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公开(公告)号：US09539607B2
公开(公告)日：2017-01-10
申请号：US13944237
申请日：2013-07-17
CPC分类号： B05C13/00 , H01L21/67259 , H01L21/681
摘要： A substrate is transported based on coordinates information indicating a receiving position of the substrate and a placement position of the substrate by a hand. If the substrate is shifted from a first position, the substrate is received by the hand while a center of the substrate is shifted from a normal position of the hand. The hand that holds the substrate is moved toward a second position. A plurality of portions at an outer periphery of the substrate are detected before the substrate is placed. A shift of the substrate with respect to the normal position of the hand is detected based on the detection result, and the coordinates information is corrected such that a shift between a position of the center of the substrate to be placed at the second position by the hand and the center of the second position is canceled.
摘要翻译： 基于基于指示基板的接收位置的坐标信息和用手将基板的放置位置传送到基板。 如果基板从第一位置移位，则基板被手接收，同时基板的中心从手的正常位置移位。 保持基板的手移动到第二位置。 在放置基板之前，检测基板外周的多个部分。 基于检测结果检测基板相对于手的正常位置的偏移，并且校正坐标信息，使得要放置在第二位置的基板的中心的位置之间的偏移由 手和第二个位置的中心被取消。
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公开(公告)号：US20140120477A1
公开(公告)日：2014-05-01
申请号：US14149026
申请日：2014-01-07
申请人： Sokudo Co., Ltd.
发明人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
IPC分类号： G03F7/30
CPC分类号： G03F7/30 , H01L21/67028 , H01L21/67034 , H01L21/67051 , H01L21/67178 , H01L21/67225
摘要： A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes forming a photosensitive film on the substrate by said first processing unit before exposure processing by said exposure device and applying washing processing to the substrate by supplying a washing liquid to the substrate in said second processing unit after the formation of said photosensitive film and before the exposure processing. The method also includes applying drying processing to the substrate in said second processing unit after the washing processing by said second processing unit and before the exposure processing and applying development processing to the substrate by said third processing unit after the exposure processing. Applying the drying processing to the substrate includes the step of supplying an inert gas onto the substrate, to which the washing liquid is supplied.
摘要翻译： 一种在与曝光装置相邻并且包括第一，第二和第三处理单元的基板处理装置中处理基板的方法，包括在所述曝光装置的曝光处理之前由所述第一处理单元在所述基板上形成感光膜，以及 在形成所述感光膜之后并且在所述曝光处理之前，通过在所述第二处理单元中向所述基板供应洗涤液体来向所述基板施加洗涤处理。 该方法还包括在所述第二处理单元的洗涤处理之后并且在曝光处理之前对所述第二处理单元中的基板进行干燥处理，并且在曝光处理之后，通过所述第三处理单元对基板进行显影处理。 将干燥处理应用于基板包括向供给洗涤液的基板供给惰性气体的工序。
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