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43 条记录 (耗时 0.044 秒)

    Photoresist composition having a high heat resistance
    5.
    发明授权
    Photoresist composition having a high heat resistance 有权
    具有高耐热性的光刻胶组合物

    公开(公告)号：US07144662B2

    公开(公告)日：2006-12-05

    申请号：US10493193

    申请日：2002-02-20

    申请人： Dong-Ki Lee ,  Sung-Chul Kang ,  You-Kyoung Lee ,  Jin-Ho Ju

    发明人： Dong-Ki Lee ,  Sung-Chul Kang ,  You-Kyoung Lee ,  Jin-Ho Ju

    IPC分类号： G03F7/023

    CPC分类号： G03F7/0226

    摘要： The present invention relates to a photoresist composition having high heat resistance used in the production process of an LCD, and more particularly, to a photoresist composition having high heat resistance, capable of decreasing process tact (a way), of process simplification, and of the retrenchment of expenditures. The inventive composition facilitates this through making it possible to skip 5 processes, such as Cr metal deposition forming a metal film, and the photo/etch/PR strip/etch steps of the whole surface of the metal, by substituting the inventive composition for the usual metal film, such that N+ ion doping in production of TFT-LCD can take place due its high heat resistance.

    摘要翻译： 本发明涉及在LCD的生产过程中使用的具有高耐热性的光致抗蚀剂组合物，更具体地说，涉及具有高耐热性，能够降低工艺简化的工艺（一种方法）的光致抗蚀剂组合物，以及 削减支出。 本发明的组合物通过使得本发明的组合物代替本发明的组合物可以跳过5种工艺，例如形成金属膜的Cr金属沉积和金属的整个表面的光刻/蚀刻/ PR剥离/蚀刻步骤 通常的金属膜，由于其高耐热性，可以发生TFT-LCD的生产中的N + + / - 离子掺杂。

    Photoresist composition and method of forming pattern using the same
    6.
    发明授权
    Photoresist composition and method of forming pattern using the same 有权
    光刻胶组合物和使用其形成图案的方法

    公开(公告)号：US06893791B2

    公开(公告)日：2005-05-17

    申请号：US10259152

    申请日：2002-09-27

    申请人： You-Kyoung Lee ,  Sung-Chul Kang ,  Jin-Ho Ju ,  Dong-Ki Lee ,  Seung-Uk Lee ,  Hoon Kang

    发明人： You-Kyoung Lee ,  Sung-Chul Kang ,  Jin-Ho Ju ,  Dong-Ki Lee ,  Seung-Uk Lee ,  Hoon Kang

    IPC分类号： G03F7/004 ,  G02F1/13 ,  G03F7/008 ,  G03F7/022 ,  G03F7/023 ,  G03F7/40 ,  G03F7/30

    CPC分类号： G03F7/0236 ,  G03F7/0226 ,  G03F7/40

    摘要： Disclosed is a photoresist composition having a good sensitivity and residual layer characteristic and a method of forming a pattern using the same. The photoresist composition includes 5-30% by weight of a polymer resin, 2-10% by weight of a photosensitive compound, 0.1-10% by weight of a sensitivity enhancing agent, 0.1-10% by weight of a sensitivity restraining agent and 60-90% by weight of an organic solvent. A photoresist layer is formed by coating the photoresist composition on a substrate and then drying the coated photoresist composition. Then, thus obtained photoresist layer is exposed by using a mask having a predetermined pattern. Then, a photoresist pattern is formed by developing thus exposed photoresist layer. The photoresist pattern exhibits a uniform layer thickness and critical dimension.

    摘要翻译： 公开了具有良好的灵敏度和残留层特性的光致抗蚀剂组合物和使用其形成图案的方法。 光致抗蚀剂组合物包含5-30重量％的聚合物树脂，2-10重量％的感光性化合物，0.1-10重量％的敏感性增强剂，0.1-10重量％的敏感性抑制剂和 60-90重量％的有机溶剂。 通过将光致抗蚀剂组合物涂覆在基材上，然后干燥涂覆的光致抗蚀剂组合物，形成光致抗蚀剂层 然后，通过使用具有预定图案的掩模曝光所得到的光致抗蚀剂层。 然后，通过显影这样曝光的光刻胶层形成光致抗蚀剂图案。 光致抗蚀剂图案具有均匀的层厚度和临界尺寸。

    Photoresist composition for multi-micro nozzle head coater
    7.
    发明授权
    Photoresist composition for multi-micro nozzle head coater 有权
    用于多微喷嘴头涂布机的光刻胶组合物

    公开(公告)号：US07378230B2

    公开(公告)日：2008-05-27

    申请号：US10750845

    申请日：2004-01-05

    申请人： Sung-Chul Kang ,  Jin-Ho Ju ,  You-Kyoung Lee ,  Dong-Ki Lee ,  Hyo-Youl Kim ,  Hoon Kang ,  Seung-Uk Lee ,  Byung-Uk Kim

    发明人： Sung-Chul Kang ,  Jin-Ho Ju ,  You-Kyoung Lee ,  Dong-Ki Lee ,  Hyo-Youl Kim ,  Hoon Kang ,  Seung-Uk Lee ,  Byung-Uk Kim

    IPC分类号： G03F7/32 ,  G03F7/023

    CPC分类号： G03F7/0236 ,  G03F7/0048

    摘要： The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.

    摘要翻译： 本发明涉及一种用于MMN（多微喷嘴）喷涂机的光致抗蚀剂组合物，更具体地说涉及一种光致抗蚀剂组合物，其包含分子量范围为2000-12,000的酚醛清漆树脂，二叠氮光敏化合物，有机溶剂和 用于液晶显示电路的Si基表面活性剂。 本发明的液晶显示电路用光致抗蚀剂组合物解决了用于大规模基板玻璃的MMN头涂布机中发生的污渍问题，并且改善了涂布特性，从而可以在工业上得到利用并且预期显着提高生产率 。

    Photoresist composition for a spinless coater and method of forming a photoresist pattern using the same
    8.
    发明申请
    Photoresist composition for a spinless coater and method of forming a photoresist pattern using the same 审中-公开
    用于无纺涂布机的光致抗蚀剂组合物和使用其形成光致抗蚀剂图案的方法

    公开(公告)号：US20050089790A1

    公开(公告)日：2005-04-28

    申请号：US10931387

    申请日：2004-09-01

    申请人： Dong-Ki Lee ,  Jin-Ho Ju ,  Hyo-Youl Kim

    发明人： Dong-Ki Lee ,  Jin-Ho Ju ,  Hyo-Youl Kim

    IPC分类号： G03C5/18 ,  G03F7/004 ,  G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/0048 ,  G03F7/022 ,  G03F7/023

    摘要： A photoresist composition for a spinless coater includes a novolak resin having a weight average molecular weight of about 2,000 to about 15,000, a diazide based photosensitive compound and a volatile organic solvent. The photoresist composition is applied to a substrate of a liquid crystal display apparatus to reduce blots and enhance application uniformity. A highly volatile solvent, such as n-propyl acetate (nPAC) or n-butyl acetate (nBA) is used in the photoresist composition as the volatile organic solvent. The photoresist composition including the volatile organic solvent gives a photoresist film that has a uniform thickness. Hence, the generation of small resin blots and thick blots may be reduced.

    摘要翻译： 无纺涂布机用光致抗蚀剂组合物包括重均分子量为约2,000至约15,000的酚醛清漆树脂，二叠氮基感光性化合物和挥发性有机溶剂。 将光致抗蚀剂组合物施加到液晶显示装置的基板上以减少印迹并提高应用均匀性。 在光致抗蚀剂组合物中使用高挥发性溶剂如乙酸正丙酯（nPAC）或乙酸正丁酯（nBA）作为挥发性有机溶剂。 包括挥发性有机溶剂的光致抗蚀剂组合物提供具有均匀厚度的光致抗蚀剂膜。 因此，可能减少产生小的树脂印迹和厚的印迹。

    Photoresist composition and method of forming pattern using the same
    9.
    发明授权
    Photoresist composition and method of forming pattern using the same 有权
    光刻胶组合物和使用其形成图案的方法

    公开(公告)号：US06686120B2

    公开(公告)日：2004-02-03

    申请号：US10219711

    申请日：2002-08-15

    申请人： You-Kyoung Lee ,  Sung-Chul Kang ,  Jin-Ho Ju ,  Dong-Ki Lee

    发明人： You-Kyoung Lee ,  Sung-Chul Kang ,  Jin-Ho Ju ,  Dong-Ki Lee

    IPC分类号： G03F7023

    CPC分类号： G03F7/0233 ,  G03F7/40

    摘要： Disclosed is a photoresist composition including a thermal acid generator and a method of forming a pattern using the same. The photoresist composition includes about 100 parts by weight of an alkali-soluble acryl copolymer, about 5-100 parts by weight of 1,2-quinonediazide compound, about 2-35 parts by weight of nitrogen-containing cross-linking agent and about 0.1-10 parts by weight of a thermal acid generator which produces an acid by heat. The photoresist composition is coated on a substrate and dried to form a photoresist layer. The photoresist layer is exposed by using a mask having a predetermined shape. Thus obtained exposed photoresist layer is developed by using an aqueous alkaline solution to form a photoresist pattern. Thus obtained photoresist pattern is heated to be cured without generating thermal reflow.

    摘要翻译： 公开了一种光致抗蚀剂组合物，其包括热酸产生剂和使用其形成图案的方法。 光致抗蚀剂组合物包括约100重量份的碱溶性丙烯酸共聚物，约5-100重量份的1,2-醌二叠氮化合物，约2-35重量份含氮交联剂和约0.1重量份 -10重量份的通过加热产生酸的热酸发生剂。 将光致抗蚀剂组合物涂布在基材上并干燥以形成光致抗蚀剂层。 通过使用具有预定形状的掩模来曝光光致抗蚀剂层。 通过使用碱性水溶液来形成曝光的光致抗蚀剂层以形成光致抗蚀剂图案。 将得到的光致抗蚀剂图案加热固化而不产生热回流。