公开(公告)号：US20090314931A1

公开(公告)日：2009-12-24

申请号：US12469546

申请日：2009-05-20

申请人： Dirk Heinrich EHM ,  Johannes Hubertus Josephina MOORS ,  Bastiaan Theodoor WOLSCHRIJN ,  Vadim BANINE ,  Valdimir Vitalevitsch IVANOV

发明人： Dirk Heinrich EHM ,  Johannes Hubertus Josephina MOORS ,  Bastiaan Theodoor WOLSCHRIJN ,  Vadim BANINE ,  Valdimir Vitalevitsch IVANOV

IPC分类号： H05H3/06 ,  H01J27/02

CPC分类号： G03F7/70916 ,  G03F7/70925

摘要： A method and an optical arrangement for removing contamination on optical surfaces (26), which are arranged in a vacuum environment in an optical arrangement, preferably in a projection exposure apparatus (1) for EUV lithography. The method includes generating a residual gas atmosphere containing molecular hydrogen (18) and at least one inert gas (17) in the vacuum environment, generating inert gas ions (21) by ionization of the inert gas (17), preferably with EUV radiation (20), and generating atomic hydrogen (27) by acceleration of the inert gas ions (21) in the residual gas atmosphere, to remove the contamination.

摘要翻译： 一种用于去除在光学装置的真空环境中布置的光学表面（26）上的污染的方法和光学装置，优选在用于EUV光刻的投影曝光装置（1）中。 该方法包括在真空环境中产生含有分子氢（18）和至少一种惰性气体（17）的残余气体气氛，通过惰性气体（17）的电离产生惰性气体离子（21），优选用EUV辐射 20），并且通过加热惰性气体离子（21）在残留气体气氛中产生原子氢（27），以除去污染物。

公开(公告)号：US20090231707A1

公开(公告)日：2009-09-17

申请号：US12403233

申请日：2009-03-12

申请人： Dirk Heinrich EHM ,  Stephan MUELLENDER ,  Thomas STEIN ,  Johannes Hubertus Josephina MOORS ,  Bastiaan Theodoor WOLSCHRIJN ,  Dieter KRAUS ,  Richard VERSLUIS ,  Marcus Gerhardus Hendrikus MEIJERINK

发明人： Dirk Heinrich EHM ,  Stephan MUELLENDER ,  Thomas STEIN ,  Johannes Hubertus Josephina MOORS ,  Bastiaan Theodoor WOLSCHRIJN ,  Dieter KRAUS ,  Richard VERSLUIS ,  Marcus Gerhardus Hendrikus MEIJERINK

IPC分类号： B60R1/06

CPC分类号： G03B27/16 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70883 ,  G03F7/70916 ,  G21K2201/061

摘要： An optical arrangement, in particular a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) that encloses an interior space (15); at least one, in particular reflective, optical element (4 to 10, 12, 14.1 to 14.6) that is arranged in the housing (2); at least one vacuum generating unit (3) for generating a vacuum in the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1 to 18.10) that is arranged in the interior space (15) of the housing (2) and that encloses at least the optical surface (17, 17.1, 17.2) of the optical element (4 to 10, 12, 14.1 to 14.5), wherein a contamination reduction unit is associated with the vacuum housing (18.1 to 18.10), which contamination reduction unit reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).

摘要翻译： 光学装置，特别是用于EUV光刻的投影曝光装置（1）包括：封闭内部空间（15）的壳体（2）; 布置在壳体（2）中的至少一个特别是反射的光学元件（4至10,12,14.1至14.6）; 至少一个用于在所述壳体（2）的内部空间（15）中产生真空的真空发生单元（3）; 以及布置在所述壳体（2）的内部空间（15）中并且至少包围所述光学元件（4）的光学表面（17,17.1,17.2）的至少一个真空壳体（18,18.1至18.10） 至10,12,14.1至14.5），其中污染减少单元与真空壳体（18.1至18.10）相关联，该污染减少单元至少降低污染物质，特别是水和/或烃的分压 相对于内部空间（15）中的污染物质的分压紧邻光学表面（17,17.1,17.2）。

公开(公告)号：US20090173360A1

公开(公告)日：2009-07-09

申请号：US12405831

申请日：2009-03-17

申请人： Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Vadim Yevgenyevich BANINE ,  Johannes Peterus Henricus DE KUSTER ,  Johannes Hubertus Josephina MOORS ,  Lucas Henricus Johannes STEVENS ,  Bastiaan Theodoor WOLSCHRIJN ,  Yurii Victorovitch SIDELNIKOV ,  Marc Hubertus Lorenz VAN DER VELDEN ,  Wouter Anthon SOER ,  Thomas STEIN ,  Kurt Gielissen

发明人： Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Vadim Yevgenyevich BANINE ,  Johannes Peterus Henricus DE KUSTER ,  Johannes Hubertus Josephina MOORS ,  Lucas Henricus Johannes STEVENS ,  Bastiaan Theodoor WOLSCHRIJN ,  Yurii Victorovitch SIDELNIKOV ,  Marc Hubertus Lorenz VAN DER VELDEN ,  Wouter Anthon SOER ,  Thomas STEIN ,  Kurt Gielissen

IPC分类号： G21K5/00 ,  B08B7/00 ,  H05H1/00

CPC分类号： G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

摘要翻译： 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。