公开(公告)号：US06952256B2

公开(公告)日：2005-10-04

申请号：US10401614

申请日：2003-03-27

Applicant: Ronald L. Roncone ,  Damon Kvamme

Inventor： Ronald L. Roncone ,  Damon Kvamme

IPC: G02B13/00 ,  G01N21/956 ,  G03F1/08 ,  G01N21/88

CPC classification number: G01N21/956 ,  G01N2021/95676

Abstract: An objective lens system having reconfigurable optical components that enable the inspection of inspection surfaces in the absence of a pellicle or through a thin membrane pellicle, and using the same system, also enabling the inspection of inspection surfaces through a thick pellicle. An objective lens system includes a first group and a second group of optical elements. The first group of optical elements enables high numerical aperture and beam contraction. The second group of optical elements is capable of two mode operation enabling, in one mode, inspection through a thin membrane pellicle or in the absence of a pellicle and in another mode, enabling inspection through a thick pellicle. The system can also be enhanced through the use of an interposable aberration corrector plate that is used to correct optical aberrations caused by the presence, absence, or thickness of pellicles.

Abstract translation: 一种具有可重构光学部件的物镜系统，其能够在不存在防护薄膜或薄膜防护薄膜的情况下检查检查表面，并且使用相同的系统，还能够通过厚的防护薄膜检查检查表面。 物镜系统包括第一组和第二组光学元件。 第一组光学元件可实现高数值孔径和光束收缩。 第二组光学元件能够进行两种模式操作，在一种模式中，通过薄膜防护薄膜或不存在防护薄膜组件进行检查，并且在另一种模式下，能够通过厚的防护薄膜进行检查。 还可以通过使用用于校正由薄膜的存在，不存在或厚度引起的光学像差的可插入像差校正板来增强该系统。

公开(公告)号：US07926959B1

公开(公告)日：2011-04-19

申请号：US12060050

申请日：2008-03-31

Applicant: Damon Kvamme ,  David Alles ,  Chun Lee ,  Wu Jiang

Inventor： Damon Kvamme ,  David Alles ,  Chun Lee ,  Wu Jiang

IPC: G02B5/122

CPC classification number: G02B27/48 ,  G02B5/122 ,  G02B27/0905 ,  G02B27/0977

Abstract: Methods and apparatus relating to electromagnetic beam (e.g., laser beam) conditioning are described. In an embodiment, electromagnetic beam conditioning may be performed utilizing reflectors to temporally differentiate electromagnetic beam subsections and sub-beams resulting in reduced spatial coherence of the beam. Other embodiments are also described.

Abstract translation: 描述了与电磁波束（例如激光束）调理有关的方法和设备。 在一个实施例中，可以使用反射器来执行电磁波束调节，以便在时间上区分电磁束子部分和子光束，导致光束的空间相干性降低。 还描述了其它实施例。

公开(公告)号：US07738093B2

公开(公告)日：2010-06-15

申请号：US12115833

申请日：2008-05-06

Applicant: David Alles ,  Mark Wihl ,  Stan Stokowski ,  Yalin Xiong ,  Damon Kvamme

Inventor： David Alles ,  Mark Wihl ,  Stan Stokowski ,  Yalin Xiong ,  Damon Kvamme

IPC: G01N21/00

CPC classification number: G03F1/84

Abstract: Methods for detecting and classifying defects on a reticle are provided. One method includes acquiring images of the reticle at first and second conditions during inspection of the reticle. The first condition is different than the second condition. The method also includes detecting the defects on the reticle using one or more of the images acquired at the first condition. In addition, the method includes classifying an importance of the defects detected on the reticle using one or more of the images acquired at the second condition. The detecting and classifying steps are performed substantially simultaneously during the inspection.

Abstract translation: 提供了在掩模版上检测和分类缺陷的方法。 一种方法包括在检查光罩期间的第一和第二条件下获取光罩的图像。 第一个条件不同于第二个条件。 该方法还包括使用在第一条件下获取的图像中的一个或多个来检测掩模版上的缺陷。 此外，该方法包括使用在第二条件下获取的一个或多个图像来分类在掩模版上检测到的缺陷的重要性。 检测和分类步骤在检查期间基本上同时进行。

公开(公告)号：US20080304056A1

公开(公告)日：2008-12-11

申请号：US12115833

申请日：2008-05-06

Applicant: David Alles ,  Mark Wihl ,  Stan Stokowski ,  Yalin Xiong ,  Damon Kvamme

Inventor： David Alles ,  Mark Wihl ,  Stan Stokowski ,  Yalin Xiong ,  Damon Kvamme

IPC: G01N21/88 ,  G06K9/78

CPC classification number: G03F1/84

Abstract: Methods for detecting and classifying defects on a reticle are provided. One method includes acquiring images of the reticle at first and second conditions during inspection of the reticle. The first condition is different than the second condition. The method also includes detecting the defects on the reticle using one or more of the images acquired at the first condition. In addition, the method includes classifying an importance of the defects detected on the reticle using one or more of the images acquired at the second condition. The detecting and classifying steps are performed substantially simultaneously during the inspection.

Abstract translation: 提供了在掩模版上检测和分类缺陷的方法。 一种方法包括在检查光罩期间的第一和第二条件下获取光罩的图像。 第一个条件不同于第二个条件。 该方法还包括使用在第一条件下获取的图像中的一个或多个来检测掩模版上的缺陷。 此外，该方法包括使用在第二条件下获取的一个或多个图像来分类在掩模版上检测到的缺陷的重要性。 检测和分类步骤在检查期间基本上同时进行。

公开(公告)号：US20050174570A1

公开(公告)日：2005-08-11

申请号：US11075634

申请日：2005-03-08

Applicant: Damon Kvamme ,  Robert Walsh

Inventor： Damon Kvamme ,  Robert Walsh

IPC: G01N21/88 ,  G01N21/95 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676

Abstract: Disclosed is an optical inspection system for inspecting the surface of a substrate. The optical inspection system includes a light source for emitting an incident light beam along an optical axis and a first set of optical elements arranged for separating the incident light beam into a plurality of light beams, directing the plurality of light beams to intersect with the surface of the substrate, and focusing the plurality of light beams to a plurality of scanning spots on the surface of the substrate. The inspection system further includes a light detector arrangement including individual light detectors that correspond to individual ones of a plurality of reflected or transmitted light beams caused by the intersection of the plurality of light beams with the surface of the substrate. The light detectors are arranged for sensing the light intensity of either the reflected or transmitted light.

Abstract translation: 公开了一种用于检查基板表面的光学检查系统。 光学检查系统包括用于沿光轴发射入射光束的光源和布置成将入射光束分离成多个光束的第一组光学元件，引导多个光束与表面相交 并且将多个光束聚焦到基板表面上的多个扫描点。 检查系统还包括光检测器装置，其包括对应于由多个光束与基板的表面相交引起的多个反射或透射光束中的各个的各个光检测器。 光检测器被布置用于感测被反射或透射的光的光强度。

公开(公告)号：US20080018883A1

公开(公告)日：2008-01-24

申请号：US11830790

申请日：2007-07-30

Applicant: Damon Kvamme ,  Robert Walsh

Inventor： Damon Kvamme ,  Robert Walsh

IPC: G01N21/00

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676

Abstract: Disclosed is an optical inspection system for inspecting the surface of a substrate. The optical inspection system includes a light source for emitting an incident light beam along an optical axis and a first set of optical elements arranged for separating the incident light beam into a plurality of light beams, directing the plurality of light beams to intersect with the surface of the substrate, and focusing the plurality of light beams to a plurality of scanning spots on the surface of the substrate. The inspection system further includes a light detector arrangement including individual light detectors that correspond to individual ones of a plurality of reflected or transmitted light beams caused by the intersection of the plurality of light beams with the surface of the substrate. The light detectors are arranged for sensing the light intensity of either the reflected or transmitted light.

Abstract translation: 公开了一种用于检查基板表面的光学检查系统。 光学检查系统包括用于沿光轴发射入射光束的光源和布置成将入射光束分离成多个光束的第一组光学元件，引导多个光束与表面相交 并且将多个光束聚焦到基板表面上的多个扫描点。 检查系统还包括光检测器装置，其包括对应于由多个光束与基板的表面相交引起的多个反射或透射光束中的各个的各个光检测器。 光检测器被布置用于感测被反射或透射的光的光强度。

公开(公告)号：US20060209298A1

公开(公告)日：2006-09-21

申请号：US11439621

申请日：2006-05-23

Applicant: Damon Kvamme ,  Robert Walsh

Inventor： Damon Kvamme ,  Robert Walsh

IPC: G01N21/00

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676

Abstract: Disclosed is an optical inspection system for inspecting the surface of a substrate. The optical inspection system includes a light source for emitting an incident light beam along an optical axis and a first set of optical elements arranged for separating the incident light beam into a plurality of light beams, directing the plurality of light beams to intersect with the surface of the substrate, and focusing the plurality of light beams to a plurality of scanning spots on the surface of the substrate. The inspection system further includes a light detector arrangement including individual light detectors that correspond to individual ones of a plurality of reflected or transmitted light beams caused by the intersection of the plurality of light beams with the surface of the substrate. The light detectors are arranged for sensing the light intensity of either the reflected or transmitted light.

公开(公告)号：US20060152810A1

公开(公告)日：2006-07-13

申请号：US11055893

申请日：2005-02-11

Applicant: Damon Kvamme

Inventor： Damon Kvamme

IPC: G02B5/18

CPC classification number: G03F7/70083 ,  G01N21/9501 ,  G01N21/95623 ,  G02B27/4244 ,  G02B27/425 ,  G02B27/48 ,  G03F7/70158 ,  G03F7/70583

Abstract: Disclosed is an apparatus for illuminating a sample. In one embodiment, this apparatus includes a laser for outputting an incident laser beam towards a sample and a first diffractive element having a plurality of diffraction pattern portions. The first diffractive element is movable so that each of its diffraction pattern portions can be selectively positioned in the incident beam's path and the diffraction pattern portions of the first diffractive element are designed to cause the incident beam to have different spatial illumination profiles at a pupil plane of the incident beam while reducing effects caused by the incident beam's coherence. The apparatus further includes an illumination profile element configured to spatially distribute light at an illumination plane of the incident beam and a plurality of illumination optical elements for directing the incident beam towards the sample. In a specific implementation, each of the first diffractive element's diffractive pattern portions is an annular section that is selectively positionable in the incident beam's path and the first diffractive element is rotatable so as to position different cells of its selected annular section into the incident beam's path to thereby reduce effects caused by the incident beam's coherence.

Abstract translation: 公开了一种用于照亮样品的装置。 在一个实施例中，该装置包括用于向样本输出入射激光束的激光器和具有多个衍射图案部分的第一衍射元件。 第一衍射元件是可移动的，使得其每个衍射图案部分可以选择性地定位在入射光束的路径中，并且第一衍射元件的衍射图案部分被设计成使入射光束在光瞳面处具有不同的空间照度分布 的入射光束，同时减少由入射光束的一致性引起的影响。 该装置还包括配置成在入射光束的照明平面处空间分布光的照明轮廓元件和用于将入射光束引向样品的多个照明光学元件。 在具体实现中，第一衍射元件的衍射图案部分中的每一个是可选择性地定位在入射光束的路径中的环形部分，并且第一衍射元件可旋转，以便将其选定的环形部分的不同单元定位成入射光束的路径 从而减少由入射光束的一致性引起的影响。