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公开(公告)号：US07399572B2
公开(公告)日：2008-07-15
申请号：US11445902
申请日：2006-06-02
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/023 , G03F7/0233 , G03F7/0382 , G03F7/0392 , G03F7/0751 , Y10T428/12528
摘要： A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2VI wherein Y is selected from the group consisting of S, O, NR2, (HOCH)p, and each R1 is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is independently H, SH, CH3, C2H5, and a linear or branched C1-C4 alkyl group containing a thiol group; and wherein V1 and V2 are independently selected from wherein, m is independently an integer from 0 to 4 with the proviso that m can=0 only when Y═ n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R1 is defined as above; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.
摘要翻译： 一种预处理组合物，其特征在于：（a）至少一种具有结构VI的化合物<？in-line-formula description =“In-line Formulas”end =“lead”→> V > 2 在线公式描述=“在线公式”end =“tail”？>其中Y选自S，O，NR 2 >，（HOCH）p ，每个R 1独立地选自H，烷基，烯基，炔基，烷氧基或卤素， 每个R 2独立地为H，SH，CH 3，C 2 H 5，以及直链或支链 含有硫醇基的C 1 -C 4烷基; 并且其中V 1和V 2独立地选自其中，m独立地为0至4的整数，条件是仅当Y-n为 1到5的整数; p为1〜4的整数，每个R 1如上定义; （b）至少一种有机溶剂，和任选地（c）至少一种粘合促进剂; 其中组合物中存在的结构VI化合物的量在将感光组合物涂布在基材上时有效地抑制残留物的形成，并且将涂覆的基材加工成在其上形成图像。
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公开(公告)号：US07220520B2
公开(公告)日：2007-05-22
申请号：US11445764
申请日：2006-06-02
CPC分类号： G03F7/023 , G03F7/022 , G03F7/0226 , G03F7/0233 , G03F7/0751 , G03F7/085
摘要： A photosensitive resin composition comprising: (d) at least one polybenzoxazole precursor polymer (e) at least one compound having structure VI V1—Y—V2 VI wherein Y is selected from S, O, NR2, (HOCH)p, and each R1 is selected H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is selected from H, SH, CH3, C2H5, and a linear or branched C1–C4 alkyl group containing a thiol group; p is an integer of from 1 to 4, and wherein V1 and V2 are independently selected from the group consisting of wherein, m is independently an integer from 0 to 4 with the proviso that m=0 only when Y= n is an integer from 1 to 5; and each R1 is defined as above; and (f) at least one solvent; wherein the amount of the compound of Structure VI present is an amount effective to inhibit residue from forming when the composition is coated on a substrate and the substrate is subsequently processed to form an image, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety on the polymer, then (d) at least one photoactive compound is also present in the composition.
摘要翻译： 一种感光性树脂组合物，其包含：（d）至少一种聚苯并恶唑前体聚合物（e）至少一种具有结构VI <β的在线式描述=“在线公式”的化合物结束=“铅”→V > 1 -YV VI <？in-line-formula description =“In-line Formulas”end =“tail”？>其中Y选自S，O，NR < （HOCH）p，并且每个R 1选自H，烷基，烯基，炔基，烷氧基 或卤素，每个R 2选自H，SH，CH 3，C 2 H 5， 和含有硫醇基的直链或支链C 1 -C 4烷基; p是1至4的整数，并且其中V 1和V 2独立地选自其中，m独立地为0至4的整数 条件是仅当Y = n为1至5的整数时m = 0; 并且每个R 1如上定义; 和（f）至少一种溶剂; 其中存在结构VI的化合物的量是当将组合物涂覆在基材上并且基底随后被加工以形成图像时有效抑制残留物形成的量，条件是如果聚苯并恶唑前体聚合物仅包含 的聚苯并恶唑前体聚合物，其在聚合物上不含有光活性部分，则（d）组合物中也存在至少一种光活性化合物。
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公开(公告)号：US20080305431A1
公开(公告)日：2008-12-11
申请号：US12136437
申请日：2008-06-10
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/023 , G03F7/0233 , G03F7/0382 , G03F7/0392 , G03F7/0751 , Y10T428/12528
摘要： A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2 VI in which each of Y, V1, and V2 is defined in the specification; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; in which the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.
摘要翻译： 一种预处理组合物，其特征在于：（a）至少一种具有结构VI的化合物<？in-line-formula description =“In-line formula”end =“lead”？> V1-Y-V2 VI < 描述=“在线公式”end =“tail”？>其中Y，V1和V2中的每一个在说明书中定义; （b）至少一种有机溶剂，和任选地（c）至少一种粘合促进剂; 其中组合物中存在的结构VI化合物的量在将光敏组合物涂覆在基材上并且涂覆的基材被加工以在其上形成图像时有效抑制残留物形成。
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公开(公告)号：US07407731B2
公开(公告)日：2008-08-05
申请号：US11386471
申请日：2006-03-22
CPC分类号： G03F7/023 , G03F7/0046 , G03F7/022 , G03F7/0233 , G03F7/038 , G03F7/0382 , G03F7/039 , G03F7/0751 , G03F7/085
摘要： A photosensitive resin composition comprising: (a) at least one polybenzoxazole precursor polymer; (b) at least one compound having Structure VI wherein, V is CH or N, Y is O or NR3 wherein R3 is H, CH3 or C2H5, R1 and R2 each independently are H, C1-C4 alkyl group, C1-C4 alkoxy group, cyclopentyl or cyclohexyl, or alternatively, R1 and R2 can be fused to produce a substituted or unsubstituted benzene ring; and (c) at least one solvent; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the composition is coated on a substrate and the coated substrate is subsequently processed to form an image on the substrate, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety in the polymer, then (d) at least one photoactive compound is also present in the composition. The present invention also concerns a process for forming a relief pattern and electronic parts using the composition.
摘要翻译： 一种光敏树脂组合物，其包含：（a）至少一种聚苯并恶唑前体聚合物; （b）至少一种具有结构VI的化合物，其中V是CH或N，Y是O或NR 3，其中R 3是H，CH 3， 或/或C 2 H 5，R 1和R 2各自独立地为H，C 1和R 2'稠合以产生取代或未取代的苯环; 和（c）至少一种溶剂; 其中组合物中存在的结构VI化合物的量有效地抑制当组合物涂覆在基材上时残留物形成，并且随后处理涂覆的基材以在基材上形成图像，条件是如果 聚苯并恶唑前体聚合物仅由在聚合物中不含光活性部分的聚苯并恶唑前体聚合物组成，则（d）组合物中也存在至少一种光活性化合物。 本发明还涉及使用该组合物形成浮雕图案和电子部件的方法。
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