公开(公告)号：US20080143981A1

公开(公告)日：2008-06-19

申请号：US11854621

申请日：2007-09-13

申请人： Dirk Heinrich EHM ,  Annemieke van de Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

发明人： Dirk Heinrich EHM ,  Annemieke van de Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/52 ,  G21K5/00

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G03F7/70316 ,  G03F7/70891 ,  G03F7/70925 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

摘要： An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.

摘要翻译： 一种用于EUV光刻的光学装置，特别是投影系统，照明系统或光束整形系统，包括布置在光学装置的光束路径中并且反射软X射线或EUV中的辐射的至少一个光学元件 波长范围，其中至少在所述光学装置的操作期间，所述光束路径中至少在所述光学表面处的所述反射光学元件中的至少一个优选地各自具有大约30℃或更高的工作温度， 优选为约100℃以上，特别优选为约150℃以上，甚至更优选为约250℃以上，并且其中选择所述至少一个反射型光学元件的光学设计 其光学特性被优化以在操作温度下操作。 还提出了一种用于提供具有这种光学设计的反射光学元件的方法。

公开(公告)号：US08791176B2

公开(公告)日：2014-07-29

申请号：US12996422

申请日：2009-06-10

申请人： Annemieke Van De Runstraat ,  Peter Geerdink ,  Earl Lawrence Vincent Goetheer

发明人： Annemieke Van De Runstraat ,  Peter Geerdink ,  Earl Lawrence Vincent Goetheer

IPC分类号： B01F3/08

CPC分类号： B01J19/243 ,  B01F5/0646 ,  B01F5/0647 ,  B01F11/0071 ,  B01F15/00844 ,  B01F2215/0431 ,  B01J2219/00029 ,  B01J2219/00094 ,  B01J2219/00114 ,  B01J2219/00166 ,  B01J2219/00243 ,  B01J2219/00254

摘要： The invention is directed to a process and apparatus for carrying out reactions with reaction mixtures comprising different physical phases. In a first aspect, the present invention is directed to a process for carrying out chemical reactions comprising a step wherein a reaction mixture comprising at least two different physical phases, wherein at least one of these phases being liquid, is subjected to the action of Dean vortices, which Dean vortices result from said liquid flowing through a channel having at least two curvatures, wherein the channel comprises for at least a fraction of its total length a smooth inner surface.

摘要翻译： 本发明涉及用于与包含不同物理相的反应混合物进行反应的方法和装置。 在第一方面，本发明涉及一种用于进行化学反应的方法，包括以下步骤：其中包含至少两个不同物理相的反应混合物，其中至少一个这些相是液体，经受Dean的作用 涡流，其由所述液体流过具有至少两个曲率的通道产生，其中通道包括其总长度的至少一部分平滑的内表面。

公开(公告)号：US20140007768A1

公开(公告)日：2014-01-09

申请号：US13979534

申请日：2012-01-12

申请人： Leo Jacques Pierre van den Broeke ,  Annemieke van de Runstraat ,  Eva Sanchez Fernandez ,  Alexey Volkov ,  Vladimir Volkov ,  Valery Khotimsky

发明人： Leo Jacques Pierre van den Broeke ,  Annemieke van de Runstraat ,  Eva Sanchez Fernandez ,  Alexey Volkov ,  Vladimir Volkov ,  Valery Khotimsky

IPC分类号： B01D53/14

CPC分类号： B01D53/1425 ,  B01D19/0031 ,  B01D53/1462 ,  B01D53/229 ,  B01D61/36 ,  B01D2252/30 ,  B01D2256/16 ,  B01D2256/245 ,  B01D2257/304 ,  B01D2257/504 ,  B01D2311/2626

摘要： The invention is directed to a method for separating gases in a mixed gas feed stream, and to an apparatus for carrying out said method. The method of the invention comprises: i) contacting the mixed gas feed stream with an absorption liquid in an absorption column at a pressure of 1 bar or more, said absorption liquid being selective for absorption of one or more gases in the mixed gas feed stream so that part of the gas in the mixed gas feed stream is absorbed by the absorption liquid resulting in a rich absorption liquid; ii) regenerating at least part of the absorption liquid by contacting the rich absorption liquid with a desorption membrane, wherein the pressure at the retentate side of the desorption membrane is at least 1 bar higher than the pressure at the permeate side of the desorption membrane so that at least part of the absorbed gas desorbs from the rich absorption liquid and permeates through the desorption membrane thereby forming a lean absorption liquid; and iii) recycling at least part of the lean absorption liquid to step i) for contacting with the mixed gas feed stream.

摘要翻译： 本发明涉及一种用于分离混合气体进料流中的气体的方法，以及用于实施所述方法的装置。 本发明的方法包括：i）在1巴或更高的压力下使混合气体进料流与吸收塔中的吸收液接触，所述吸收液体可选择性地吸收混合气体进料流中的一种或多种气体 使得混合气体进料流中的气体的一部分被吸收液体吸收，产生丰富的吸收液体; ii）通过使富吸收液体与解吸膜接触来再生至少部分吸收液体，其中解吸膜的滞留侧的压力比解吸膜的渗透侧的压力高至少1巴，因此 吸收的气体的至少一部分从富吸收液体中解吸并渗透通过解吸膜，从而形成贫吸收液体; 以及iii）将至少部分贫吸收液体再循环到步骤i）以与混合气体进料流接触。

公开(公告)号：US07959310B2

公开(公告)日：2011-06-14

申请号：US11854621

申请日：2007-09-13

申请人： Dirk Heinrich Ehm ,  Annemieke Van De Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. Van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

发明人： Dirk Heinrich Ehm ,  Annemieke Van De Runstraat ,  Bastiaan Theodoor Wolschrijn ,  Arnoldus Jan Storm ,  Thomas Stein ,  Marco G. H. Meijerink ,  A. G. Ton M. Bastein ,  Esther L. J. Van Soest-Vercammen ,  Norbertus Benedictus Koster ,  Frits G. H. M. Gubbels ,  Peter J. Oprel ,  Michiel Nienoord ,  Michel Riepen ,  Johannes Hubertus Josephina Moors

IPC分类号： G02B5/08 ,  G02B7/182 ,  G06K7/10

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G03F7/70316 ,  G03F7/70891 ,  G03F7/70925 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

摘要： An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.

摘要翻译： 一种用于EUV光刻的光学装置，特别是投影系统，照明系统或光束整形系统，包括布置在光学装置的光束路径中并且反射软X射线或EUV中的辐射的至少一个光学元件 波长范围，其中至少在所述光学装置的操作期间，所述光束路径中至少在所述光学表面处的所述反射光学元件中的至少一个优选地各自具有大约30℃或更高的工作温度， 优选为约100℃以上，特别优选为约150℃以上，甚至更优选为约250℃以上，并且其中选择所述至少一个反射型光学元件的光学设计 其光学特性被优化以在操作温度下操作。 还提出了一种用于提供具有这种光学设计的反射光学元件的方法。

公开(公告)号：US20110112216A1

公开(公告)日：2011-05-12

申请号：US12996422

申请日：2009-06-10

申请人： Annemieke Van De Runstraat ,  Peter Geerdink ,  Earl Lawrence Vincent Goetheer

发明人： Annemieke Van De Runstraat ,  Peter Geerdink ,  Earl Lawrence Vincent Goetheer

IPC分类号： C08F2/01 ,  C07C45/00 ,  B01J19/00

CPC分类号： B01J19/243 ,  B01F5/0646 ,  B01F5/0647 ,  B01F11/0071 ,  B01F15/00844 ,  B01F2215/0431 ,  B01J2219/00029 ,  B01J2219/00094 ,  B01J2219/00114 ,  B01J2219/00166 ,  B01J2219/00243 ,  B01J2219/00254

摘要： The invention is directed to a process and apparatus for carrying out reactions with reaction mixtures comprising different physical phases. In a first aspect, the present invention is directed to a process for carrying out chemical reactions comprising a step wherein a reaction mixture comprising at least two different physical phases, wherein at least one of these phases being liquid, is subjected to the action of Dean vortices, which Dean vortices result from said liquid flowing through a channel having at least two curvatures, wherein the channel comprises for at least a fraction of its total length a smooth inner surface.

摘要翻译： 本发明涉及用于与包含不同物理相的反应混合物进行反应的方法和装置。 在第一方面，本发明涉及一种用于进行化学反应的方法，包括以下步骤：其中包含至少两个不同物理相的反应混合物，其中至少一个这些相是液体，经受Dean的作用 涡流，其由所述液体流过具有至少两个曲率的通道产生，其中通道包括其总长度的至少一部分平滑的内表面。

公开(公告)号：US20070054497A1

公开(公告)日：2007-03-08

申请号：US10555562

申请日：2004-05-06

申请人： Markus Weiss ,  Marco Wedowski ,  Bas Mertens ,  Bas Wolschrijn ,  Bart Van Mierlo ,  Norbert Koster ,  Jan Van Elp ,  Anton Duiserwinkel ,  Annemieke Van De Runstraat

发明人： Markus Weiss ,  Marco Wedowski ,  Bas Mertens ,  Bas Wolschrijn ,  Bart Van Mierlo ,  Norbert Koster ,  Jan Van Elp ,  Anton Duiserwinkel ,  Annemieke Van De Runstraat

IPC分类号： H01L21/00 ,  G03G15/00 ,  H01L21/31

CPC分类号： G03F7/70983 ,  G03F7/70916 ,  G21K1/06

摘要： The invention relates to a method for preventing contamination of the surfaces of reflective optical elements for the soft X-ray and EUV wavelength range during their irradiation at operating wavelength in an evacuated closed system having a residual gas atmosphere, said elements comprising a cover layer consisting of at least one transition metal. According to said method a residual gas atmosphere is adjusted. The aim of the invention is to prevent a degradation of the surfaces by deposition of carbon and by surface oxidation. For this purpose, both a reducing gas or gas mixture and a gas or gas mixture containing oxygen atoms are introduced. In conjunction with the cover layer of the reflective optical element that consists of a transition metal a degradation of the surface is effectively prevented

摘要翻译： 本发明涉及一种防止在具有残留气体气氛的抽空封闭系统中在其工作波长下照射时用于软X射线和EUV波长范围的反射光学元件表面的污染的方法，所述元件包括覆盖层， 的至少一种过渡金属。 根据所述方法，调节残留气体气氛。 本发明的目的是通过沉积碳和表面氧化来防止表面的降解。 为此，引入还原气体或气体混合物以及含有氧原子的气体或气体混合物。 结合由过渡金属组成的反射光学元件的覆盖层，有效地防止了表面的劣化