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1.发明授权Synthetic silica material with low fluence-dependent-transmission and method of making the same 有权合成二氧化硅材料，具有低通量依赖性传输和制作相同的方法公开(公告)号：US07928026B2
公开(公告)日：2011-04-19
申请号：US11261005
申请日：2005-10-28
申请人： Dana Craig Bookbinder , Kenneth Edward Hrdina , Glenn Eric Kohnke , Lisa Anne Moore , Susan Lee Schiefelbein , Charlene Marie Smith , Ulrich W H Neukirch
发明人： Dana Craig Bookbinder , Kenneth Edward Hrdina , Glenn Eric Kohnke , Lisa Anne Moore , Susan Lee Schiefelbein , Charlene Marie Smith , Ulrich W H Neukirch
CPC分类号： C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/54
摘要： Disclosed in the application are a synthetic silica glass having low fluence-dependent transmission, particularly at about 193 nm, and a process for making the same. The glass may desirably exhibit a low level of fluorescence at 290 and 390 nm when activated at about 248 nm. The glass may desirably exhibit low level of LIWFD, [SiH*] and/or [ODC].
摘要翻译： 在本申请中公开了具有低注射度依赖性透射率，特别是约193nm的合成二氧化硅玻璃及其制造方法。 当在约248nm激活时，该玻璃可期望地在290和390nm处表现出低水平的荧光。 玻璃可能期望显示低水平的LIWFD，[SiH *]和/或[ODC]。
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2.发明授权Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same 有权具有低偏振诱导双折射的合成二氧化硅，其制造方法和包含该双折射的平版印刷装置公开(公告)号：US07589039B2
公开(公告)日：2009-09-15
申请号：US11241075
申请日：2005-09-30
CPC分类号： C03B19/1453 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C2201/23 , C03C2203/54
摘要： Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm−2·pulse−1 and a pulse length of about 25 ns for 5×109 pulses.
摘要翻译： 公开了具有低偏振诱发双折射的合成石英玻璃，用于制造玻璃的方法和包含由玻璃制成的光学元件的光刻系统。 当经受约193nm的准分子激光脉冲时，石英玻璃在633nm处测量的偏振诱发双折射小于约0.1nm / cm，具有约40μJ·cm -2脉冲-1的注量和脉冲长度 对于5x109个脉冲，约25ns。
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3.发明授权Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same 有权具有低偏振诱导双折射的合成二氧化硅，其制造方法和包含该双折射的平版印刷装置公开(公告)号：US07906446B2
公开(公告)日：2011-03-15
申请号：US12556848
申请日：2009-09-10
IPC分类号： C03C3/06
CPC分类号： C03B19/1453 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C2201/23 , C03C2203/54
摘要： Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm−2·pulse−1 and a pulse length of about 25 ns for 5×109 pulses.
摘要翻译： 公开了具有低偏振诱发双折射的合成石英玻璃，用于制造玻璃的方法和包含由玻璃制成的光学元件的光刻系统。 当在大约193nm处的准分子激光脉冲具有约40μJ·cm-2·pulse-1的注量和脉冲长度时，石英玻璃具有在633nm处测量的偏振诱发双折射小于约0.1nm / cm 对于5×109脉冲，约25ns。
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