公开(公告)号：US08022362B2

公开(公告)日：2011-09-20

申请号：US12520536

申请日：2007-12-13

申请人： Daiji Okuda ,  Shigeru Kimoto ,  Hiroshi Okuda ,  Motoaki Adachi

发明人： Daiji Okuda ,  Shigeru Kimoto ,  Hiroshi Okuda ,  Motoaki Adachi

IPC分类号： H01J49/14 ,  H01J37/317 ,  H01J37/04

CPC分类号： G01N15/0266

摘要： An ionization device includes an ionization chamber (1) and a charging chamber (20) separately prepared therefrom. The ionization chamber (1) has a discharge electrode (6) and an opposing electrode (10) in an interior (4) of a case having an ionizing gas introducing inlet (14). The opposing electrode (10) has an orifice (8) communicating with outside and formed at a position opposing the tip end of the discharge electrode (6). The charging chamber (20) is arranged adjacent to the orifice (8) side of the ionization chamber (1). An introduction inlet (28) of a charge object introduction portion of the charging chamber (20) is arranged at the position near the exit of the orifice (8). The size of the orifice (8) is set so that the charge object is sucked therein by a negative pressure generated when a gas containing ions is sprayed from the exit of the orifice (8) into the charging chamber (20) and the ionization chamber (1) has a higher pressure than the charging chamber (20).

摘要翻译： 电离装置包括离子化室（1）和从其分别制备的充电室（20）。 电离室（1）在具有电离气体导入口（14）的壳体的内部（4）中具有放电电极（6）和对置电极（10）。 对置电极（10）具有与外部连通并形成在与放电电极（6）的前端相对的位置的孔口（8）。 充电室（20）邻近电离室（1）的孔（8）侧布置。 充气室（20）的充电对象导入部的导入口（28）配置在孔口（8）的出口附近。 孔口8的尺寸被设定为使得当从孔口8的出口喷射含离子的气体进入充气室（20）和电离室（10）时，通过产生的负压将电荷对象吸入其中 （1）具有比充电室（20）更高的压力。

公开(公告)号：US20090314953A1

公开(公告)日：2009-12-24

申请号：US12520536

申请日：2007-12-13

申请人： Daiji Okuda ,  Shigeru Kimoto ,  Hiroshi Okuda ,  Motoaki Adachi

发明人： Daiji Okuda ,  Shigeru Kimoto ,  Hiroshi Okuda ,  Motoaki Adachi

IPC分类号： H01J27/00

CPC分类号： G01N15/0266

摘要： An ionization device includes an ionization chamber (1) and a charging chamber (20) separately prepared therefrom. The ionization chamber (1) has a discharge electrode (6) and an opposing electrode (10) in an interior (4) of a case having an ionizing gas introducing inlet (14). The opposing electrode (10) has an orifice (8) communicating with outside and formed at a position opposing the tip end of the discharge electrode (6). The charging chamber (20) is arranged adjacent to the orifice (8) side of the ionization chamber (1). An introduction inlet (28) of a charge object introduction portion of the charging chamber (20) is arranged at the position near the exit of the orifice (8). The size of the orifice (8) is set so that the charge object is sucked therein by a negative pressure generated when a gas containing ions is sprayed from the exit of the orifice (8) into the charging chamber (20) and the ionization chamber (1) has a higher pressure than the charging chamber (20).

摘要翻译： 电离装置包括离子化室（1）和从其分别制备的充电室（20）。 电离室（1）在具有电离气体导入口（14）的壳体的内部（4）中具有放电电极（6）和相对电极（10）。 对置电极（10）具有与外部连通并形成在与放电电极（6）的前端相对的位置的孔口（8）。 充电室（20）邻近电离室（1）的孔（8）侧布置。 充气室（20）的充电对象导入部的导入口（28）配置在孔口（8）的出口附近。 孔口8的尺寸被设定为使得当从孔口8的出口喷射含离子的气体进入充气室（20）和电离室（10）时，通过产生的负压将电荷对象吸入其中 （1）具有比充电室（20）更高的压力。

公开(公告)号：US06461692B2

公开(公告)日：2002-10-08

申请号：US09117285

申请日：1998-10-26

申请人： Toshiaki Fujii ,  Motoaki Adachi ,  Kikuo Okuyama

发明人： Toshiaki Fujii ,  Motoaki Adachi ,  Kikuo Okuyama

IPC分类号： C23C1648

CPC分类号： C23C16/402 ,  C23C16/409 ,  C23C16/487 ,  C23C16/50 ,  H01J37/3233

摘要： A method an apparatus for chemical vapor deposition for producing a thin film. The method includes the steps of: introducing a reactive gas into a reaction chamber wherein a substrate is supported in the reaction chamber; combining charged particles with a component of the reactive gas for ionizing the component; and electrostatically depositing the ionized component onto the substrate in an electric field. Charged particles may be photoelectrons or positive or negative ions produced by discharge. The reactive gas may be solely an ingredient gas containing a component for a thin film or a mixture of the ingredient gas and an oxidizing or reducing gas. The apparatus includes a reaction chamber including a support for a substrate, a device for introducing a reactive gas into the reaction chamber, an electric discharge device, and a device for forming an electric field in the reaction chamber in a direction to the support for the substrate, and an outlet for discharging the reactive gas.

摘要翻译： 一种用于生产薄膜的化学气相沉积装置的方法。 该方法包括以下步骤：将反应气体引入反应室，其中将基底支撑在反应室中; 将带电粒子与反应气体的组分结合起来，用于离子化该组分; 并在电场中将离子化的组分静电沉积到衬底上。 带电粒子可以是光电子或通过放电产生的正离子或负离子。 反应性气体可以单独是含有薄膜成分或成分气体和氧化还原气体的混合物的成分气体。 该装置包括反应室，该反应室包括用于基板的支撑件，用于将反应气体引入反应室的装置，放电装置，以及用于在反应室中朝着支撑件的方向形成电场的装置 基板和用于排出反应气体的出口。

公开(公告)号：US06674528B2

公开(公告)日：2004-01-06

申请号：US10196629

申请日：2002-07-16

申请人： Motoaki Adachi ,  Kikuo Okuyama ,  Shinichiro Totoki ,  Michio Higuchi ,  Haruo Shimaoka ,  Akihiro Fukai

发明人： Motoaki Adachi ,  Kikuo Okuyama ,  Shinichiro Totoki ,  Michio Higuchi ,  Haruo Shimaoka ,  Akihiro Fukai

IPC分类号： G01D1502

CPC分类号： G01N1/2273 ,  G01N1/2202 ,  G01N15/0211 ,  G01N2001/2223 ,  G01N2015/0096

摘要： Suspended particulate matter in the atmospheric air is sucked into a container by a pump. The suspended particulate matter in the atmospheric air in the container is electrically charged so as to electrically collect it. The collected suspended particulate matter is irradiated with laser beams under the condition that the collected suspended particulate matter is dispersed at an appropriate concentration. A spatial intensity distribution of diffracted and scattered light obtained by irradiating laser beams to the suspended particulate matter is measured. A particle size distribution of the suspended particulate matter P is found from the result of measurement.

摘要翻译： 大气中悬浮的颗粒物质通过泵吸入容器中。 容器中的大气中的悬浮颗粒物质被充电以便电收集。 在收集的悬浮颗粒物以适当浓度分散的条件下，用激光束照射收集的悬浮颗粒物质。 测量通过向悬浮颗粒物质照射激光而获得的衍射和散射光的空间强度分布。 从测定结果可以看到悬浮颗粒物P的粒度分布。