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    APPARATUS AND SYSTEM FOR CONTROLLING ION RIBBON BEAM UNIFORMITY IN AN ION IMPLANTER
    1.
    发明申请
    APPARATUS AND SYSTEM FOR CONTROLLING ION RIBBON BEAM UNIFORMITY IN AN ION IMPLANTER 有权
    用于控制离子植入物中的离子束均匀性的装置和系统

    公开(公告)号：US20110155929A1

    公开(公告)日：2011-06-30

    申请号：US12647152

    申请日：2009-12-24

    申请人： Neil J. Bassom ,  Leo V. Klos ,  Joseph C. Olson

    发明人： Neil J. Bassom ,  Leo V. Klos ,  Joseph C. Olson

    IPC分类号： G21K5/04 ,  G21K1/00

    CPC分类号： G21K5/04 ,  G21K1/043 ,  G21K1/046 ,  H01J37/09 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/0455 ,  H01J2237/24542

    摘要： An ion beam blocking array configured to provide a mechanical means for adjusting the beam current profile of an ion ribbon beam by blocking the beam current at one or more locations across the ribbon beam. The ion beam blocking array includes a drive motor, an axle connected to the drive motor and a plurality of profile wheels disposed along the axle where each of the profile wheels is configured to rotate when the axle rotates. Each of the profile wheels is disposed across a width of the ribbon beam and has a position corresponding to a location along the width of the beam.

    摘要翻译： 一种离子束阻挡阵列，被配置成提供用于通过阻挡穿过带束束的一个或多个位置处的束电流来调节离子带束束的束电流分布的机械装置。 离子束阻挡阵列包括驱动电动机，连接到驱动电动机的轴和沿车轴设置的多个轮廓轮，其中每个轮廓轮构造成在轴转动时旋转。 每个轮廓轮横跨带状束的宽度设置，并且具有对应于沿梁的宽度的位置的位置。

    Charged particle beam system having beam-defining slit formed by rotating cyclinders
    2.
    发明授权
    Charged particle beam system having beam-defining slit formed by rotating cyclinders 失效
    具有通过旋转旋转器形成的光束限定狭缝的带电粒子束系统

    公开(公告)号：US5629528A

    公开(公告)日：1997-05-13

    申请号：US585626

    申请日：1996-01-16

    申请人： Jonathan A. Jost ,  Leo V. Klos ,  Michael E. Mack

    发明人： Jonathan A. Jost ,  Leo V. Klos ,  Michael E. Mack

    IPC分类号： H01J37/09 ,  H01J37/317 ,  H01L21/265

    CPC分类号： H01J37/09 ,  H01J2237/0455 ,  H01J2237/31701

    摘要： A slit assembly for use in a charged particle beam system wherein a charged particle beam is directed along a beam path. The slit assembly may be a mass resolving slit assembly for an ion implanter. The slit assembly includes first and second cylinders spaced apart from each other. Opposing surfaces of the first and second cylinders adjacent to the beam path define a slit for passing the charged particle beam. The first and second cylinders have first and second central axes, respectively. The slit assembly further includes a drive system for rotating the first cylinder about the first central axis and for rotating the second cylinder about the second central axis. The slit assembly provides low contamination and a long operating life. The slit assembly may include a system for adjusting the width of the slit. The slit assembly may further include a cooling system for controlling the temperatures of the first and second cylinders.

    摘要翻译： 一种用于带电粒子束系统的狭缝组件，其中带电粒子束沿着光束路径被引导。 狭缝组件可以是离子注入机的质量分辨狭缝组件。 狭缝组件包括彼此间隔开的第一和第二气缸。 与光束路径相邻的第一和第二圆柱体的相对表面限定用于使带电粒子束通过的狭缝。 第一和第二气缸分别具有第一和第二中心轴。 狭缝组件还包括驱动系统，用于围绕第一中心轴线旋转第一圆柱体并且使第二圆柱体围绕第二中心轴线旋转。 狭缝组件提供低污染和长的使用寿命。 狭缝组件可以包括用于调节狭缝宽度的系统。 狭缝组件还可以包括用于控制第一和第二气缸的温度的冷却系统。

    Cleaning of an extraction aperture of an ion source
    3.
    发明授权
    Cleaning of an extraction aperture of an ion source 有权
    清洁离子源的提取孔

    公开(公告)号：US08455839B2

    公开(公告)日：2013-06-04

    申请号：US12720960

    申请日：2010-03-10

    申请人： Craig R. Chaney ,  Alexander S. Perel ,  Neil J. Bassom ,  Leo V. Klos

    发明人： Craig R. Chaney ,  Alexander S. Perel ,  Neil J. Bassom ,  Leo V. Klos

    IPC分类号： H01J37/28 ,  B08B7/00

    CPC分类号： H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/024

    摘要： An ion source includes an arc chamber housing defining an arc chamber having an extraction aperture, and a wiper. The wiper is positioned within the arc chamber in a parked position and configured to be driven from the parked position to operational positions to clean the extraction aperture. A cleaning sub-assembly for an ion source includes a wiper configured to be positioned within an arc chamber of the ion source when in a parked position and driven from the parked position to operational positions to clean an extraction aperture of the ion source.

    摘要翻译： 离子源包括限定具有提取孔的电弧室的电弧室壳体和擦拭器。 擦拭器位于电弧室内处于停放位置，并且构造成从停放位置驱动到操作位置以清洁提取孔。 用于离子源的清洁子组件包括擦拭器，其构造成当处于停放位置时定位在离子源的电弧室内并且从停放位置驱动到操作位置以清洁离子源的提取孔。

    CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE
    4.
    发明申请
    CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE 有权
    清除离子源的提取孔

    公开(公告)号：US20110220812A1

    公开(公告)日：2011-09-15

    申请号：US12720933

    申请日：2010-03-10

    申请人： Craig R. CHANEY ,  Alexander S. PEREL ,  Leo V. KLOS

    发明人： Craig R. CHANEY ,  Alexander S. PEREL ,  Leo V. KLOS

    IPC分类号： H01J27/08 ,  H01J99/00

    CPC分类号： H01J27/08 ,  B08B1/008 ,  H01J27/024 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/024

    摘要： An ion source includes an arc chamber housing defining an arc chamber having an extraction aperture, and a wiper assembly comprising a wiper positioned outside the arc chamber in a parked position and configured to be driven from the parked position to operational positions to clean the extraction aperture. A wiper assembly for an ion source includes a wiper configured to be positioned outside an arc chamber of the ion source when in a parked position and driven from the parked position to operational positions to clean an extraction aperture of the ion source.

    摘要翻译： 离子源包括限定具有提取孔的电弧室的电弧室壳体，以及擦拭器组件，其包括在处于停放位置的位于电弧室外部的擦拭器，并且构造成从停放位置驱动到操作位置以清洁提取孔 。 用于离子源的擦拭器组件包括擦拭器，其构造成当处于停放位置时定位在离子源的电弧室外部并且从停放位置驱动到操作位置以清洁离子源的提取孔。

    CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE
    5.
    发明申请
    CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE 有权
    清除离子源的提取孔

    公开(公告)号：US20110220144A1

    公开(公告)日：2011-09-15

    申请号：US12720960

    申请日：2010-03-10

    申请人： Craig R. CHANEY ,  Alexander S. Perel ,  Neil J. Bassom ,  Leo V. Klos

    发明人： Craig R. CHANEY ,  Alexander S. Perel ,  Neil J. Bassom ,  Leo V. Klos

    IPC分类号： H01J27/08 ,  H01J99/00 ,  B08B7/00

    CPC分类号： H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/024

    摘要： An ion source includes an arc chamber housing defining an arc chamber having an extraction aperture, and a wiper. The wiper is positioned within the arc chamber in a parked position and configured to be driven from the parked position to operational positions to clean the extraction aperture. A cleaning sub-assembly for an ion source includes a wiper configured to be positioned within an arc chamber of the ion source when in a parked position and driven from the parked position to operational positions to clean an extraction aperture of the ion source.

    摘要翻译： 离子源包括限定具有提取孔的电弧室的电弧室壳体和擦拭器。 擦拭器位于电弧室内处于停放位置，并且构造成从停放位置驱动到操作位置以清洁提取孔。 用于离子源的清洁子组件包括擦拭器，其构造成当处于停放位置时定位在离子源的电弧室内并且从停放位置驱动到操作位置以清洁离子源的提取孔。

    Source arc chamber for ion implanter having repeller electrode mounted to external insulator
    6.
    发明授权
    Source arc chamber for ion implanter having repeller electrode mounted to external insulator 有权
    用于离子注入机的源弧室，其具有安装到外部绝缘体的排斥电极

    公开(公告)号：US07102139B2

    公开(公告)日：2006-09-05

    申请号：US11044659

    申请日：2005-01-27

    申请人： Russell J. Low ,  Eric R. Cobb ,  Joseph C. Olson ,  Leo V. Klos

    发明人： Russell J. Low ,  Eric R. Cobb ,  Joseph C. Olson ,  Leo V. Klos

    IPC分类号： H01J7/24

    CPC分类号： H01J27/08

    摘要： An ion implanter has a source arc chamber including a conductive end wall at a repeller end of the arc chamber, the end wall having a central portion surrounding an opening. A ceramic insulator is secured to an outer surface of the end wall, such as by peripheral screw threads engaging mating threads at the periphery of a recessed area of the end wall. A conductive repeller has a narrow shaft secured to the insulator and extending through the end wall opening, and a body disposed within the source arc chamber adjacent to the end wall. The end wall, insulator and repeller are configured to form a continuous vacuum gap between the central portion of the end wall and (i) the repeller body, (ii) the repeller shaft, and (iii) the insulator. The insulator interior surface can have a ridged cross section.

    摘要翻译： 离子注入机具有源电弧室，该电弧室包括在电弧室的排斥端处的导电端壁，端壁具有包围开口的中心部分。 陶瓷绝缘体固定在端壁的外表面上，例如通过外周螺纹与端壁的凹陷区域的周边处的配合螺纹啮合。 导电排斥器具有固定到绝缘体并延伸通过端壁开口的窄轴，以及设置在源弧室内与主体壁相邻的主体。 端壁，绝缘体和推斥器构造成在端壁的中心部分与（i）推斥体之间形成连续的真空间隙，（ii）推斥轴，和（iii）绝缘体。 绝缘体内表面可以具有脊状横截面。

    Technique for improving performance and extending lifetime of indirectly heated cathode ion source
    8.
    发明授权
    Technique for improving performance and extending lifetime of indirectly heated cathode ion source 有权
    提高间接加热阴极离子源的性能和延长使用寿命的技术

    公开(公告)号：US07491947B2

    公开(公告)日：2009-02-17

    申请号：US11505168

    申请日：2006-08-16

    申请人： Eric R. Cobb ,  Russell J. Low ,  Craig R. Chaney ,  Leo V. Klos

    发明人： Eric R. Cobb ,  Russell J. Low ,  Craig R. Chaney ,  Leo V. Klos

    IPC分类号： H01J27/08

    CPC分类号： H01J37/08 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/022

    摘要： A technique improving performance and lifetime of indirectly heated cathode ion sources is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for improving performance and lifetime of an indirectly heated cathode (IHC) ion source in an ion implanter. The method may comprise maintaining an arc chamber of the IHC ion source under vacuum during a maintenance of the ion implanter, wherein no gas is supplied to the arc chamber. The method may also comprise heating a cathode of the IHC ion source by supplying a filament with a current. The method may further comprise biasing the cathode with respect to the filament at a current level of 0.5-5 A without biasing the arc chamber with respect to the cathode. The method additionally comprise keeping a source magnet from producing a magnetic field inside the arc chamber.

    摘要翻译： 公开了一种提高间接加热的阴极离子源的性能和寿命的技术。 在一个特定的示例性实施例中，该技术可以被实现为用于改进离子注入机中间接加热的阴极（IHC）离子源的性能和寿命的方法。 该方法可以包括在维护离子注入机期间将IHC离子源的电弧室保持在真空下，其中没有气体被供应到电弧室。 该方法还可以包括通过向灯丝提供电流来加热IHC离子源的阴极。 该方法还可以包括以0.5-5A的电流水平相对于灯丝偏置阴极而不使电弧室相对于阴极偏置。 该方法还包括保持源磁体在电弧室内产生磁场。