摘要:
The invention relates to a cosmetic composition, in particular for photoprotecting the skin and/or the hair, in the form of a dispersion comprising two immiscible phases stabilized with at least one anionic surfactant chosen from the salts of fatty acids and of monovalent or polyvalent metals, of ammonium or of organic bases, a compound for screening out ultraviolet radiation, which can be adsorbed at the interface of the said immiscible phases, derived from benzylidenecamphor and comprising at least one partially or totally neutralized sulphonic acid function, a metal oxide nanopigment coated with hydrophobic hydrocarbon-based coating agents and a cationic or zwitterionic amphiphilic compound which leads, with the anionic surfactant, to the formation of a compound capable of lowering the water/liquid paraffin interface tension at 40° C. by more than 14 mN.m−1 for an anionic surfactant concentration of 0.1 mmol/100 g, by more than 26 mN.m−1 for an anionic surfactant concentration of 0.5 mmol/100 g and by more than 33 mN.m−1 for an anionic surfactant concentration of 1 mmol/100 g.
摘要:
Topically applicable, stable, UV-photoprotective cosmetic/dermatological compositions well suited for the photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, comprise (a) an effective UV-photoprotecting amount of at least one dibenzoylmethane UV-sunscreen compound and (b) an effective dibenzoylmethane compound (a) photostabilizing amount of at least one benzalmalonate silane having the structural formula (I):
摘要:
The present invention relates to novel cosmetic and/or dermatological compositions comprising, in a cosmetically and/or dermatologically acceptable support, i) a dibenzoylmethane derivative, in particular 4-tert-butyl-4'-methoxydibenzoylmethane, ii) at least one specific 1,3,5-triazine derivative, and iii) at least one amide compound. These compositions are particularly photostable. The invention also relates to the use of these compositions in the cosmetic and/or dermatological fields, in particular, as a sunscreen.
摘要:
Topically applicable, stable, UV-photoprotective cosmetic/dermatological compositions well suited for the photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, comprise (a) an effective UV-photoprotecting amount of at least one dibenzoylmethane UV-sunscreen compound and (b) an effective dibenzoylmethane compound (a) photostabilizing amount of at least one benzalmalonate silane having the structural formula (I): ##STR1##
摘要:
The present invention relates to a composition comprising, in a cosmetically acceptable carrier, at least one UV screening system, characterized in that it comprises: (i) at least one screening agent of lipophilic hydroxybenzophenone type; and (ii) at least one silicon-comprising s-triazine of formula (III) substituted by at least two alkylaminobenzoate groups. In some embodiments, the composition also includes: (iii) a dibenzoylmethane derivative.
摘要:
The present invention relates to a method for the cosmetic treatment of the skin involving a compound, or set of compounds, capable of condensing in situ.
摘要:
Topically applicable cosmetic/dermatological UV protection compositions having enhanced SPF contain at least one organic UV screening agent and/or at least one inorganic screening agent, such compositions also containing at least the following constituents (A) and (B): A) a semi-crystalline polymer which is solid at ambient temperature and has a melting point of greater than or equal to 30° C., containing a) a polymeric backbone and b) at least one crystallizable organic side chain and/or one crystallizable organic block forming part of the backbone of this said polymer, said polymer having a number-average molecular mass Mn of greater than or equal to 1,000, and B) hollow latex particles having a particle size ranging from 150 to 380 nm, formulated into a topically applicable, physiologically acceptable medium therefor.
摘要:
Photostable, topically applicable cosmetic/dermatological compositions contain at least one dibenzoylmethane sunscreen compound and at least one photostabilizing siloxane-containing arylalkyl amide compound of formula (I) below:
摘要:
UV-photostable, topically applicable cosmetic/dermatological compositions contain at least one dibenzoylmethane UV-sunscreen compound and at least one photostabilizing silicon-containing s-triazine compound substituted with two aminobenzoate or aminobenzamide groups.