Method and apparatus for providing patterned illumination fields for machine vision systems
    3.
    发明授权
    Method and apparatus for providing patterned illumination fields for machine vision systems 有权
    用于为机器视觉系统提供图案化照明场的方法和装置

    公开(公告)号:US08598557B2

    公开(公告)日:2013-12-03

    申请号:US10519180

    申请日:2003-06-20

    IPC分类号: G01N21/86 G01N21/00

    CPC分类号: G01N21/8806

    摘要: This application relates to an apparatus and method for providing patterned illumination fields for use within process control and article inspection applications. More specifically, it pertains to the use of patterned illuminators to enable visual surface inspection of polished objects such as ball bearings. The use of patterned illuminators properly disposed in relation to a polished part under inspection allows small surface imperfections such as scratches and pits to become visible against the normal surface background. The use of carefully engineered illuminators facilitates advantageous defect-site scattering from generally dark field sources. The patterned nature of the illuminators defined by this invention allows the complete surface of three-dimensional parts to be effectively highlighted using dark field illumination fields.

    摘要翻译: 本申请涉及一种用于提供在过程控制和物品检查应用中使用的图案化照明场的装置和方法。 更具体地说,它涉及图案化照明器的使用以使得诸如球轴承之类的抛光物体的视觉表面检查。 相对于被检查的抛光部分适当地设置的图案照明器的使用允许诸如划痕和凹坑的小表面缺陷对于正常表面背景变得可见。 使用精心设计的照明器有助于从一般暗场光源获得有利的缺陷点散射。 由本发明限定的照明器的图案性质允许使用暗场照明场有效地突出显示三维部分的完整表面。