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公开(公告)号：US20070099111A1
公开(公告)日：2007-05-03
申请号：US11500251
申请日：2006-08-07
申请人： Ahmad Naiini , David Powell , Donald Racicot , Il'ya Rushkin , William Weber
发明人： Ahmad Naiini , David Powell , Donald Racicot , Il'ya Rushkin , William Weber
IPC分类号： G03C1/00
CPC分类号： G03F7/0233 , G03F7/023 , G03F7/0392 , G03F7/0751
摘要： A heat resistant positive-working photosensitive PBO precursor composition comprising: (a) at least one polybenzoxazole precursor polymer; (a) at least one plasticizer compound; (b) at least one solvent; wherein the amount of the plasticizer present in the composition is an amount effective to reduce the sidewall angle of imaged and cured features in the coated film on the substrate to prevent stress failures in subsequent metallization of the substrate due to steep angles of the imaged features, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety on the polymer, then (c) at least one photoactive compound is also present in the composition.
摘要翻译： 一种耐热正性感光性PBO前体组合物，其包含：（a）至少一种聚苯并恶唑前体聚合物; （b）至少一种增塑剂化合物; （c）至少一种溶剂; 其中存在于组合物中的增塑剂的量是有效减少基材上涂覆膜中的成像和固化特征的侧壁角度的量，以防止由于成像特征的陡峭角度导致的随后的基板金属化中的应力失效， 并且条件是如果聚苯并恶唑前体聚合物仅由聚合物上不含光活性部分的聚苯并恶唑前体聚合物组成，则（d）组合物中也存在至少一种光活性化合物。
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公开(公告)号：US20050181297A1
公开(公告)日：2005-08-18
申请号：US10966349
申请日：2005-02-18
申请人： Ahmad Naiini , Richard Hopla , David Powell , Jon Metivier , Il'ya Rushkin
发明人： Ahmad Naiini , Richard Hopla , David Powell , Jon Metivier , Il'ya Rushkin
IPC分类号： G03C5/18 , G03F20060101 , G03F7/022 , G03F7/023
CPC分类号： G03F7/023 , G03F7/022 , Y10T428/24802
摘要： A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate.
摘要翻译： 一种正性光敏组合物，其包含一种或多种聚苯并恶唑前体聚合物，重氮萘醌光敏化合物，其是含有2至约9个芳族羟基的化合物与5-萘醌二叠氮化物磺酰化合物与4-萘醌二叠氮基磺酰基 化合物和至少一种溶剂，以及使用这种组合物在基材上形成浮雕图案，从而形成涂布的基材。
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公开(公告)号：US07416830B2
公开(公告)日：2008-08-26
申请号：US10966349
申请日：2005-02-18
申请人： Ahmad A. Naiini , Richard Hopla , David B. Powell , Jon Metivier , Il'ya Rushkin
发明人： Ahmad A. Naiini , Richard Hopla , David B. Powell , Jon Metivier , Il'ya Rushkin
CPC分类号： G03F7/023 , G03F7/022 , Y10T428/24802
摘要： A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate.
摘要翻译： 一种正性光敏组合物，其包含一种或多种聚苯并恶唑前体聚合物，重氮萘醌光敏化合物，其是含有2至约9个芳族羟基的化合物与5-萘醌二叠氮化物磺酰化合物与4-萘醌二叠氮基磺酰基 化合物和至少一种溶剂，以及使用这种组合物在基材上形成浮雕图案，从而形成涂布的基材。
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公开(公告)号：US07220520B2
公开(公告)日：2007-05-22
申请号：US11445764
申请日：2006-06-02
CPC分类号： G03F7/023 , G03F7/022 , G03F7/0226 , G03F7/0233 , G03F7/0751 , G03F7/085
摘要： A photosensitive resin composition comprising: (d) at least one polybenzoxazole precursor polymer (e) at least one compound having structure VI V1—Y—V2 VI wherein Y is selected from S, O, NR2, (HOCH)p, and each R1 is selected H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is selected from H, SH, CH3, C2H5, and a linear or branched C1–C4 alkyl group containing a thiol group; p is an integer of from 1 to 4, and wherein V1 and V2 are independently selected from the group consisting of wherein, m is independently an integer from 0 to 4 with the proviso that m=0 only when Y= n is an integer from 1 to 5; and each R1 is defined as above; and (f) at least one solvent; wherein the amount of the compound of Structure VI present is an amount effective to inhibit residue from forming when the composition is coated on a substrate and the substrate is subsequently processed to form an image, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety on the polymer, then (d) at least one photoactive compound is also present in the composition.
摘要翻译： 一种感光性树脂组合物，其包含：（d）至少一种聚苯并恶唑前体聚合物（e）至少一种具有结构VI <β的在线式描述=“在线公式”的化合物结束=“铅”→V > 1 -YV VI <？in-line-formula description =“In-line Formulas”end =“tail”？>其中Y选自S，O，NR < （HOCH）p，并且每个R 1选自H，烷基，烯基，炔基，烷氧基 或卤素，每个R 2选自H，SH，CH 3，C 2 H 5， 和含有硫醇基的直链或支链C 1 -C 4烷基; p是1至4的整数，并且其中V 1和V 2独立地选自其中，m独立地为0至4的整数 条件是仅当Y = n为1至5的整数时m = 0; 并且每个R 1如上定义; 和（f）至少一种溶剂; 其中存在结构VI的化合物的量是当将组合物涂覆在基材上并且基底随后被加工以形成图像时有效抑制残留物形成的量，条件是如果聚苯并恶唑前体聚合物仅包含 的聚苯并恶唑前体聚合物，其在聚合物上不含有光活性部分，则（d）组合物中也存在至少一种光活性化合物。
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公开(公告)号：US07399572B2
公开(公告)日：2008-07-15
申请号：US11445902
申请日：2006-06-02
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/023 , G03F7/0233 , G03F7/0382 , G03F7/0392 , G03F7/0751 , Y10T428/12528
摘要： A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2VI wherein Y is selected from the group consisting of S, O, NR2, (HOCH)p, and each R1 is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is independently H, SH, CH3, C2H5, and a linear or branched C1-C4 alkyl group containing a thiol group; and wherein V1 and V2 are independently selected from wherein, m is independently an integer from 0 to 4 with the proviso that m can=0 only when Y═ n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R1 is defined as above; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.
摘要翻译： 一种预处理组合物，其特征在于：（a）至少一种具有结构VI的化合物<？in-line-formula description =“In-line Formulas”end =“lead”→> V > 2 在线公式描述=“在线公式”end =“tail”？>其中Y选自S，O，NR 2 >，（HOCH）p ，每个R 1独立地选自H，烷基，烯基，炔基，烷氧基或卤素， 每个R 2独立地为H，SH，CH 3，C 2 H 5，以及直链或支链 含有硫醇基的C 1 -C 4烷基; 并且其中V 1和V 2独立地选自其中，m独立地为0至4的整数，条件是仅当Y-n为 1到5的整数; p为1〜4的整数，每个R 1如上定义; （b）至少一种有机溶剂，和任选地（c）至少一种粘合促进剂; 其中组合物中存在的结构VI化合物的量在将感光组合物涂布在基材上时有效地抑制残留物的形成，并且将涂覆的基材加工成在其上形成图像。
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公开(公告)号：US20060275699A1
公开(公告)日：2006-12-07
申请号：US11445764
申请日：2006-06-02
申请人： Ahmad Naiini , David Powell , N. Metivier , Il'ya Rushkin , Richard Hopla
发明人： Ahmad Naiini , David Powell , N. Metivier , Il'ya Rushkin , Richard Hopla
IPC分类号： G03C1/00
CPC分类号： G03F7/023 , G03F7/022 , G03F7/0226 , G03F7/0233 , G03F7/0751 , G03F7/085
摘要： A photosensitive resin composition comprising: (d) at least one polybenzoxazole precursor polymer (e) at least one compound having structure VI V1—Y—V2 VI wherein Y is selected from S, O, NR2, (HOCH)p, and each R1 is selected H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is selected from H, SH, CH3, C2H5, and a linear or branched C1-C4 alkyl group containing a thiol group; p is an integer of from 1 to 4, and wherein V1 and V2 are independently selected from the group consisting of wherein, m is independently an integer from 0 to 4 with the proviso that m=0 only when Y= n is an integer from 1 to 5; and each R1 is defined as above; and (f) at least one solvent; wherein the amount of the compound of Structure VI present is an amount effective to inhibit residue from forming when the composition is coated on a substrate and the substrate is subsequently processed to form an image, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety on the polymer, then (d) at least one photoactive compound is also present in the composition.
摘要翻译： 一种感光性树脂组合物，其包含：（d）至少一种聚苯并恶唑前体聚合物（e）至少一种具有结构VI <β的在线式描述=“在线公式”的化合物结束=“铅”→V > 1 -YV VI <？in-line-formula description =“In-line Formulas”end =“tail”？>其中Y选自S，O，NR < （HOCH）p，并且每个R 1选自H，烷基，烯基，炔基，烷氧基 或卤素，每个R 2选自H，SH，CH 3，C 2 H 5， 和含有硫醇基的直链或支链C 1 -C 4烷基; p是1至4的整数，并且其中V 1和V 2独立地选自其中，m独立地为0至4的整数 条件是仅当Y = n为1至5的整数时m = 0; 并且每个R 1如上定义; 和（f）至少一种溶剂; 其中存在结构VI的化合物的量是当将组合物涂覆在基材上并且基底随后被加工以形成图像时有效抑制残留物形成的量，条件是如果聚苯并恶唑前体聚合物仅包含 的聚苯并恶唑前体聚合物，其在聚合物上不含有光活性部分，则（d）组合物中也存在至少一种光活性化合物。
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公开(公告)号：US20080199805A1
公开(公告)日：2008-08-21
申请号：US12028512
申请日：2008-02-08
申请人： IL'YA RUSHKIN , OGNIAN N. DIMOV , SANJAY MALIK , BINOD B. DE
发明人： IL'YA RUSHKIN , OGNIAN N. DIMOV , SANJAY MALIK , BINOD B. DE
CPC分类号： G03F7/0757 , G03F7/0045
摘要： A photosensitve composition exhibiting high resolution and enhanced, tunable O2 plasma etch resistance comprising a silicon-containing base polymer, a silicon-containing additive, a photoacid generator and solvent is provided. A method of forming a patterned resist film is also provided.
摘要翻译： 提供了包含含硅基聚合物，含硅添加剂，光酸产生剂和溶剂的高分辨率和增强的可调谐O 2等离子体蚀刻电阻的光敏组合物。 还提供了形成图案化抗蚀剂膜的方法。
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公开(公告)号：US20060286484A1
公开(公告)日：2006-12-21
申请号：US11445902
申请日：2006-06-02
申请人： David Powell , Ahmad Naiini , N. Metivier , Il'ya Rushkin , Richard Hopla
发明人： David Powell , Ahmad Naiini , N. Metivier , Il'ya Rushkin , Richard Hopla
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/023 , G03F7/0233 , G03F7/0382 , G03F7/0392 , G03F7/0751 , Y10T428/12528
摘要： A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2 VI wherein Y is selected from the group consisting of S, O, NR2, (HOCH)p, and each R1 is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is independently H, SH, CH3, C2H5, and a linear or branched C1-C4 alkyl group containing a thiol group; and wherein V1 and V2 are independently selected from wherein, m is independently an integer from 0 to 4 with the proviso that m can =0 only when Y═ n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R1 is defined as above; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.
摘要翻译： 一种预处理组合物，其特征在于：（a）至少一种具有结构VI的化合物<？in-line-formula description =“In-line Formulas”end =“lead”→> V > 2 在线公式描述=“在线公式”end =“tail”？>其中Y选自S，O，NR 2 >，（HOCH）p ，每个R 1独立地选自H，烷基，烯基，炔基，烷氧基或卤素， 每个R 2独立地为H，SH，CH 3，C 2 H 5，以及直链或支链 含有硫醇基的C 1 -C 4烷基; 并且其中V 1和V 2独立地选自其中，m独立地为0至4的整数，条件是仅当Y-n为 1到5的整数; p为1〜4的整数，每个R 1如上定义; （b）至少一种有机溶剂，和任选地（c）至少一种粘合促进剂; 其中组合物中存在的结构VI化合物的量在将感光组合物涂布在基材上时有效地抑制残留物的形成，并且将涂覆的基材加工成在其上形成图像。
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公开(公告)号：US20060063095A9
公开(公告)日：2006-03-23
申请号：US10966349
申请日：2005-02-18
申请人： Ahmad Naiini , Richard Hopla , David Powell , Jon Metivier , Il'ya Rushkin
发明人： Ahmad Naiini , Richard Hopla , David Powell , Jon Metivier , Il'ya Rushkin
IPC分类号： G03C5/18
CPC分类号： G03F7/023 , G03F7/022 , Y10T428/24802
摘要： A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate.
摘要翻译： 一种正性光敏组合物，其包含一种或多种聚苯并恶唑前体聚合物，重氮萘醌光敏化合物，其是含有2至约9个芳族羟基的化合物与5-萘醌二叠氮化物磺酰化合物与4-萘醌二叠氮基磺酰基 化合物和至少一种溶剂，以及使用这种组合物在基材上形成浮雕图案，从而形成涂布的基材。
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公开(公告)号：US09519216B2
公开(公告)日：2016-12-13
申请号：US12363492
申请日：2009-01-30
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/40 , Y10T428/265
摘要： The present disclosure relates to compositions that include at least one polybenzoxazole precursor polymer, at least one photoacid generator, and at least one basic compound. Articles, films, and methods related to these compositions are also disclosed.
摘要翻译： 本公开涉及包含至少一种聚苯并恶唑前体聚合物，至少一种光致酸产生剂和至少一种碱性化合物的组合物。 还公开了与这些组合物相关的制品，膜和方法。
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