Image scanning unit
    1.
    发明授权
    Image scanning unit 有权
    图像扫描单元

    公开(公告)号:US09077835B2

    公开(公告)日:2015-07-07

    申请号:US14126691

    申请日:2012-01-31

    摘要: Provided is an image scanning unit which makes it possible to improve scanning accuracy while also making the overall body thinner by appropriately positioning a plurality of reflection members within an effective space in a carriage frame without wasting space. An image scanning unit, wherein a frame is divided into at least two spaces facing an irradiation surface, a first accommodation unit for accommodating a light source unit is formed in one of the spaces, a second accommodation unit for accommodating at least one reflection member is formed in the other adjacent space, a first reflection member for initially receiving light reflected from the irradiation surface is positioned at the side opposite the irradiation surface with the first accommodation unit positioned therebetween, and a light-shielding member is provided between the first reflection member and the reflection member positioned in the other space and prevents light that has strayed from a scanning light path from the first reflection member from being incident on the reflection member in the other space.

    摘要翻译: 提供了一种图像扫描单元,其可以通过将多个反射构件适当地定位在支架框架的有效空间内而不浪费空间,从而提高扫描精度,同时使整体变薄。 一种图像扫描单元,其中框架被分成面向照射表面的至少两个空间,在一个空间中形成有用于容纳光源单元的第一容纳单元,用于容纳至少一个反射构件的第二容纳单元 形成在另一相邻空间中的第一反射构件,用于最初接收从照射表面反射的光的第一反射构件位于与照射表面相对的一侧,其中第一容纳单元位于它们之间,并且遮光构件设置在第一反射构件 并且所述反射构件位于所述另一空间中,防止从所述第一反射构件的扫描光路偏离的光入射到所述另一空间中的所述反射构件。

    Display device
    2.
    发明授权
    Display device 有权
    显示设备

    公开(公告)号:US08476665B2

    公开(公告)日:2013-07-02

    申请号:US13659205

    申请日:2012-10-24

    申请人: Hiroki Adachi

    发明人: Hiroki Adachi

    IPC分类号: H01L33/00

    摘要: The present invention provides a display device. The display device comprises first and second wirings, first and second transistors, an insulating film over the first and second transistors, a first electrode over the insulating film, a light emitting layer over the first electrode, and a second electrode over the light emitting layer. The gate electrode of the first transistor is formed in a different layer from the first wiring. One of a source electrode and a drain electrode of the first transistor is electrically connected to a gate electrode of the second transistor. The first wiring is parallel to the second wiring.

    摘要翻译: 本发明提供一种显示装置。 显示装置包括第一和第二布线,第一和第二晶体管,第一和第二晶体管上的绝缘膜,绝缘膜上的第一电极,第一电极上的发光层,以及发光层上的第二电极 。 第一晶体管的栅电极形成在与第一布线不同的层中。 第一晶体管的源电极和漏电极之一电连接到第二晶体管的栅电极。 第一布线平行于第二布线。

    Exposure Device, Exposure Method and Method of Manufacturing Semiconductor Device
    3.
    发明申请
    Exposure Device, Exposure Method and Method of Manufacturing Semiconductor Device 有权
    曝光装置,曝光方法及制造半导体装置的方法

    公开(公告)号:US20080316449A1

    公开(公告)日:2008-12-25

    申请号:US12170606

    申请日:2008-07-10

    申请人: Hiroki Adachi

    发明人: Hiroki Adachi

    IPC分类号: G03B27/42 G03F7/22

    摘要: The present invention provides a highly controllable device for exposure from the back side and an exposure method, and also provides a method of manufacturing a semiconductor device using the same. The present invention involves exposure with the use of the back side exposure device of which a reflecting means is disposed on the front side of a substrate, apart from a photosensitive thin film surface by a distance X (X=0.1 μm to 1000 μm), and formation of a photosensitive thin film pattern in a self alignment manner, with good controllability, at a position a distance Y away from the end of a pattern. The invention fabricates a TFT using that method.

    摘要翻译: 本发明提供了一种用于从背面曝光的高度可控的装置和曝光方法,并且还提供了一种制造使用该装置的半导体器件的方法。 本发明涉及使用背光曝光装置,其中反射装置设置在基板的正面,远离光敏薄膜表面X(X =0.1μm至1000μm), 并且在远离图案末端的距离Y的位置以自对准的方式形成感光薄膜图案,具有良好的可控性。 本发明使用该方法制造TFT。

    Exposure device, exposure method and method of manufacturing semiconductor device
    4.
    发明授权
    Exposure device, exposure method and method of manufacturing semiconductor device 有权
    曝光装置,曝光方法和制造半导体器件的方法

    公开(公告)号:US07405432B2

    公开(公告)日:2008-07-29

    申请号:US11018020

    申请日:2004-12-21

    申请人: Hiroki Adachi

    发明人: Hiroki Adachi

    IPC分类号: H01L27/15

    摘要: The present invention provides a highly controllable device for exposure from the back side and an exposure method, and also provides a method of manufacturing a semiconductor device using the same. The present invention involves exposure with the use of the back side exposure device of which a reflecting means is disposed on the front side of a substrate, apart from a photosensitive thin film surface by a distance X (X=0.1 μm to 1000 μm), and formation of a photosensitive thin film pattern in a self alignment manner, with good controllability, at a position a distance Y away from the end of a pattern. The invention fabricates a TFT using that method.

    摘要翻译: 本发明提供了一种用于从背面曝光的高度可控的装置和曝光方法,并且还提供了一种制造使用该装置的半导体器件的方法。 本发明涉及使用背光曝光装置,其中反射装置设置在基板的正面,远离光敏薄膜表面X(X =0.1μm至1000μm), 并且在远离图案末端的距离Y的位置以自对准的方式形成感光薄膜图案,具有良好的可控性。 本发明使用该方法制造TFT。

    Exposure system
    5.
    发明授权
    Exposure system 失效
    曝光系统

    公开(公告)号:US07394478B2

    公开(公告)日:2008-07-01

    申请号:US10957675

    申请日:2004-10-05

    申请人: Mitsugu Wada

    发明人: Mitsugu Wada

    IPC分类号: B41J2/45 B41J2/47

    CPC分类号: G03B27/16 B41J2/45 G03B27/72

    摘要: An exposure system is provided with an exposure head formed of a red organic EL element which emits light in a red region and another organic EL element which emits light in a predetermined wavelength range shorter than the red region. The exposure system exposes a color photosensitive body containing therein at least a red silver-salt photosensitive material sensitive to the light in the red region and another silver-salt photosensitive material sensitive to the light in the predetermined wavelength range. An optical filter cuts the wavelength components which are shorter than the predetermined wavelength range and included in a sensitive range of the red silver-salt photosensitive material.

    摘要翻译: 曝光系统设置有由发射红色区域的红色有机EL元件和发射比红色区域短的预定波长范围内的光的另一有机EL元件形成的曝光头。 曝光系统曝光至少含有对红色区域的光敏感的红色银盐感光材料和另一种对预定波长范围的光敏感的银盐感光材料的感光体。 光学滤波器切割比预定波长范围短的波长分量,并包括在红色银盐感光材料的敏感范围内。

    Imaging system for thermal transfer
    6.
    发明授权
    Imaging system for thermal transfer 失效
    热转印成像系统

    公开(公告)号:US07148957B2

    公开(公告)日:2006-12-12

    申请号:US10863938

    申请日:2004-06-09

    摘要: An optical imaging system is disclosed for selective thermal transfer of a material from a donor film to a substrate. The imaging system includes a light source assembly that is configured to emit a patterned light beam. The patterned light beam includes a plurality of discrete output light segments where the segments at most partially overlap. The imaging system further includes a light relay assembly that receives and projects the plurality of discrete output light segments onto a transfer plane so as to form a projected light segment by a substantial superposition of the plurality of discrete output light segments. When a donor film that includes a transferable material is placed proximate a substrate that lies in the transfer plane, the projected light segment is capable of inducing a transfer of the transferable material onto the substrate.

    摘要翻译: 公开了一种光学成像系统,用于将材料从施主膜选择性地热传递到基底。 成像系统包括被配置为发射图案化光束的光源组件。 图案化的光束包括多个离散的输出光段,其中段最多部分重叠。 成像系统还包括光继电器组件,其接收并将多个离散输出光段投影到转移平面上,以便通过多个离散输出光段的实质叠加来形成投影光段。 当包括可转移材料的供体膜放置在位于转印平面中的基底附近时,投影光段能够引起可转移材料转移到基底上。

    Negative silver salt diffusion transfer material
    8.
    发明授权
    Negative silver salt diffusion transfer material 失效
    负银盐扩散转移材料

    公开(公告)号:US5262271A

    公开(公告)日:1993-11-16

    申请号:US774189

    申请日:1991-10-10

    IPC分类号: G03B27/16 G03C5/54 G03C5/42

    CPC分类号: G03B27/16

    摘要: According to the present invention a method for producing a negative image is provided, comprising the following steps:image-wise exposing an imaging element comprising on a support, a light-sensitive silver halide emulsion layer comprising silver halide grains having an average volume of not more than 0.02 .mu.m.sup.3 and a layer containing non-light-sensitive water insoluble silver salt, to produce a latent image in said layer of light-sensitive silver halidedeveloping said latent image to produce physical development nuclei of silverdissolving the non-light-sensitive silver salts using a silver salt complexing agent andallowing the thus formed silver salt complexes to diffuse to the layer containing said image-wise formed physical development nuclei of silver to image-wise deposit and develop said silver salt complexes on said image-wise formed physical development nuclei of silver in the presence of (a) developing agent(s).

    Overhead light exposure apparatus
    9.
    发明授权
    Overhead light exposure apparatus 失效
    架空曝光装置

    公开(公告)号:US4994857A

    公开(公告)日:1991-02-19

    申请号:US407808

    申请日:1989-09-19

    IPC分类号: G03F7/20 G03B27/16 G03B27/20

    CPC分类号: G03B27/20 G03B27/16

    摘要: An overhead light exposure unit for making copies on pre-sensitized sheets from images on film includes a base supporting a vacuum blanket for pressing the sheets and film together against a transparent panel. The transparent panel is mounted in a frame that is pivotally secured to the base for movement between a closed horizontal position for making copies and an upwardly tilted, open position for unloading and loading film, sheets and media into place. A light source is positioned above the panel for directing controlled, high intensity light downwardly through the panel to reproduce film images on the pre-sensitized sheets held in place by the vacuum blanket. A support system is provided for holding the light source in an exposure position space directly above the transparent panel for directing controlled intensity light downwardly through the panel to reproduce an image on a silk screen, sheet or film held in place by the vacuum blanket. The support system is operative to move the light source away from the exposure position to an open position to afford better access to and viewing of the working space above the horizontal position of the vacuum blanket for loading and unloading film media, etc., when the frame is in an open position. The light source is maintained within a space above the base defined within an upwardly extending periphery thereof even in the open position and the exposure distance between the light source and the film sheets is minimized when the light source is in the exposure position to reduce the exposure time interval required.

    Compact light collimator for a scanning contact printer
    10.
    发明授权
    Compact light collimator for a scanning contact printer 失效
    用于扫描接触式打印机的紧凑型光准直器

    公开(公告)号:US4965621A

    公开(公告)日:1990-10-23

    申请号:US440577

    申请日:1989-11-17

    IPC分类号: G03B27/10 G03B27/16 G03B27/20

    CPC分类号: G03B27/10 G03B27/16

    摘要: In a contact printer comprising means for supporting a film and an original in superposed relationship, means for providing a source of light for exposing the film through the original, and means for moving the light over the surface of the superposed film and original. The improvement comprises means carried by the light moving means for collimating the light, with the light collimating means comprising a plurality of parallel tubular members having a length to diameter ratio greater than about four and which extend between the light source and the film.

    摘要翻译: 在包括用于以叠加关系支撑胶片和原稿的装置的接触式打印机中,提供用于使胶片通过原稿曝光的光源的装置,以及用于将光移动到重叠胶片和原稿的表面上的装置。 该改进包括由用于准直光的光移动装置携带的装置,光准直装置包括多个平行的管状构件,其长度与直径之比大于约4并且在光源和膜之间延伸。