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    Cleaning of an extraction aperture of an ion source
    1.
    发明授权
    Cleaning of an extraction aperture of an ion source 有权
    清洁离子源的提取孔

    公开(公告)号：US08455839B2

    公开(公告)日：2013-06-04

    申请号：US12720960

    申请日：2010-03-10

    申请人： Craig R. Chaney ,  Alexander S. Perel ,  Neil J. Bassom ,  Leo V. Klos

    发明人： Craig R. Chaney ,  Alexander S. Perel ,  Neil J. Bassom ,  Leo V. Klos

    IPC分类号： H01J37/28 ,  B08B7/00

    CPC分类号： H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/024

    摘要： An ion source includes an arc chamber housing defining an arc chamber having an extraction aperture, and a wiper. The wiper is positioned within the arc chamber in a parked position and configured to be driven from the parked position to operational positions to clean the extraction aperture. A cleaning sub-assembly for an ion source includes a wiper configured to be positioned within an arc chamber of the ion source when in a parked position and driven from the parked position to operational positions to clean an extraction aperture of the ion source.

    摘要翻译： 离子源包括限定具有提取孔的电弧室的电弧室壳体和擦拭器。 擦拭器位于电弧室内处于停放位置，并且构造成从停放位置驱动到操作位置以清洁提取孔。 用于离子源的清洁子组件包括擦拭器，其构造成当处于停放位置时定位在离子源的电弧室内并且从停放位置驱动到操作位置以清洁离子源的提取孔。

    CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE
    2.
    发明申请
    CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE 有权
    清除离子源的提取孔

    公开(公告)号：US20110220144A1

    公开(公告)日：2011-09-15

    申请号：US12720960

    申请日：2010-03-10

    申请人： Craig R. CHANEY ,  Alexander S. Perel ,  Neil J. Bassom ,  Leo V. Klos

    发明人： Craig R. CHANEY ,  Alexander S. Perel ,  Neil J. Bassom ,  Leo V. Klos

    IPC分类号： H01J27/08 ,  H01J99/00 ,  B08B7/00

    CPC分类号： H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/024

    摘要： An ion source includes an arc chamber housing defining an arc chamber having an extraction aperture, and a wiper. The wiper is positioned within the arc chamber in a parked position and configured to be driven from the parked position to operational positions to clean the extraction aperture. A cleaning sub-assembly for an ion source includes a wiper configured to be positioned within an arc chamber of the ion source when in a parked position and driven from the parked position to operational positions to clean an extraction aperture of the ion source.

    摘要翻译： 离子源包括限定具有提取孔的电弧室的电弧室壳体和擦拭器。 擦拭器位于电弧室内处于停放位置，并且构造成从停放位置驱动到操作位置以清洁提取孔。 用于离子源的清洁子组件包括擦拭器，其构造成当处于停放位置时定位在离子源的电弧室内并且从停放位置驱动到操作位置以清洁离子源的提取孔。

    TECHNIQUES FOR GENERATING UNIFORM ION BEAM
    3.
    发明申请
    TECHNIQUES FOR GENERATING UNIFORM ION BEAM 审中-公开
    用于产生均匀离子束的技术

    公开(公告)号：US20110143527A1

    公开(公告)日：2011-06-16

    申请号：US12964357

    申请日：2010-12-09

    申请人： Wilhelm P. PLATOW ,  Neil J. Bassom ,  Peter F. Kurunczi ,  Alexander S. Perel ,  Craig R. Chaney

    发明人： Wilhelm P. PLATOW ,  Neil J. Bassom ,  Peter F. Kurunczi ,  Alexander S. Perel ,  Craig R. Chaney

    IPC分类号： H01L21/265 ,  H01J37/317 ,  H01J37/02

    CPC分类号： H01J37/08 ,  H01J37/3171

    摘要： Herein an improved technique for generating uniform ion beam is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for processing a substrate with an ion implanter comprising an ion source. The method may comprise: introducing dopant into an ion source chamber of the ion source, the dopant may comprise molecules containing boron and hydrogen; introducing diluent into the ion source chamber, the diluent containing halogen; ionizing the dopant and the diluent into molecular ions and halogen containing ions, the molecular ions containing boron and hydrogen; extracting the molecular ions and the halogen containing ions from the ions source chamber; and directing the molecular ions toward the substrate, where the halogen containing ions may improve uniformity of the molecular ions extracted from the ion source and extend the lifetime of the ion source.

    摘要翻译： 本发明公开了一种用于产生均匀离子束的改进技术。 在一个特定的示例性实施例中，该技术可以被实现为用于使用包括离子源的离子注入机来处理衬底的方法。 该方法可以包括：将掺杂剂引入到离子源的离子源室中，掺杂剂可以包含含有硼和氢的分子; 将稀释剂引入离子源室，稀释剂含有卤素; 将掺杂剂和稀释剂电离成分子离子和含卤素的离子，含有硼和氢的分子离子; 从离子源室中提取分子离子和含卤素离子; 并且将分子离子引导到衬底，其中含卤素的离子可以改善从离子源提取的分子离子的均匀性并延长离子源的寿命。

    Flexible ion source
    7.
    发明申请
    Flexible ion source 有权
    柔性离子源

    公开(公告)号：US20090242793A1

    公开(公告)日：2009-10-01

    申请号：US12080028

    申请日：2008-03-31

    申请人： Russell J. Low ,  Jay T. Scheuer ,  Alexander S. Perel ,  Craig R. Chaney ,  Neil J. Bassom

    发明人： Russell J. Low ,  Jay T. Scheuer ,  Alexander S. Perel ,  Craig R. Chaney ,  Neil J. Bassom

    IPC分类号： H01J27/02

    CPC分类号： H01J27/022 ,  H01J37/04 ,  H01J37/08 ,  H01J37/16 ,  H01J2237/082

    摘要： Liner elements to protect the ion source housing and also increase the power efficiency of the ion source are disclosed. Two liner elements, preferably constructed from tungsten, are inserted into the ion source chamber, one placed against each of the two sidewalls. These inserts are electrically biased so as to induce an electrical field that is perpendicular to the applied magnetic field. Such an arrangement has been unexpectedly found to increase the life of not only the ion chamber housing, but also the indirectly heated cathode (IHC) and the repeller. In addition, the use of these biased liner elements also improved the power efficiency of the ion source; allowing more ions to be generated at a given power level, or an equal number of ions to be generated at a lower power level.

    摘要翻译： 公开了用于保护离子源壳体的衬垫元件并且还提高了离子源的功率效率。 将优选由钨构成的两个衬垫元件插入到离子源室中，一个放置在两个侧壁中的每一个上。 这些插入物被电偏置以便引起垂直于所施加的磁场的电场。 已经意外地发现这种布置不仅增加了离子室壳体的寿命，而且延长了间接加热的阴极（IHC）和排斥器的使用寿命。 此外，使用这些偏置的衬垫元件也提高了离子源的功率效率; 允许在给定功率水平下产生更多的离子，或者在较低功率水平下产生相等数量的离子。

    Flexible ion source
    8.
    发明授权
    Flexible ion source 有权
    柔性离子源

    公开(公告)号：US08330127B2

    公开(公告)日：2012-12-11

    申请号：US12080028

    申请日：2008-03-31

    申请人： Russell J. Low ,  Jay T. Scheuer ,  Alexander S. Perel ,  Craig R. Chaney ,  Neil J. Bassom

    发明人： Russell J. Low ,  Jay T. Scheuer ,  Alexander S. Perel ,  Craig R. Chaney ,  Neil J. Bassom

    IPC分类号： G21K5/00

    CPC分类号： H01J27/022 ,  H01J37/04 ,  H01J37/08 ,  H01J37/16 ,  H01J2237/082

    摘要： Liner elements to protect the ion source housing and also increase the power efficiency of the ion source are disclosed. Two liner elements, preferably constructed from tungsten, are inserted into the ion source chamber, one placed against each of the two sidewalls. These inserts are electrically biased so as to induce an electrical field that is perpendicular to the applied magnetic field. Such an arrangement has been unexpectedly found to increase the life of not only the ion chamber housing, but also the indirectly heated cathode (IHC) and the repeller. In addition, the use of these biased liner elements also improved the power efficiency of the ion source; allowing more ions to be generated at a given power level, or an equal number of ions to be generated at a lower power level.

    摘要翻译： 公开了用于保护离子源壳体的衬垫元件并且还提高了离子源的功率效率。 将优选由钨构成的两个衬垫元件插入到离子源室中，一个放置在两个侧壁中的每一个上。 这些插入物被电偏置以便引起垂直于所施加的磁场的电场。 已经意外地发现这种布置不仅增加了离子室壳体的寿命，而且延长了间接加热的阴极（IHC）和排斥器的使用寿命。 此外，使用这些偏置的衬垫元件也提高了离子源的功率效率; 允许在给定功率水平下产生更多的离子，或者在较低功率水平下产生相等数量的离子。

    APPARATUS AND SYSTEM FOR CONTROLLING ION RIBBON BEAM UNIFORMITY IN AN ION IMPLANTER
    10.
    发明申请
    APPARATUS AND SYSTEM FOR CONTROLLING ION RIBBON BEAM UNIFORMITY IN AN ION IMPLANTER 有权
    用于控制离子植入物中的离子束均匀性的装置和系统

    公开(公告)号：US20110155929A1

    公开(公告)日：2011-06-30

    申请号：US12647152

    申请日：2009-12-24

    申请人： Neil J. Bassom ,  Leo V. Klos ,  Joseph C. Olson

    发明人： Neil J. Bassom ,  Leo V. Klos ,  Joseph C. Olson

    IPC分类号： G21K5/04 ,  G21K1/00

    CPC分类号： G21K5/04 ,  G21K1/043 ,  G21K1/046 ,  H01J37/09 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/0455 ,  H01J2237/24542

    摘要： An ion beam blocking array configured to provide a mechanical means for adjusting the beam current profile of an ion ribbon beam by blocking the beam current at one or more locations across the ribbon beam. The ion beam blocking array includes a drive motor, an axle connected to the drive motor and a plurality of profile wheels disposed along the axle where each of the profile wheels is configured to rotate when the axle rotates. Each of the profile wheels is disposed across a width of the ribbon beam and has a position corresponding to a location along the width of the beam.

    摘要翻译： 一种离子束阻挡阵列，被配置成提供用于通过阻挡穿过带束束的一个或多个位置处的束电流来调节离子带束束的束电流分布的机械装置。 离子束阻挡阵列包括驱动电动机，连接到驱动电动机的轴和沿车轴设置的多个轮廓轮，其中每个轮廓轮构造成在轴转动时旋转。 每个轮廓轮横跨带状束的宽度设置，并且具有对应于沿梁的宽度的位置的位置。