CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE
    1.
    发明申请
    CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE 有权
    清除离子源的提取孔

    公开(公告)号:US20110220144A1

    公开(公告)日:2011-09-15

    申请号:US12720960

    申请日:2010-03-10

    IPC分类号: H01J27/08 H01J99/00 B08B7/00

    摘要: An ion source includes an arc chamber housing defining an arc chamber having an extraction aperture, and a wiper. The wiper is positioned within the arc chamber in a parked position and configured to be driven from the parked position to operational positions to clean the extraction aperture. A cleaning sub-assembly for an ion source includes a wiper configured to be positioned within an arc chamber of the ion source when in a parked position and driven from the parked position to operational positions to clean an extraction aperture of the ion source.

    摘要翻译: 离子源包括限定具有提取孔的电弧室的电弧室壳体和擦拭器。 擦拭器位于电弧室内处于停放位置,并且构造成从停放位置驱动到操作位置以清洁提取孔。 用于离子源的清洁子组件包括擦拭器,其构造成当处于停放位置时定位在离子源的电弧室内并且从停放位置驱动到操作位置以清洁离子源的提取孔。

    CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE
    2.
    发明申请
    CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE 有权
    清除离子源的提取孔

    公开(公告)号:US20110220812A1

    公开(公告)日:2011-09-15

    申请号:US12720933

    申请日:2010-03-10

    IPC分类号: H01J27/08 H01J99/00

    摘要: An ion source includes an arc chamber housing defining an arc chamber having an extraction aperture, and a wiper assembly comprising a wiper positioned outside the arc chamber in a parked position and configured to be driven from the parked position to operational positions to clean the extraction aperture. A wiper assembly for an ion source includes a wiper configured to be positioned outside an arc chamber of the ion source when in a parked position and driven from the parked position to operational positions to clean an extraction aperture of the ion source.

    摘要翻译: 离子源包括限定具有提取孔的电弧室的电弧室壳体,以及擦拭器组件,其包括在处于停放位置的位于电弧室外部的擦拭器,并且构造成从停放位置驱动到操作位置以清洁提取孔 。 用于离子源的擦拭器组件包括擦拭器,其构造成当处于停放位置时定位在离子源的电弧室外部并且从停放位置驱动到操作位置以清洁离子源的提取孔。