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公开(公告)号：US20090173360A1
公开(公告)日：2009-07-09
申请号：US12405831
申请日：2009-03-17
申请人： Maarten Marinus Johannes Wilhelmus VAN HERPEN , Vadim Yevgenyevich BANINE , Johannes Peterus Henricus DE KUSTER , Johannes Hubertus Josephina MOORS , Lucas Henricus Johannes STEVENS , Bastiaan Theodoor WOLSCHRIJN , Yurii Victorovitch SIDELNIKOV , Marc Hubertus Lorenz VAN DER VELDEN , Wouter Anthon SOER , Thomas STEIN , Kurt Gielissen
发明人： Maarten Marinus Johannes Wilhelmus VAN HERPEN , Vadim Yevgenyevich BANINE , Johannes Peterus Henricus DE KUSTER , Johannes Hubertus Josephina MOORS , Lucas Henricus Johannes STEVENS , Bastiaan Theodoor WOLSCHRIJN , Yurii Victorovitch SIDELNIKOV , Marc Hubertus Lorenz VAN DER VELDEN , Wouter Anthon SOER , Thomas STEIN , Kurt Gielissen
CPC分类号： G03F7/70925 , G03F7/7085 , G03F7/70908 , G03F7/70916
摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
摘要翻译： 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。
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2.发明申请公开(公告)号：US20100039632A1
公开(公告)日：2010-02-18
申请号：US12540611
申请日：2009-08-13
申请人： Maarten Marinus Johannes Wilhelmus VAN HERPEN , Vadim Yevgenyevich BANINE , Derk Jan Wilfred KLUNDER , Wouter Anthon SOER
发明人： Maarten Marinus Johannes Wilhelmus VAN HERPEN , Vadim Yevgenyevich BANINE , Derk Jan Wilfred KLUNDER , Wouter Anthon SOER
CPC分类号： G21K1/062 , B82Y10/00 , G03F7/70033 , G03F7/70925 , G21K2201/064 , H05G2/005
摘要： A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation. The source includes a chamber in which a plasma is generated, and a mirror configured to reflect radiation emitted by the plasma. The mirror includes a multi-layer structure that includes alternating Mo/Si layers. A boundary Mo layer or a boundary Si layer or a boundary diffusion barrier layer of the alternating layers forms a top layer of the mirror, the top layer facing inwardly with respect to the chamber. A hydrogen radical generator is configured to generate hydrogen radicals in the chamber. The radicals are configured to remove debris generated by the plasma from the mirror. A support is constructed and arranged to support a patterning device configured to pattern the radiation to form a patterned beam of radiation. A projection system is constructed and arranged to project the patterned beam of radiation onto a substrate.
摘要翻译： 光刻设备包括被配置为产生极紫外辐射的辐射源。 源包括其中产生等离子体的室和被配置为反射由等离子体发射的辐射的反射镜。 反射镜包括包含交替的Mo / Si层的多层结构。 交替层的边界Mo层或边界Si层或边界扩散阻挡层形成反射镜的顶层，顶层相对于室面向内。 氢游离基发生器构造成在腔室中产生氢自由基。 基团被配置成从反射镜去除由等离子体产生的碎屑。 支撑件被构造和布置成支撑配置成图案化辐射以形成图案化的辐射束的图案形成装置。 投影系统被构造和布置成将图案化的辐射束投射到衬底上。
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3.发明申请Optical Element, Lithographic Apparatus Including Such an Optical Element, Device Manufacturing Method, and Device Manufactured Thereby 有权光学元件，包括这种光学元件的光刻设备，器件制造方法和由此制造的器件公开(公告)号：US20100002216A1
公开(公告)日：2010-01-07
申请号：US12495043
申请日：2009-06-30
CPC分类号： G03F7/70958 , G03F7/70575
摘要： Spectral purity of a radiation beam of a first wavelength may be improved by providing an optical element that includes a structure having at least first layer including a first material, which structure is configured to be substantially reflective for a radiation of the first wavelength and substantially transparent or absorptive for a radiation of a second wavelength, a second layer including a second material, the second layer being configured to be substantially reflective, absorptive or scattering for the radiation of the second wavelength, and vacuum between the first layer and the second layer, wherein the first layer is located upstream in the optical path of incoming radiation with respect to the second layer.
摘要翻译： 可以通过提供一种光学元件来改善第一波长的辐射束的光谱纯度，所述光学元件包括具有至少包括第一材料的第一层的结构，该结构被配置为对于第一波长的辐射基本上是反射的，并且基本上透明 或吸收第二波长的辐射，第二层包括第二材料，第二层被配置为对于第二波长的辐射是基本反射的，吸收的或散射的，以及第一层和第二层之间的真空， 其中所述第一层位于相对于所述第二层的入射辐射的光路中的上游。
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公开(公告)号：US20090284725A1
公开(公告)日：2009-11-19
申请号：US12466185
申请日：2009-05-14
CPC分类号： G02B27/44 , G02B5/1838 , G02B5/1876 , G02B27/4244 , G02F1/061 , G03F7/70191 , G21K1/06 , G21K2201/067
摘要： A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The second regions are arranged to be substantially opaque, diffractive, or reflective to the first predetermined wavelength of radiation and substantially transparent to the second predetermined wavelength of radiation.
摘要翻译： 区域板包括多个连续布置的，相邻的和交替的第一和第二区域。 第一区域被布置成对于辐射的第一预定波长和不同于第一预定波长辐射的第二预定波长的辐射基本上是透明的。 第二区域被布置为基本上不透明，衍射或反射到第一预定波长的辐射并且对第二预定波长的辐射基本透明。
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公开(公告)号：US20100271610A1
公开(公告)日：2010-10-28
申请号：US12764535
申请日：2010-04-21
CPC分类号： G21K1/062 , B82Y10/00 , G02B17/0892 , G03B27/54 , G03F7/70175 , G03F7/702 , G03F7/70958 , G21K2201/061 , G21K2201/064
摘要： A collector assembly for use in a laser-produced plasma extreme ultraviolet radiation source for use in lithography has a collector body having a collector mirror and a window in the collector body. The window is transmissive to excitation radiation, which may be an infrared laser beam, so that it can pass through the window to excite the plasma, and the window has an EUV minor on its surface which is also transmissive to the excitation beam but which can reflect EUV generated by the plasma to the collector location of the collector mirror. The window may improve the collection efficiency and reduce non-uniformity in the image at the collector location. Radiation sources, lithographic apparatus and device manufacturing methods may make use of the collector.
摘要翻译： 用于激光制备的等离子体极紫外辐射源中用于光刻的集电器组件具有收集器主体，其具有收集器反射镜和收集器主体中的窗口。 激发辐射的窗口是透射的，其可以是红外激光束，使得其可以通过窗口以激发等离子体，并且窗口在其表面上具有EUV次要的，其也对激发束是透射的，但是可以 将等离子体产生的EUV反射到收集器反射镜的收集器位置。 窗口可以提高收集效率并减少收集器位置图像的不均匀性。 辐射源，光刻设备和设备制造方法可以利用收集器。
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公开(公告)号：US20090272916A1
公开(公告)日：2009-11-05
申请号：US12431367
申请日：2009-04-28
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70058
摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel is contacted by a beam of radiation to form a plasma, a collector constructed and arranged to collect extreme ultraviolet radiation formed at the plasma formation site and form an extreme ultraviolet radiation beam, and a contamination barrier. The contamination barrier includes a plurality of foils at least partially located between the plasma formation site and the collector, and a rotatable base operatively connected to the plurality of foils. The rotatable base is configured to allow the beam of radiation to pass through the contamination barrier to the plasma formation site.
摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括位于燃料被辐射束接触以形成等离子体的位置处的等离子体形成位置，构造和布置成收集在等离子体形成部位处形成的极紫外辐射并形成极紫外辐射的收集器 光束和污染屏障。 污染屏障包括至少部分地位于等离子体形成位置和集电器之间的多个箔，以及可操作地连接到多个箔的可旋转底座。 可旋转底座构造成允许辐射束通过污染屏障到等离子体形成部位。
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