacuuming to absorb particles such as hair, pollen, dust, dander, etc. it is suitable for cleaning beds, sofas and other fabric products.
The broken lines in the drawings illustrate the portions of the bed vacuum cleaner, which form no part of the claimed design.

公开(公告)号：US10906934B2

公开(公告)日：2021-02-02

申请号：US14007610

申请日：2012-03-23

申请人： Arick Brown ,  Junyan Ji ,  Jun Liu ,  Yuchang John Wang

发明人： Arick Brown ,  Junyan Ji ,  Jun Liu ,  Yuchang John Wang

IPC分类号： C07K1/34 ,  C12N7/00 ,  C07K16/00

摘要： The invention provides methods of reducing fouling of ultrafiltration membranes in processes wherein virus particles are removed from aqueous solutions comprising virus particles and at least one protein by adding a surfactant or non-surfactant, non-ionic agent to the aqueous solution prior to filtration. The invention also provides methods to dissociate protein aggregates or to reduce the formation of protein aggregates by adding a surfactant or non-surfactant, non-ionic agent to the protein solution.

公开(公告)号：US10673069B2

公开(公告)日：2020-06-02

申请号：US13532206

申请日：2012-06-25

申请人： Jun Liu ,  Jie Xiao ,  Cheng Huang

发明人： Jun Liu ,  Jie Xiao ,  Cheng Huang

IPC分类号： H01M4/38 ,  H01M4/587 ,  H01M4/485 ,  H01M4/58 ,  H01M10/0525 ,  H01M4/40 ,  H01M4/13

摘要： Energy storage devices having hybrid anodes can address at least the problems of active material consumption and anode passivation that can be characteristic of traditional batteries. The energy storage devices each have a cathode separated from the hybrid anode by a separator. The hybrid anode includes a carbon electrode connected to a metal electrode, thereby resulting in an equipotential between the carbon and metal electrodes.

公开(公告)号：US20160024587A1

公开(公告)日：2016-01-28

申请号：US14774212

申请日：2014-03-10

申请人： Jianwei CHE ,  Jennifer HARRIS ,  Hsin-I HSIEH ,  Jie LI ,  Jun LIU ,  Nicholas NG

发明人： Jianwei Che ,  Jennifer Harris ,  Hsin-I Hsieh ,  Jie Li ,  Jun Liu ,  Nicholas Ng

IPC分类号： C12Q1/68 ,  A61K31/497

摘要： The invention provides methods of monitoring differential gene expression of biomarkers to determine patient sensitivity to Wnt inhibitor, methods of determining the sensitivity of a cell to an Wnt inhibitor by measuring biomarkers, methods of screening for candidate Wnt inhibitor, Wnt inhibitor for use in head and neck squamous cell carcinoma.

摘要翻译： 本发明提供监测生物标志物的差异基因表达以确定患者对Wnt抑制剂的敏感性的方法，通过测量生物标志物来测定细胞对Wnt抑制剂的敏感性的方法，筛选候选Wnt抑制剂的方法，用于头部的Wnt抑制剂和 颈鳞状细胞癌。

公开(公告)号：US09079348B2

公开(公告)日：2015-07-14

申请号：US14234408

申请日：2012-06-14

申请人： Jun Liu

发明人： Jun Liu

IPC分类号： B29C45/33 ,  B29C45/80 ,  B29C45/17 ,  B29C45/66 ,  B29C45/72

CPC分类号： B29C45/80 ,  B29C45/17 ,  B29C45/33 ,  B29C45/332 ,  B29C45/66 ,  B29C45/72 ,  B29C2045/1792

摘要： An electric all-dimensional numerical control injection molding machine is applicable to production of injection products with high precision and complex three-dimensional shapes. The machine comprises a machine base, a main board, four sets of electric mould guiding devices, a cross-shaped chute mould assembly, and an injection device assembly. The electric mould guiding devices are mounted on a front face of the machine. A slider mould is disposed in a chute of a cross-shaped mould base, is connected to a shaft of an electric driver, and implements mould opening and closing functions by means of linear movement of the shaft of the electric driver. An injection system of the machine is used for injecting plasticized, fused, and homogenized plastic materials into a mould cavity of the mould.

摘要翻译： 电动全尺寸数控注塑机适用于高精度，复杂三维形状的注塑产品生产。 该机器包括机座，主板，四组电动模具引导装置，十字形滑道模组件和注射装置组件。 电动模具引导装置安装在机器的前表面上。 滑块模具设置在十字形模座的斜槽中，连接到电动驱动器的轴上，并且通过电动驱动器的轴的线性运动来实现模具打开和关闭功能。 该机器的注射系统用于将塑化，熔化和均质的塑料材料注入模具的模腔中。