公开(公告)号：US07758964B2

公开(公告)日：2010-07-20

申请号：US11352125

申请日：2006-02-10

Applicant: David D. Lu ,  Eumi Pyun

Inventor： David D. Lu ,  Eumi Pyun

IPC: B32B27/40 ,  C08K5/53

CPC classification number: C09D5/18 ,  C08K5/5313 ,  C09D175/04 ,  C09K21/14 ,  H05K3/285 ,  H05K2201/012 ,  Y10T428/31551 ,  C08L75/04

Abstract: A flame-resistant electrical circuit covercoat composition includes a phosphinate and a urethane solder mask. The composition can be used as a covercoat for flexible circuits.

Abstract translation: 阻燃电路覆盖层组合物包括次膦酸盐和聚氨酯焊接掩模。 该组合物可用作柔性电路的覆盖层。

公开(公告)号：US07189479B2

公开(公告)日：2007-03-13

申请号：US10645020

申请日：2003-08-21

Applicant: David D. Lu ,  Mark J. Pellerite ,  Richard M. Flynn

Inventor： David D. Lu ,  Mark J. Pellerite ,  Richard M. Flynn

IPC: G03F9/00

CPC classification number: B82Y30/00 ,  G03F1/48 ,  G03F7/2014

Abstract: A phototool having a fluorinated phosph(on)ate coating and methods of using the phototool.

Abstract translation: 具有氟化磷酸酯（on）涂层的光学工具和使用光固醇的方法。

公开(公告)号：US06177357B1

公开(公告)日：2001-01-23

申请号：US09303168

申请日：1999-04-30

Applicant: David D. Lu

Inventor： David D. Lu

IPC: H01L2700

CPC classification number: H01L21/31133 ,  H05K3/002 ,  H05K2201/0145 ,  H05K2201/0154 ,  H05K2201/0166 ,  H05K2203/0793

Abstract: A process for making flexible circuits wherein the etching of a polymeric film is accomplished by dissolving portions thereof with concentrated aqueous base using a UV-curable 100% active liquid photoresist as a mask, comprising the steps of laminating the resist on a polymeric film, exposing a pattern into the resist, developing the resist with a dilute aqueous solution until desired image is obtained, etching portions of the polymeric film not covered by the crosslinked resist with a concentrated base at a temperature of from about 50° C. to about 120° C., and then stripping the resist off the polymeric film.

Abstract translation: 一种用于制造柔性电路的方法，其中通过使用可UV固化的100％活性液体光致抗蚀剂作为掩模将其部分用浓缩的水性碱溶解，从而实现聚合物膜的蚀刻，其包括以下步骤：将抗蚀剂层压在聚合物膜上， 将抗蚀剂图案印刷到抗蚀剂中，用稀的水溶液显影抗蚀剂，直到获得所需的图像，在浓度为约50℃至约120℃的温度下，用聚集的碱蚀刻未被交联抗蚀剂覆盖的聚合物膜的部分 然后从聚合物膜剥离抗蚀剂。

公开(公告)号：US5109097A

公开(公告)日：1992-04-28

申请号：US578476

申请日：1990-09-07

Applicant: Thomas P. Klun ,  David D. Lu ,  Aida F. Robbins

Inventor： Thomas P. Klun ,  David D. Lu ,  Aida F. Robbins

IPC: C08G18/67

CPC classification number: C08G18/675 ,  C08G18/6705 ,  Y10T428/31591

Abstract: Normally solid organic solvent-soluble thermoplastic, polyethylenically-unsaturated polyurethane polymers having pendent cardo (cyclic) groups are disclosed. These polymers can be coated to provide coatings that can be worked (sanded) and that under the influence of activating energy, polymerize to coatings which can have excellent solvent and abrasion resistance.

Abstract translation: 通常公开了固体有机溶剂可溶性热塑性聚合物，具有侧链（环状）基团的多烯属不饱和聚氨酯聚合物。 这些聚合物可以被涂覆以提供可以加工（打磨）的涂层，并且在活化能的影响下，聚合成可以具有优异的溶剂和耐磨性的涂层。

公开(公告)号：US4855184A

公开(公告)日：1989-08-08

申请号：US151693

申请日：1988-02-02

Applicant: Thomas P. Klun ,  David D. Lu ,  Aida F. Robbins

Inventor： Thomas P. Klun ,  David D. Lu ,  Aida F. Robbins

IPC: C09D175/14 ,  C08G18/64 ,  C08G18/67 ,  C09D175/00

CPC classification number: C08G18/6484 ,  C08G18/6705 ,  C08G18/675 ,  Y10T428/31591 ,  Y10T428/31978

Abstract: Normally solid, organic solvent-soluble, thermoplastic, polyethylenically-unsaturated, cellulosic polyurethane polymers are provided. These cellulosic polyurethane polymers comprise one or more cellulose ether or ester segments, one or more alkylene moieties having at least two carbon atoms and which can be substituted or interrupted by ether oxygen atoms, ester groups, or phenylene groups, two or more residues of diisocyanates, the segments, moieties, and residues being linked together by linking groups with the proviso that said alkylene moieties contain sufficient ethylenic unsaturation that said polymer can be crosslinked to a solvent-insoluble state. The cellulosic polyurethane polymers can be obtained by the polymerization of a reaction mixture comprising (a) aliphatic or cycloaliphatic diol comprising sufficient ethylenically-unsaturated diol to permit crosslinking of the polymerization product to a solvent-insoluble state; (b) organic solvent-soluble cellulose ether or ester having residual unreacted cellulosic hydroxyl groups; and (c) organic diisocyanate. The reaction product may optionally also contain primary or secondary aliphatic or aromatic diamines or dithiols. Also provided are coating compositions and shaped articles and methods for preparing same.