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公开(公告)号：US5320933A
公开(公告)日：1994-06-14
申请号：US979349
申请日：1992-11-20
CPC分类号： G03F7/085 , Y10S430/155
摘要： A photoimageable composition contains from 0.5 to 5 wt. percent of a compound of the formula: ##STR1## wherein R=alkyl, aryl, aralkyl, alkenyl, alkynyl, and substituted forms thereofX=OR', SR', NR'.sub.2, R'R'=H, R, CO--R,G=nothing or C.sub.1 -C.sub.8 alipathic hydrocarbon, andY=COOH, PO.sub.3 H, SO.sub.3 H, SO.sub.2 H and SOH. X'=R'to promote adhesion of the photoimageable composition to metal.
摘要翻译： 可光成像组合物含有0.5至5wt。 其中R =烷基，芳基，芳烷基，烯基，炔基及其取代形式X = OR'，SR'，NR'2，R'R'= H，R，CO -R，G =无或C 1 -C 8脂族烃，Y = COOH，PO 3 H，SO 3 H，SO 2 H和SOH。 X'= R'以促进可光成像组合物与金属的粘附。
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公开(公告)号：US06887654B2
公开(公告)日：2005-05-03
申请号：US10431002
申请日：2003-05-07
CPC分类号： G03F7/322
摘要： A composition and method to reduce or to prevent residue and scum formation on a substrate or in a solution. The composition contains an aromatic alkoxylate in combination with a polyol or ether or ester of a polyol. The composition also reduces or prevents foam formation such as in developing processes in the manufacturing of printed wiring boards.
摘要翻译： 减少或防止底物或溶液中残留物和浮渣形成的组合物和方法。 该组合物含有多元醇或多元醇的醚或酯的芳族烷氧基化物。 组合物还可以减少或防止泡沫形成，例如印刷线路板的制造中的显影过程。
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公开(公告)号：US08053160B2
公开(公告)日：2011-11-08
申请号：US11180184
申请日：2005-07-13
IPC分类号： G03C1/00
摘要： An imaging composition, article and method of imaging are disclosed. The imaging composition is energy sensitive such that upon application of a sufficient amount of energy to the composition a color or shade change is affected. The imaging composition is coated on an article to form an energy sensitive article, which may be used in marking work pieces.
摘要翻译： 公开了成像组合物，制品和成像方法。 成像组合物是能量敏感的，使得当对组合物施加足够量的能量时，颜色或阴影变化受到影响。 将成像组合物涂覆在制品上以形成可用于标记工件的能量敏感物品。
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公开(公告)号：US08048606B2
公开(公告)日：2011-11-01
申请号：US11378933
申请日：2006-03-17
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/146 , Y10S430/155
摘要： An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
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公开(公告)号：US07977026B2
公开(公告)日：2011-07-12
申请号：US10773989
申请日：2004-02-06
IPC分类号： G03C1/00
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/146 , Y10S430/155
摘要： An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
摘要翻译： 公开了一种成像方法。 将成像组合物涂覆在工件上，然后从3-D成像系统施加足够量的能量以在涂覆的工件上形成图像。 图像可以是用于对准部件的标志或标记。
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公开(公告)号：US07615335B2
公开(公告)日：2009-11-10
申请号：US11378919
申请日：2006-03-17
IPC分类号： G03C1/00
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/146 , Y10S430/155
摘要： An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
摘要翻译： 公开了一种成像方法。 将成像组合物涂覆在工件上，然后从3-D成像系统施加足够量的能量以在涂覆的工件上形成图像。 图像可以是用于对准部件的标志或标记。
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公开(公告)号：US07749685B2
公开(公告)日：2010-07-06
申请号：US11378918
申请日：2006-03-17
IPC分类号： G03C1/00
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/146 , Y10S430/155
摘要： An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
摘要翻译： 公开了一种成像方法。 将成像组合物涂覆在工件上，然后从3-D成像系统施加足够量的能量以在涂覆的工件上形成图像。 图像可以是用于对准部件的标志或标记。
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公开(公告)号：US07270932B2
公开(公告)日：2007-09-18
申请号：US10773990
申请日：2004-02-06
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/127 , Y10S430/163
摘要： Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be used in methods of marking.
摘要翻译： 公开了使用组合物的成像组合物和方法。 成像组合物对低水平的能量敏感，使得当施加低水平的能量时，组合物改变颜色或阴影。 组合物可用于标记方法。
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公开(公告)号：US07364834B2
公开(公告)日：2008-04-29
申请号：US11180951
申请日：2005-07-13
申请人： Robert K. Barr , Edgardo Anzures , Daniel E. Lundy
发明人： Robert K. Barr , Edgardo Anzures , Daniel E. Lundy
CPC分类号： G03F7/038 , G03F7/027 , G03F7/031 , G03F7/0388 , Y10S430/117 , Y10S430/121 , Y10S430/124 , Y10S522/904 , Y10S522/905
摘要： A polymer having α,β unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.
摘要翻译： 具有α，β不饱和基团的聚合物和当暴露于光化辐射时产生自由基的基团。 聚合物可以是自交联的。
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公开(公告)号：US07323290B2
公开(公告)日：2008-01-29
申请号：US10391051
申请日：2003-03-18
申请人： Robert K. Barr , Edgardo Anzures , Daniel E. Lundy
发明人： Robert K. Barr , Edgardo Anzures , Daniel E. Lundy
CPC分类号： C07D233/64 , C08F2/50 , C08G18/10 , C08G18/6725 , C08G18/68 , C08L25/14 , C08L63/00 , C08L75/16 , G03F7/031 , G03F7/033 , G03F7/038 , G03F7/0388 , Y10S430/117 , Y10S522/904 , Y10S522/905 , C08L2666/02
摘要： A dry film photoresist includes a functional polymer. The functional polymer has α,β-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.
摘要翻译： 干膜光致抗蚀剂包括功能聚合物。 功能性聚合物具有α，β-不饱和基团和暴露于光化辐射时产生自由基的基团。
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