公开(公告)号：US20080143981A1

公开(公告)日：2008-06-19

申请号：US11854621

申请日：2007-09-13

申请人： Dirk Heinrich EHM ,  Annemieke van de Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

发明人： Dirk Heinrich EHM ,  Annemieke van de Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/52 ,  G21K5/00

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G03F7/70316 ,  G03F7/70891 ,  G03F7/70925 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

摘要： An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.

摘要翻译： 一种用于EUV光刻的光学装置，特别是投影系统，照明系统或光束整形系统，包括布置在光学装置的光束路径中并且反射软X射线或EUV中的辐射的至少一个光学元件 波长范围，其中至少在所述光学装置的操作期间，所述光束路径中至少在所述光学表面处的所述反射光学元件中的至少一个优选地各自具有大约30℃或更高的工作温度， 优选为约100℃以上，特别优选为约150℃以上，甚至更优选为约250℃以上，并且其中选择所述至少一个反射型光学元件的光学设计 其光学特性被优化以在操作温度下操作。 还提出了一种用于提供具有这种光学设计的反射光学元件的方法。

公开(公告)号：US20140007768A1

公开(公告)日：2014-01-09

申请号：US13979534

申请日：2012-01-12

申请人： Leo Jacques Pierre van den Broeke ,  Annemieke van de Runstraat ,  Eva Sanchez Fernandez ,  Alexey Volkov ,  Vladimir Volkov ,  Valery Khotimsky

发明人： Leo Jacques Pierre van den Broeke ,  Annemieke van de Runstraat ,  Eva Sanchez Fernandez ,  Alexey Volkov ,  Vladimir Volkov ,  Valery Khotimsky

IPC分类号： B01D53/14

CPC分类号： B01D53/1425 ,  B01D19/0031 ,  B01D53/1462 ,  B01D53/229 ,  B01D61/36 ,  B01D2252/30 ,  B01D2256/16 ,  B01D2256/245 ,  B01D2257/304 ,  B01D2257/504 ,  B01D2311/2626

摘要： The invention is directed to a method for separating gases in a mixed gas feed stream, and to an apparatus for carrying out said method. The method of the invention comprises: i) contacting the mixed gas feed stream with an absorption liquid in an absorption column at a pressure of 1 bar or more, said absorption liquid being selective for absorption of one or more gases in the mixed gas feed stream so that part of the gas in the mixed gas feed stream is absorbed by the absorption liquid resulting in a rich absorption liquid; ii) regenerating at least part of the absorption liquid by contacting the rich absorption liquid with a desorption membrane, wherein the pressure at the retentate side of the desorption membrane is at least 1 bar higher than the pressure at the permeate side of the desorption membrane so that at least part of the absorbed gas desorbs from the rich absorption liquid and permeates through the desorption membrane thereby forming a lean absorption liquid; and iii) recycling at least part of the lean absorption liquid to step i) for contacting with the mixed gas feed stream.

摘要翻译： 本发明涉及一种用于分离混合气体进料流中的气体的方法，以及用于实施所述方法的装置。 本发明的方法包括：i）在1巴或更高的压力下使混合气体进料流与吸收塔中的吸收液接触，所述吸收液体可选择性地吸收混合气体进料流中的一种或多种气体 使得混合气体进料流中的气体的一部分被吸收液体吸收，产生丰富的吸收液体; ii）通过使富吸收液体与解吸膜接触来再生至少部分吸收液体，其中解吸膜的滞留侧的压力比解吸膜的渗透侧的压力高至少1巴，因此 吸收的气体的至少一部分从富吸收液体中解吸并渗透通过解吸膜，从而形成贫吸收液体; 以及iii）将至少部分贫吸收液体再循环到步骤i）以与混合气体进料流接触。